Patent
Method and apparatus for reducing color conflicts during trim generation for phase shifters
Seonghun Cho,Shao-Po Wu +1 more
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TLDR
In this article, a system for generating trim to be used in conjunction with phase shifters during an optical lithography process for manufacturing an integrated circuit is described, where the system operates by identifying a feature within the integrated circuit to be created by using a phase shifter to produce a region of destructive light interference.Abstract:
One embodiment of the invention provides a system for generating trim to be used in conjunction with phase shifters during an optical lithography process for manufacturing an integrated circuit The system operates by identifying a feature within the integrated circuit to be created by using a phase shifter to produce a region of destructive light interference on a photoresist layer Next, the system generates the phase shifter for a first mask, while ensuring that design rules are satisfied in defining dimensions for the phase shifter After the phase shifter is generated, the system generates trim within a second mask, that is used in conjunction with the first mask, by deriving the trim from the previously-defined dimensions of the phase shifter while ensuring that the design rules are satisfied Note that the design rules can be satisfied by cutting and/or patching portions of the phase shifter and associated trimread more
Citations
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Patent
System and method for the online design of a reticle field layout
TL;DR: In this article, a system and method for creating a reticle field layout (RFL) is presented, which includes receiving information for a RFL design by a computer system directly from a user via a computer interface.
Patent
Method and apparatus for identifying and correcting phase conflicts
TL;DR: In this article, the authors present a system that identifies a substantially minimal set of phase conflicts in a PSM-layout that when corrected renders the PSM layout phase-assignable.
Patent
Method of conflict avoidance in fabrication of gate-shrink alternating phase shifting masks
Lars W. Liebmann,Ioana Graur +1 more
TL;DR: In this article, an alternating phase shift mask layout is designed for projecting an image of an integrated circuit design having a plurality of features to be projected using alternating phase shifting segments, including a gate shrink region of a transistor having a critical width along a length thereof that extends beyond a diffusion region.
Patent
Phase edge phase shift mask enforcing a width of a field gate image and fabrication method thereof
Dong-Hyun Kim,Moon-Hyun Yoo,Jeong-Lim Nam,Yoo-Hyon Kim,Chul-Hong Park,Soo-Han Choi,Young-Chan Ban,Hye-Soo Shin +7 more
TL;DR: In this article, a phase edge phase shift mask and a fabrication method for enforcing a width of a field gate image located on a field region, which is weakened by a two exposure process, was presented.
References
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Journal ArticleDOI
Improving resolution in photolithography with a phase-shifting mask
TL;DR: The phase-shifting mask as mentioned in this paper consists of a normal transmission mask that has been coated with a transparent layer patterned to ensure that the optical phases of nearest apertures are opposite.
Patent
Phase shifting circuit manufacture method and apparatus
Yao-Ting Wang,Yagyensh C. Pati +1 more
TL;DR: In this article, the phase shift mask and the single phase structure mask are derived from a set of masks used in a larger minimum dimension process technology and used for shrinking integrated circuit designs.
Proceedings ArticleDOI
Optimum mask and source patterns to print a given shape
Alan E. Rosenbluth,Scott J. Bukofsky,Michael S. Hibbs,Kafai Lai,Antoinette F. Molless,Rama Nand Singh,Alfred K. K. Wong +6 more
TL;DR: In this paper, the authors developed an algorithm that can optimize mask and source without using a starting design, where the optimized mask will often consist of novel sets of shapes that are quite different in layout from the target IC patterns.
Journal ArticleDOI
Phase-shifting masks for microlithography: automated design and mask requirements
Y.C. Pati,Thomas Kailath +1 more
TL;DR: A computationally viable algorithm is proposed for the rapid design of phase-shifting masks for arbitrary two-dimensional patterns based on the use of a class of optimal coherent approximations to partially coherent imaging systems described by the Hopkins model.
Patent
Phase shift masking for complex patterns with proximity adjustments
TL;DR: In this paper, techniques for extending the use of phase shift techniques to implementation of masks used for complex layouts in the layers of integrated circuits, beyond selected critical dimension features, are presented.