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Self-organized In0.4Ga0.6As quantum-dot lasers grown on Si substrates

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TLDR
In this article, the growth of self-organized In0.4Ga0.6As quantum dots on Si substrates by molecular-beam epitaxy was reported, and the optical properties of the self-organised quantum dots were compared to quantum dots grown on GaAs.
Abstract
We report growth of self-organized In0.4Ga0.6As quantum dots on Si substrates by molecular-beam epitaxy. Low-temperature (17 K) photoluminescence spectra show that the optical properties of In0.4Ga0.6As quantum dots grown on Si are comparable to quantum dots grown on GaAs substrates. We also present preliminary characteristics of In0.4Ga0.6As quantum-dot lasers grown on Si substrates. Light versus current measurements at 80 K under pulsed bias conditions show that Ith=3.85 kA/cm2. The lasing spectral output has a peak emission wavelength of 1.013 μm and a linewidth (full width at half maximum) of ∼4 A at the threshold.

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Perspective: The future of quantum dot photonic integrated circuits

TL;DR: In this paper, quantum dot active layers for lasers and amplifiers on and off Si have been demonstrated, and results for quantum dot based photodetectors and modulators look promising.
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Quantum dot lasers for silicon photonics [Invited]

TL;DR: In this paper, the authors review recent advances in the field of quantum dot lasers on silicon and present a summary of device performance, reliability, and comparison with similar quantum well lasers grown on silicon.
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Semiconductor quantum-dot nanostructures: Their application in a new class of infrared photodetectors

TL;DR: In this article, the state-of-the-art in the use of quantum-dot nanostructures in infrared detectors is reviewed, and the progress, challenges, and projections for continued development of normal-incidence intersublevel detectors operating in the spectral region between 6 and 20 /spl mu/m.
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Photonic Integration With Epitaxial III–V on Silicon

TL;DR: In this paper, the authors present a brief overview of the various leading platforms for photonic integration and consider the possibility of a photonic integrated circuit platform utilizing epitaxially grown III-V material on silicon without the need for wafer bonding, or an externally coupled laser.
References
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Journal ArticleDOI

Self-organization in growth of quantum dot superlattices.

TL;DR: The growth of multilayer arrays of coherently strained islands self-organizes into a more regular three-dimensional arrangement, providing a possible route to obtain the size uniformity needed for electronic applications of quantum dot arrays.
Journal ArticleDOI

Growth by molecular beam epitaxy and characterization of InAs/GaAs strained‐layer superlattices

TL;DR: In this article, InAs/GaAs superlattices with ultra-thin InAs (few monolayer) were grown on GaAs substrates and the physical properties: x ray, transmission electron microscopy, and photoluminescence were used to characterize the different growth processes.
Journal ArticleDOI

Role of strain and growth conditions on the growth front profile of InxGa1−xAs on GaAs during the pseudomorphic growth regime

TL;DR: Theoretical and experimental studies are presented in this article to understand the initial stages of growth of InGaAs on GaAs and show that the free energy minimum surface of the epilayer is not atomically flat, but three-dimensional in form.
Journal ArticleDOI

Room-temperature operation of In0.4Ga0.6As/GaAs self-organised quantum dot lasers

TL;DR: In this article, the room-temperature operating characteristics of InGaAs/GaAs self-organised quantum dot lasers grown by molecular beam epitaxy were reported, and the emission wavelength was 1.028 µm and Jth = 650 A/cm2 for a 90 µm × 1 mm broad-area laser.
Journal ArticleDOI

Excited states in self‐organized InAs/GaAs quantum dots: Theory and experiment

TL;DR: In photoluminescence spectra of nanometer-scale pyramidal-shaped InAs/GaAs quantum dots, optical transitions involving excited hole states are revealed in addition to the ground state transition as mentioned in this paper.
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