Journal ArticleDOI
Microstructural characterizations of magnetron sputtered Ti films on glass substrate
TLDR
In this article, magnetron sputtered Ti thin films were characterized by X-ray diffraction, scanning electron microscopy and atomic force microscopy, showing an increasing trend with power, pressure, and temperature from the Atomic Force Microscopy analysis.About:
This article is published in Journal of Materials Processing Technology.The article was published on 2009-04-01. It has received 111 citations till now. The article focuses on the topics: Thin film & Sputtering.read more
Citations
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Journal ArticleDOI
Nanostructured Zro2 as an Anti Contamination Coating for Hv Insulator – an Experimental Analysis
Sujit Kumar Sujit Kumar,Tjprc +1 more
TL;DR: In this article, the authors developed and characterized dielectric and hydrophobic zirconium oxide thin films, deposited on porcelain insulators surfaces, using a direct current (DC) magnetron sputtering.
Estudio de los mecanismos de crecimiento en función de las fases presentes y la evaluación de la microestructura en películas de TaxNy obtenidas por deposición física en fase de vapor asistida por plasma
Serna Manrique,Milton David +1 more
TL;DR: Tesis presentada como requisito parcial para optar al titulo de Magister en Ciencias -Fisica as mentioned in this paper, was presented as a criterion for choosing a Magister in 2010.
Journal ArticleDOI
Nanotubular TiOxNy-Supported Ir Single Atoms and Clusters as Thin-Film Electrocatalysts for Oxygen Evolution in Acid Media
Luka Suhadolnik,Marjan Bele,Miha Čekada,Primož Jovanovič,Nik Maselj,Anja Lončar,Goran Dražić,Martin Šala,Nejc Hodnik,Janez Kovač,Tiziano Montini,Michele Melchionna,Paolo Fornasiero +12 more
TL;DR: In this article , the authors presented a method for the production of cluster and single atom-based thin-film electrode composites from a sputtered Ti-O2-Ir alloy.
Journal ArticleDOI
Structural development and phase transformation behavior of thermally-oxidization Ti by sputtering power and OAD technique
TL;DR: Anatase to rutile phase transition (ARPT) of thermally-oxidized Ti films have been investigated via effect of sputtering power and oblique angle deposition (OAD) technique as discussed by the authors .
Journal ArticleDOI
Vertical Alignment TiO2 Nanotube Based on Ti Film Prepared via Anodization Technique
K. Aiempanakit,Sukittaya Jessadaluk,Sunisa Tongmaha,Attawit Supati,Narathon Khemasiri,Supanit Pornthreeraphat,Mati Horprathum,Viyapon Patthanasetakul,Pitak Eiamchai +8 more
TL;DR: In this paper, a highly ordered nanotube TiO2 was successfully prepared from sputtered Ti metal film using anodization process, and the applied of anodizing voltage was systematically controlled between 20 - 60 volts along fabrication process, respectively.
References
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Journal ArticleDOI
High Rate Thick Film Growth
TL;DR: In this paper, a review of the physical vapor deposition (PVD) of thin films is presented, focusing mainly on evaporation and sputtering processes and the physics of their growth and structure.
Journal ArticleDOI
An overview on the use of titanium in the aerospace industry
TL;DR: Titanium and titanium alloys are excellent candidates for aerospace applications owing to their high strength to weight ratio and excellent corrosion resistance as discussed by the authors.However, titanium usage is strongly limited by its higher cost relative to competing materials, primarily aluminum alloys and steels.