Journal ArticleDOI
High-density plasma etching of indium–zinc oxide films in Ar/Cl2 and Ar/CH4/H2 chemistries
W.T. Lim,L. Stafford,Ju-Il Song,Jae-Soung Park,Yeong-Woo Heo,Joon-Hyung Lee,Jeong-Joo Kim,Stephen J. Pearton +7 more
TLDR
In this paper, the dry etching characteristics of transparent and conductive indium-zinc oxide (IZO) films have been investigated using an inductively coupled high-density plasma.About:
This article is published in Applied Surface Science.The article was published on 2006-12-30. It has received 14 citations till now. The article focuses on the topics: Reactive-ion etching & Dry etching.read more
Citations
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Journal ArticleDOI
Selective recovery of indium from the etching waste solution of the flat-panel display fabrication process
Hiroshi Hasegawa,Ismail M.M. Rahman,Ismail M.M. Rahman,Yoshihiro Umehara,Hikaru Sawai,Teruya Maki,Yoshiaki Furusho,Satoshi Mizutani +7 more
TL;DR: In this article, a new technique for the selective recovery of indium from the etching waste, which produced during the patterning of the indium tin oxide (ITO) layer on the flat-panel displays, was introduced.
Journal ArticleDOI
Experimental and modeling study of O and Cl atoms surface recombination reactions in O2 and Cl2 plasmas
Luc Stafford,Joydeep Guha,Joydeep Guha,Rohit Khare,Stefano Mattei,Olivier Boudreault,Boris Clain,Vincent M. Donnelly +7 more
TL;DR: A review of the various effects driving the O and Cl atoms recombination dynamics on anodized aluminum (AA) and stainless steel (SS) surfaces is presented in this paper, where it is shown that recombination probabilities, γ, can vary following plasma ex-posure due to surface conditioning.
Journal ArticleDOI
Nanoscale Patterning of Zinc Oxide from Zinc Acetate Using Electron Beam Lithography for the Preparation of Hard Lithographic Masks
Ahmad Chaker,Hayden R. Alty,Peng Tian,Anastasios Kotsovinos,Grigore A. Timco,Christopher A. Muryn,Scott M. Lewis,Scott M. Lewis,Richard E. P. Winpenny +8 more
TL;DR: In this paper, an approach for nanoscale patterning of zinc oxide (ZnO) using electron beam (e-beam) lithography for future nanoelectronic devices and for hard lithographic masks is presented.
Journal ArticleDOI
Influence of the film properties on the plasma etching dynamics of rf-sputtered indium zinc oxide layers
L. Stafford,W. T. Lim,Stephen J. Pearton,M. Chicoine,S. C. Gujrathi,François Schiettekatte,Jae-Soung Park,Ju-Il Song,Young-Woo Heo,Joon-Hyung Lee,Jeong-Joo Kim,Ivan I. Kravchenko +11 more
TL;DR: In this paper, the etching characteristics of indium zinc oxide (IZO) films were investigated using a high-density plasma in Ar, Ar∕Cl2, and Ar ∕CH4∕H2 chemistries.
Journal ArticleDOI
Comparison of plasma chemistries for the dry etching of bulk single-crystal zinc-oxide and rf-sputtered indium–zinc-oxide films
W.T. Lim,L. Stafford,J.S. Wright,L.F. Vossa,Rohit Khanna,Ju-Il Song,Jae-Soung Park,Young Woo Heo,Joon-Hyung Lee,Jeong-Joo Kim,David P. Norton,Stephen J. Pearton +11 more
TL;DR: The dry etching characteristics of bulk, single-crystal zinc-oxide (ZnO) and rf-sputtered indium-zincoxide (IZO) films have been investigated using an inductively coupled high-density plasma with different plasma chemistries as discussed by the authors.
References
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Journal ArticleDOI
Evaporated Sn‐doped In2O3 films: Basic optical properties and applications to energy‐efficient windows
I. Hamberg,Claes-Göran Granqvist +1 more
TL;DR: In this paper, the authors reviewed work on In2O3:Sn films prepared by reactive e−beam evaporation of In2 O3 with up to 9 mol'% SnO2 onto heated glass.
Journal ArticleDOI
Transparent Conducting Oxides
David S. Ginley,Clark Bright +1 more
TL;DR: In the interim between the conception of this issue of MRS Bulletin on transparent conducting oxides and its publication, remarkable applications dependent on these materials have continued to make sweeping strides.
Journal ArticleDOI
Photovoltaic Technology: The Case for Thin-Film Solar Cells
TL;DR: The advantages and limitations of photovoltaic solar modules for energy generation are reviewed with their operation principles and physical efficiency limits, and recent developments suggest that thin-film crystalline silicon (especially microcrystalline silicon) is becoming a prime candidate for future photov electricity generation.
Journal ArticleDOI
New n-Type Transparent Conducting Oxides
TL;DR: In this article, a transparent conducting oxide (TCO) thin film composed of binary compounds such as SnO2 and In2O3 was developed by means of chemical-and physical-deposition methods.
Journal ArticleDOI
Criteria for ITO (indium tin-oxide) thin film as the bottom electrode of an organic light emitting diode
TL;DR: In this article, the effect of surface morphology of the ITO electrode on the performance of light emitting diodes was investigated and the relationship between surface and I-V characteristics of OLED was explained.