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Journal ArticleDOI

Microstructural characterizations of magnetron sputtered Ti films on glass substrate

TLDR
In this article, magnetron sputtered Ti thin films were characterized by X-ray diffraction, scanning electron microscopy and atomic force microscopy, showing an increasing trend with power, pressure, and temperature from the Atomic Force Microscopy analysis.
About
This article is published in Journal of Materials Processing Technology.The article was published on 2009-04-01. It has received 111 citations till now. The article focuses on the topics: Thin film & Sputtering.

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Citations
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Characterizing the uptake, accumulation and toxicity of silver sulfide nanoparticles in plants

TL;DR: Observations, for the first time, provide direct evidence that plants take up Ag2S-NPs without a marked selectivity in regard to particle size and without substantial transformation during translocation from roots to shoots.
Journal ArticleDOI

Effect of Ar:N2 ratio on structure and properties of Ni–TiN nanocomposite thin films processed by reactive RF/DC magnetron sputtering

TL;DR: In this paper, Ni-TiN nanocomposites have been deposited on Si (100) substrate at Ar:N-2 = 1:1, 1:2 or 1:3 at ambient temperature by reactive co-sputtering of Ti and Ni targets used as RF and DC sources.
Journal ArticleDOI

TiAgx thin films for lower limb prosthesis pressure sensors: Effect of composition and structural changes on the electrical and thermal response of the films

TL;DR: In this paper, a DC magnetron sputtering was used to sputter a pure Ti target containing different amounts of Ag pellets, resulting in a relatively large range of composition, which gave rise to varied morphological, structural and some selected property responses.
Journal ArticleDOI

Thickness effect on properties of titanium film deposited by d.c. magnetron sputtering and electron beam evaporation techniques

TL;DR: In this paper, the effect of thickness on the properties of titanium (Ti) film deposited on Si/SiO2 (100) substrate using two different methods: magnetron sputtering and electron beam (e-beam) evaporation technique.
References
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Journal ArticleDOI

Properties of titanium nitride films prepared by direct current magnetron sputtering

TL;DR: In this paper, the results were discussed with respect to N2 concentration and thickness of the films at low and high N2 concentrations, respectively, and the results showed that the properties of the TiN films increased with increase in the film thickness and the presence of nitride, oxynitride and oxide phases associated with TiNx phases.
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Structural characterizations of magnetron sputtered nanocrystalline TiN thin films

TL;DR: In this paper, the effect of deposition temperature and time on the microstructural morphologies of Nanocrystalline TiN thin films was characterized by using FE-SEM and AFM.
Journal ArticleDOI

Properties of titanium thin films deposited by dc magnetron sputtering

TL;DR: In this article, the compositional properties of the Ti thin films were studied using four point probe, XPS and spectroscopic ellipsometry techniques and the structural properties were obtained using XRD, SEM and AFM techniques.
Journal ArticleDOI

Influence of film thickness on texture and electrical and optical properties of room temperature deposited nanocrystalline V2O5 thin films

TL;DR: In this article, the shape of the crystallite changes from a rod-like to a brick-like structure with change in crystallographic orientation from (001) to (200).
Journal ArticleDOI

Effect of thermal oxidation conditions on tribological behaviour of titanium films on 316L stainless steel

TL;DR: In this article, a surface coating technique has been developed to enhance the tribological properties of AISI 316L stainless steel, which involves the deposition of a titanium film onto a stainless steel by magnetron sputtering and then thermal oxidation to partially convert the titanium film to titanium oxide.
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