Journal ArticleDOI
Reduction of Particle Contamination in Plasma-Etching Equipment by Dehydration of Chamber Wall
TLDR
In this paper, the mechanism of particle generation is investigated in order to prevent defects formed on wafers in the plasma etching of multi-layered films composed of tungsten silicide (WSi) and polycrystalline silicon (poly-Si).Abstract:
The mechanism of particle generation is investigated in order to prevent defects formed on wafers in the plasma etching of multi-layered films composed of tungsten silicide (WSi) and polycrystalline silicon (poly-Si). Particles are measured by an in situ monitoring system using laser light scattering during the etching process. The particles are composed of AlF3, which is presumably generated by reacting the coating material Al2O3 on the etching chamber wall with plasma containing fluorine atoms, F in the presence of H2O absorbed into the chamber parts and materials. We demonstrated successfully that dehydration of the chamber parts and materials by plasma discharge suppresses particle generation.read more
Citations
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Journal ArticleDOI
Plasma etching behavior of Y2O3 ceramics: Comparative study with Al2O3
Yu-Chao Cao,Yu-Chao Cao,Lei Zhao,Jin Luo,Ke Wang,Bo-Ping Zhang,Hiroki Yokota,Yoshiyasu Ito,Jing-Feng Li +8 more
TL;DR: In this paper, the plasma etching behavior of Y2O3 coating was investigated and compared with that of Al2O 3 coating under various conditions, including chemical etching, mixing etching and physical etching.
Journal ArticleDOI
Fluorination mechanisms of Al2O3 and Y2O3 surfaces irradiated by high-density CF4∕O2 and SF6∕O2 plasmas
TL;DR: In this article, the fluorination of Al2O3 and Y2O 3 surfaces was investigated by irradiating high-density, helicon-wave CF4∕O2 and SF6∕ O2 plasmas.
Journal ArticleDOI
X-Ray Photoelectron Spectroscopy Study on the Interaction of Yttrium–Aluminum Oxide with Fluorine-Based Plasma
TL;DR: In this paper, the etch behavior and surface chemical status of these oxides were discussed in terms of thermodynamic aspects of aluminum and yttrium fluoride, showing a higher ratio of Y−F to Y−O bonding than the ratio of Al−Fto Al−O. But the results of the X-ray photoelectron spectroscopy (XPS) analysis of a multication YAlO3 single crystal, revealed the presence of a fluorinated layer of a few nanometer thick under a roughly 1 nm carboneous top layer.
Journal ArticleDOI
Comparison of Erosion Behavior and Particle Contamination in Mass-Production CF₄/O₂ Plasma Chambers Using Y₂O₃ and YF₃ Protective Coatings.
TL;DR: Results indicate that the YF3 coating is a more erosion-resistant material, resulting in fewer contamination particles compared with the Y2O3 coating.
Journal ArticleDOI
Relative sputtering rates of oxides and fluorides of aluminum and yttrium
TL;DR: In this article, the authors measured the relative sputtering rates of oxide ceramics under fluorocarbon plasma exposure and found that the sputtering rate of oxides was nearly identical with the sputtered rate of fluorinated surfaces.
References
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Journal ArticleDOI
Transport of dust particles in glow-discharge plasmas.
TL;DR: A theory is presented for the transport of dust particles in glow-discharge plasmas and the dominant force is shown to be dependent upon the particle size and location within the discharge.
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Particle trapping phenomena in radio frequency plasmas
TL;DR: In this article, the authors used laser light scattering with the laser beam rapidly rastered in a plane parallel to the rf electrode, and observed that there is significant negative charge on the particles.
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Dynamics of fine particles in magnetized plasmas
TL;DR: In this paper, it was shown that fine-particle clouds rotate in the azimuthal direction on the horizontal plane even in such a weak magnetic field that positive ions are slightly magnetized.
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Rastered laser light scattering studies during plasma processing: Particle contamination trapping phenomena
TL;DR: In this paper, the distribution and transport of particles in materials processing plasmas has been studied with a rastered laser light scattering technique and it has been shown that the distribution of particles is rarely random and that structured clouds of particles form at the plasma/sheath boundary.
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Monte Carlo‐fluid hybrid model of the accumulation of dust particles at sheath edges in radio‐frequency discharges
TL;DR: In this paper, a hybrid Monte Carlo-fluid simulation of electron, ion, and charged dust transport in radio-frequency (rf) and direct-current (dc) discharges is applied to investigate the dynamics of particulate contamination.