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Journal ArticleDOI

Single asperity tribochemical wear of silicon nitride studied by atomic force microscopy

W. Maw, +3 more
- 21 Oct 2002 - 
- Vol. 92, Iss: 9, pp 5103-5109
TLDR
In this paper, the authors measured the wear of atomic force microscope tips translated against a variety of substrates in aqueous solutions and showed that the chemical nature of the substrate plays an important role: significant wear was observed only when the substrate surface is populated with appropriate metal-hydroxide bonds.
Abstract
Nanometer scale single asperity tribochemical wear of silicon nitride was examined by measuring the wear of atomic force microscope tips translated against a variety of substrates in aqueous solutions. We show that the chemical nature of the substrate plays an important role: significant wear was observed only when the substrate surface is populated with appropriate metal-hydroxide bonds. Mica and calcite substrates, whose water-exposed cleavage surfaces lack these bonds, produced little if any tip wear. As a function of contact force FN and scan duration t, the length of the tips in this work decreases approximately as (FNt)0.5. We propose that pressure-induced intermediate states involving hydroxyl groups form on both the tip and the substrate; chemical reactions subsequently form transient bridging chemical bonds that are responsible for tip wear.

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Citations
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Journal ArticleDOI

Nanotribology and MEMS

TL;DR: In this paper, the authors review fundamental tribological problems related to micro-and nanoscale mechanical contacts and developments in MEMS lubrications, and present new nano-engineering approaches for MEMS devices with moving structures.
Journal ArticleDOI

Orthopedic applications of silicon nitride ceramics.

TL;DR: This review will provide background information and data relating to Si(3)N(4) ceramics that will be of interest to engineering and medical professionals.
Journal ArticleDOI

Ultralow nanoscale wear through atom-by-atom attrition in silicon-containing diamond-like carbon

TL;DR: The batch fabrication of ultrasharp diamond-like carbon tips that contain significant amounts of silicon on silicon microcantilevers for use in atomic force microscopy are demonstrated and it is found that the classical wear law of Archard does not hold at the nanoscale.
Journal ArticleDOI

Critical length scale controls adhesive wear mechanisms

TL;DR: It is shown that discrepant observations and predictions of two distinct adhesive wear mechanisms can be reconciled into a unified framework and a transition in the asperity wear mechanism when contact junctions fall below a critical length scale is revealed.
Journal ArticleDOI

Method for Characterizing Nanoscale Wear of Atomic Force Microscope Tips

TL;DR: The method provides a quantitative and systematic process for examining tip degradation and nanoscale wear, and the experimental results illustrate the multiple mechanisms that may lead to tip failure.
References
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Journal ArticleDOI

Scratching the Surface: Fundamental Investigations of Tribology with Atomic Force Microscopy.

TL;DR: The goal of this paper is to demonstrate that AFM is capable of producing atomic-scale knowledge, and to focus upon some of the contributions of the AFM to nanotribology.
Journal ArticleDOI

Chemical processes in glass polishing

TL;DR: In this article, a detailed mechanico-chemical model for the glass polishing process is proposed, and the central chemical process which occurs is the interaction of both the glass surface and the polishing particle with water.
Journal ArticleDOI

Friction and Wear of Silicon Nitride and Silicon Carbide in Water: Hydrodynamic Lubrication at Low Sliding Speed Obtained by Tribochemical Wear

TL;DR: In this article, the friction coefficient of Si3N4 and SiC sliding against themselves and against each other in water at room temperature is described, with an estimated water film thickness of 70 nm.
Journal ArticleDOI

Formation of tribochemical layer of ceramics sliding in water and its role for low friction

TL;DR: The formation of a tribochemical layer on silicon nitride sliding in water is studied in this article, where an additive that accelerates the formation of colloidal silica makes the running-in distance shorter.
Journal ArticleDOI

Mechanism of polishing of SiO2 films by CeO2 particles

TL;DR: In this paper, the authors examined the polishing mechanism in chemical mechanical polishing of a thermally grown SiO 2 film by CeO 2 particles, and the surface structure of the film and the waste were investigated by various analytical means.
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