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Journal ArticleDOI

Lowering of the breakdown voltage of silicon dioxide by asperities and at spherical electrodes

N. Klein, +1 more
- 01 Sep 1983 - 
- Vol. 26, Iss: 9, pp 883-892
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TLDR
In this article, the authors examined the assumption that asperites and corners in electrodes can be preferential sites for electrical breakdown of silicon dioxide capacitors and calculated the breakdown voltage at such asperities.
Abstract
The paper examines the assumption that asperites and corners in electrodes can be preferential sites for electrical breakdown of silicon dioxide capacitors. It was assumed for this purpose that asperities can be approximated by spherical surfaces, and the breakdown voltage was then calculated at such asperities. Calculations showed that the breakdown voltage of a planar silicon dioxide capacitor can be lowered by one half to two thirds by asperities, when their radius is less than about one half of the oxide thickness. Such a decrease in the breakdown voltage is widely observed in polysilicon oxide capacitors. The effect of asperities is alleviated by a trapped electron charge, which can increase the breakdown voltage significantly. The spherical asperity model accounted for the breakdown voltages observed on a wide range of polysilicon oxide capacitors with oxide thickness varying from 45 to 820 nm. The radius of asperities responsible for breakdown in these experiments was roughly estimated 25–35 nm.

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Citations
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Journal ArticleDOI

The physics of SiO2 layers

TL;DR: In this article, the physics of silicon dioxide layers, with thicknesses below 100 nm, are presented in a review which focuses on the developments in the 1980s and deals with the whole range of SiO2 properties and behaviour.
Journal ArticleDOI

Ultraclean, integrated processing of thermal oxide structures

TL;DR: In this article, the first ultraclean integrated metal-oxide-semiconductor oxide fabrication has been investigated by combining surface cleaning in inert ambient, wafer transfer through ultrahigh vacuum, and thermal oxidation in an ultra-high vacuum-based reactor.
Journal ArticleDOI

A characterization model for ramp-voltage-stressed I-V characteristics of thin thermal oxides grown on silicon substrate

TL;DR: A theoretical model considering the effects of Fowler-Nordheim tunneling, image-force lowering, first-order trapping kinetics and impact ionization has been developed to characterize the ramp-voltage stressed currentvoltage characteristics of thin oxides grown on silicon substrate.
Journal ArticleDOI

Steps and spikes in current‐voltage characteristics of oxide/microcrystallite‐silicon/oxide diodes

TL;DR: In this article, it was shown that the steps in the currentvoltage characteristics are due to local electrical breakdowns along the edge of metal contacts instead of electron resonant tunneling through the structure.
Journal ArticleDOI

Time-dependent dielectric breakdown of surface oxides during electric-field-assisted sintering

TL;DR: In this paper, the authors used in situ transmission electron microscopy (TEM) to investigate mechanisms of dielectric breakdown during the electric-field-assisted consolidation of nickel nanoparticles which possess an ultrathin surface oxide layer.
References
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Journal ArticleDOI

Electron trapping in SiO2 at 295 and 77 °K

TL;DR: In this article, the electron trapping behavior of SiO2 has been measured as a function of thickness at 295 and 77 °K, and the results indicate bulk traps are dominant at 295 K and traps associated with the Si•SiO2 interface are dominant in 77 Ã 0 K. These observations have been verified using a photo I•V technique.
Journal ArticleDOI

Impact ionization model for dielectric instability and breakdown

TL;DR: In this paper, a model for the incipient stages of intrinsic dielectric breakdown was proposed for a wideband gap insulator with a low hole mobility, and the model predicted an intrinsic breakdown voltage which approached a lower limit of V = 9+φ for very thin films, where φ is the cathode contact barrier in volts.
Journal ArticleDOI

Breakdown in silicon oxide−A review

TL;DR: In this paper, a review of measurement techniques and experimental results obtained on electrical breakdown in SiO2 capacitors is given concerning measurement techniques, experimental results, and breakdown dependence on parameters such as time, thickness, temperature, and electrode material.
Journal ArticleDOI

Interface effects and high conductivity in oxides grown from polycrystalline silicon

TL;DR: In this article, it was concluded from these experiments that the high dark conductivity observed is an interface phenomenon that is due to localized field enhancement near the injecting contact, not being due to positive oxide charge.
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