Proceedings ArticleDOI
Mask defect inspection by detecting polarization variations
Akira Takada,Masato Shibuya +1 more
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TLDR
In this article, a mask defect inspection method that uses detection optics for polarization variation was proposed, which uses the variation of polarization states which are caused by form birefringence in the mask feature.Abstract:
State-of-the-art lithography is often severely influenced by defects that are smaller than the resolution limit of the
mask inspection system. However, the mask inspection suffers from noises comparable to signal of the small defect, due
to illumination nonuniformity, laser speckle, and fluctuation of the sensor signal. In order to overcome these issues, we
propose a novel mask defect inspection method that uses detection optics for polarization variation. This inspection
method uses the variation of polarization states which are caused by form birefringence in the mask feature. Thus the
defect signals in the polarization-variation image can be obtained with sufficient intensity for much smaller defects than
the wavelength. However since pattern edges are especially emphasized in the polarization-variation images, the images
can not faithfully be acquired the mask pattern. To avoid these problems, we simultaneously use both conventional
transmitted inspection images and the polarization variation images. By using numerical simulation, this paper discusses the validity of the mask inspection method that detects the polarization variation. The simulated results show that this new inspection method is quite effective for 20-nm-size defect and smaller ones.read more
Citations
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Proceedings ArticleDOI
EUVL mask inspection using 193nm wavelength for 30nm node and beyond
TL;DR: In inspection results of EUVL masks with 193nm wavelength tools for 30nm and 24nm half-pitch nodes, the dense line and space and contact pattern is considered and the detection sensitivity is affected by contrast variation of defects.
References
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Journal ArticleDOI
Formulation for stable and efficient implementation of the rigorous coupled-wave analysis of binary gratings
TL;DR: In this paper, the authors presented a stable and efficient numerical implementation of the analysis technique for one-dimensional binary gratings for both TE and TM polarization and for the general case of conical diffraction.
Journal ArticleDOI
Eigenmode method for electromagnetic synthesis of diffractive elements with three-dimensional profiles
Eero Noponen,Jari Turunen +1 more
TL;DR: In this article, the authors extend the rigorous eigenmode theory of binary surface-relief gratings to accommodate three-dimensional modulation profiles, formulate a synthesis problem for doubly periodic resonance-domain diffractive elements, and demonstrate some of the problem's symmetry properties.
Eigenmode method for electromagnetic synthesis of diffractive elements with three-dimensional profiles
Eero Noponen,Jari Turunen +1 more
TL;DR: In this article, the authors extend the rigorous eigenmode theory of binary surface-relief gratings to accommodate three-dimensional modulation profiles, formulate a synthesis problem for doubly periodic resonance-domain diffractive elements, and demonstrate some of the problem's symmetry properties.
Journal ArticleDOI
Numerical simulation of high-NA quantitative polarization microscopy and corresponding near-fields
TL;DR: In this article, a model based on the pupil approach and the Fourier modal method is presented for numerical simulation of high numerical aperture polarization microscopy images and the near-fields producing them.
Journal ArticleDOI
Polarization influence on imaging
Michael Totzeck,Paul Gräupner,Tilmann Heil,Aksel Göhnermeier,Olaf Dittmann,Daniel Krähmer,Vladimir Kamenov,Johannes Ruoff,Donis G. Flagello +8 more
TL;DR: The aberrations of the Jones matrix pupil are a suitable tool to identify the main drivers determining polarization performance and enable us to compare the polarized and unpolarized performance of such a characterized lithographic system.