Journal ArticleDOI
Microstructural characterizations of magnetron sputtered Ti films on glass substrate
TLDR
In this article, magnetron sputtered Ti thin films were characterized by X-ray diffraction, scanning electron microscopy and atomic force microscopy, showing an increasing trend with power, pressure, and temperature from the Atomic Force Microscopy analysis.About:
This article is published in Journal of Materials Processing Technology.The article was published on 2009-04-01. It has received 111 citations till now. The article focuses on the topics: Thin film & Sputtering.read more
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Comparison of the Electrochemical Behavior of Ti and Nanostructured Ti-Coated AISI 304 Stainless Steel in Strongly Acidic Solutions
TL;DR: In this article, the electrochemical properties of pure titanium and nanostructured (NS) Ti-coated AISI 304 stainless steel in strongly acidic solutions of H2SO4 were investigated and compared.
Journal ArticleDOI
Polytetrafluoroethylene Sputtered PES Membranes for Membrane Distillation: Influence of RF Magnetron Sputtering Conditions
TL;DR: In this paper, thin films of fluorocarbon were deposited on polyethersulfone membranes via argon plasma sputtering of a poly(tetrafluoroethylene) (PTFE) target in an RF magnetron plasma reactor.
Journal ArticleDOI
GROWTH OF AgInSe2 ON Si(100) SUBSTRATE BY PULSE LASER ABLATION
TL;DR: In this paper, high quality AgInSe2 (AIS) films were grown onto Si(100) substrates kept at different temperatures using ultra high vacuum pulsed laser deposition (PLD) technique from the AIS target synthesized from high-purity materials.
Journal ArticleDOI
Preparation of Highly (002) Oriented Ti Films on a Floating Si (100) Substrate by RF Magnetron Sputtering
TL;DR: In this article, the possibility of preparing highly (002) oriented Ti films on the Si (100) substrate was studied using RF sputtering and the deposition behavior was compared between floating and grounded substrates at room temperature.
Journal ArticleDOI
Effects of sputtering power on microstructure and mechanical properties of TiVCr films
TL;DR: In this article, the effects of sputtering power on the microstructure of direct-current magnetron sputter-deposited TiVCr films on silicon wafer grown at room temperature were investigated.
References
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Journal ArticleDOI
High Rate Thick Film Growth
TL;DR: In this paper, a review of the physical vapor deposition (PVD) of thin films is presented, focusing mainly on evaporation and sputtering processes and the physics of their growth and structure.
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An overview on the use of titanium in the aerospace industry
TL;DR: Titanium and titanium alloys are excellent candidates for aerospace applications owing to their high strength to weight ratio and excellent corrosion resistance as discussed by the authors.However, titanium usage is strongly limited by its higher cost relative to competing materials, primarily aluminum alloys and steels.