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Journal ArticleDOI

Linear thermal expansion measurements on silicon from 6 to 340 K

K. G. Lyon, +3 more
- 01 Mar 1977 - 
- Vol. 48, Iss: 3, pp 865-868
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TLDR
In this paper, a linear absolute capacitance dilatometer was used to estimate thermal expansion from 6 to 340 K on a high-purity silicon sample using a linear ACD.
Abstract
Linear thermal expansion measurements have been carried out from 6 to 340 K on a high‐purity silicon sample using a linear absolute capacitance dilatometer. The accuracy of the measurements varies from ±0.01×10−8 K−1 at the lowest temperatures to ±0.1×10−8 K−1 or 0.1%, whichever is greater, near room temperature, and is sufficient to establish silicon as a thermal expansion standard for these temperatures. The agreement with previous data is satisfactory at low temperatures and excellent above room temperature where laser‐interferometry data of comparable accuracy exist. Thermal expansions calculated from ultrasonic and heat‐capacity data are preferred below 13 K where experimental problems occurred.

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Citations
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Journal ArticleDOI

What is the Young's Modulus of Silicon?

TL;DR: In this paper, the authors present the best known elasticity data for silicon, both in depth and in a summary form, so that it may be readily accessible to MEMS designers.
Journal ArticleDOI

Precise determination of lattice parameter and thermal expansion coefficient of silicon between 300 and 1500 K

TL;DR: In this paper, the lattice parameter of high-purity silicon is measured as a function of temperature between 300 and 1500 K, and the linear thermal expansion coefficient is accurately determined.
Journal ArticleDOI

Thermal expansion of solids at low temperatures

TL;DR: In this paper, a survey of experimental data is intended to be comprehensive, and the authors have aimed to select for discussion the most significant contributions from the large volume of theoretical work in recent years.
Journal ArticleDOI

Machine Learning a General-Purpose Interatomic Potential for Silicon

TL;DR: In this article, a Gaussian approximation potential for silicon is presented, which can accurately reproduce density-functional-theory reference results for a wide range of observable properties, including crystal, liquid, and amorphous bulk phases, as well as point, line, and plane defects.
Journal ArticleDOI

Thermo-optic coefficient of silicon at 1550 nm and cryogenic temperatures

TL;DR: In this article, the authors measured the thermo-optic coefficient dn/dT of silicon at 1550nm in the wide temperature range from 5 K to 300‰K.
References
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Journal ArticleDOI

Absolute linear thermal‐expansion measurements on copper and aluminum from 5 to 320 K

TL;DR: In this paper, a linear absolute dilatometer based on a threeterminal parallel-plate capacitor design was used to obtain thermal expansion data for high-purity copper and aluminum from 5 to 320 K.
Journal ArticleDOI

Thermal Expansion of Silicon and Zinc Oxide (I)

TL;DR: In this paper, two mechanical and one electrical Gruneisen parameters are defined and their temperature dependence is calculated from experimental results for zinc oxide using an interferometric and a capacitance method.
Journal ArticleDOI

Thermal expansion of reference materials: copper, silica and silicon

G K White
- 15 Nov 1973 - 
TL;DR: In this article, the thermal expansion of vitreous silica is shown to be particularly sensitive to thermal history values given for the linear coefficient α were determined relative to copper, and existing reference data for copper are discussed.
Journal ArticleDOI

Lattice Constants and Thermal Expansivities of Silicon and of Calcium Fluoride between 6° and 322°K

TL;DR: In this article, an x-ray back-reflection, rotating camera technique was used to obtain lattice constants and thermal expansivities of singlecrystal silicon and calcium fluoride.
Journal ArticleDOI

Thermal expansion of copper, silver, and gold at low temperatures

TL;DR: In this article, the three-terminal capacitance detector of a differential dilatometer has been used to estimate the linear expansion coefficient of copper in the presence of silicon and lithium fluoride as reference materials.