Journal ArticleDOI
Microstructural characterizations of magnetron sputtered Ti films on glass substrate
TLDR
In this article, magnetron sputtered Ti thin films were characterized by X-ray diffraction, scanning electron microscopy and atomic force microscopy, showing an increasing trend with power, pressure, and temperature from the Atomic Force Microscopy analysis.About:
This article is published in Journal of Materials Processing Technology.The article was published on 2009-04-01. It has received 111 citations till now. The article focuses on the topics: Thin film & Sputtering.read more
Citations
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Journal ArticleDOI
Microstructure and mechanical properties of multiphase layer formed during depositing Ti film followed by plasma nitriding on 2024 aluminum alloy
Fanyong Zhang,M.F. Yan +1 more
TL;DR: In this article, a multiphase layer with three sub-layers (i.e., the outmost TiN 0.3 layer, the intermediate Al 3 Ti layer and the inside Al 18 Ti 2 Mg 3 layer) was obtained.
Journal ArticleDOI
TiO2 nanowires on Ti thin film for water purification
Enrica Arcadipane,Ruy Sanz,Maria Miritello,Giuliana Impellizzeri,Maria Grazia Grimaldi,Vittorio Privitera,Lucia Romano +6 more
TL;DR: In this paper, the photocatalytic activity and the photonic efficiency in the degradation of the Methilene Blue (MB) dye were investigated, and the contribution of the rutile TiO 2 nanowires in the process was noted.
Journal ArticleDOI
Photocatalytic TiO2 thin films deposited on flexible substrates by radio frequency (RF) reactive magnetron sputtering
D.Y. Chen,C.C. Tsao,C.Y. Hsu +2 more
TL;DR: In this article, the effects of the deposition parameters on the structure, morphology and photocatalytic performance of the TiO2 films were analyzed using scanning electron microscopy (SEM), X-ray diffraction and UV-vis-NIR spectroscopy.
Journal ArticleDOI
Preparation of (001) preferentially oriented titanium thin films by ion-beam sputtering deposition on thermal silicon dioxide
Imrich Gablech,Vojtěch Svatoš,Ondřej Caha,Miloš Hrabovský,Jan Prasek,Jaromir Hubalek,Tomáš Šikola +6 more
TL;DR: In this article, the ion-beam sputtering was used to provide Ti thin films of desired crystallographic orientation and smooth surface morphology not obtainable with conventional deposition techniques such as magnetron sputtering and vacuum evaporation.
Journal ArticleDOI
Low-temperature chemical vapor deposition (CVD) of metallic titanium film from a novel precursor
TL;DR: In this paper, the metallic Ti film was successfully deposited on the metal substrates at a temperature as low as 620°C by developing a novel TiCl2 precursor of chemical vapor deposition (CVD) from a Ti-TiCl4 system, much lower than 1140°C and 1200 °C reported.
References
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Journal ArticleDOI
High Rate Thick Film Growth
TL;DR: In this paper, a review of the physical vapor deposition (PVD) of thin films is presented, focusing mainly on evaporation and sputtering processes and the physics of their growth and structure.
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An overview on the use of titanium in the aerospace industry
TL;DR: Titanium and titanium alloys are excellent candidates for aerospace applications owing to their high strength to weight ratio and excellent corrosion resistance as discussed by the authors.However, titanium usage is strongly limited by its higher cost relative to competing materials, primarily aluminum alloys and steels.