Journal ArticleDOI
Submicron x‐ray lithography using laser‐produced plasma as a source
TLDR
In this paper, a single target shot of a frequency-tripled Nd:glass laser (λ=0.35 μm, 35 J in 1 ns) was found to be sufficient for submicron x-ray lithography in poly(butene‐1‐sulfone) (PBS) or poly(glycidyl‐methacrylate‐ethyl acrylate) (COP) resists.Abstract:
X‐ray lithography was studied, using laser‐produced plasma as a source. A single target shot of a frequency‐tripled Nd:glass laser (λ=0.35 μm, 35 J in 1 ns) was found to be sufficient for submicron x‐ray lithography in poly(butene‐1‐sulfone) (PBS) or poly(glycidyl‐methacrylate‐ethyl acrylate) (COP) resists. The incident x‐ray flux is about an order of a magnitude smaller than that normally required. This behavior could be the result of the transient character of the exposure and an abrupt rise in the resist temperature.read more
Citations
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Journal ArticleDOI
Single metal nanoparticles: optical detection, spectroscopy and applications
Peter Zijlstra,Michel Orrit +1 more
TL;DR: In this paper, a review of far-field optical techniques that have sufficient sensitivity to detect single metal particles is presented, and the importance of single-particle detection techniques in their development is emphasized.
Journal ArticleDOI
Conversion efficiencies from laser-produced plasmas in the extreme ultraviolet regime
TL;DR: In this article, the conversion efficiency of spectral emission from laser-irradiated solid targets was investigated for short wavelength source development, and the plasma brightness was quantified using absolutely calibrated detectors for 20 materials and spectra were obtained between 50 and 200 A.
Journal ArticleDOI
Plasmonic nanoparticles: fabrication, simulation and experiments
TL;DR: In this article, a review of the optical properties of single plasmonic nanostructures is presented, with a focus on the properties of surface plasmons and their application in light localization, elastic and inelastic scattering of light and interaction between optical and other physical properties.
Journal ArticleDOI
Ablation of organic polymers by 46.9-nm-laser radiation
Libor Juha,Michal Bittner,D. Chvostova,J. Krasa,Zdenek Otcenasek,A. R. Präg,J. Ullschmied,Z. Pientka,Jacek Krzywinski,Jerzy B. Pelka,Andrzej Wawro,M. Grisham,Georgiy O. Vaschenko,Carmen S. Menoni,Jorge J. Rocca +14 more
TL;DR: In this paper, the authors report results of the exposure of poly(tetrafluoroethylene) -(PTFE), poly(methyl methacrylate) - (PMMA), and polyimide -(PI) to intense 46.9-nm-laser pulses of 1.2-ns-duration at fluences ranging from ∼0.1 to ∼10J∕cm2.
Patent
Apparatus for producing soft x-rays using a high energy beam
Etsuo C,O Patent Division Noda,Setsuo C,O Patent Division Suzuki,Osami C,O Patent Division Morimiya +5 more
TL;DR: In this paper, a soft X-ray apparatus is presented in which a liquid target material, preferably mercury, is discharged in the form of a series of discontinuous droplets.
References
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Book
Advances in X-Ray Analysis
TL;DR: The proceedings of the 13th Annual Conference on Applications of X-Ray Analysis (Denver, Colorado, August 3-7, 1981) as mentioned in this paper were concerned with XRF detectors and XRF instrumentation.
Journal ArticleDOI
Demonstration of high efficiency third harmonic conversion of high power Nd-glass laser radiation
TL;DR: In this article, the authors reported an efficient conversion from 1.054 μm to 0.35 μm by third harmonic generation in two Type II KDP crystals, achieving energy conversion efficiencies of up to 80% under conditions applicable to large glass laser systems.
Journal ArticleDOI
X‐ray lithography using a pulsed plasma source
J. S Pearlman,J. C. Riordan +1 more
TL;DR: In this article, an imploding gas jet plasma has been developed as a soft x-ray source for lithographic applications, which is an efficient source of krypton L radiation, which closely matches the wavelength of tungsten anode electron bombardment sources.
Journal ArticleDOI
Laser-plasma interactions at 0.53 µm for disk targets of varying-Z
W. C. Mead,E. M. Campbell,Kent Estabrook,R. E. Turner,William L. Kruer,P. H. Y. Lee,B. Pruett,V. C. Rupert,K. G. Tirsell,G. Stradling,F. Ze,Claire E. Max,M. D. Rosen +12 more
Journal ArticleDOI
High X-ray conversion efficiency with target irradiation by a frequency tripled Nd : Glass laser
B. Yaakobi,P. Bourke,Y. Conturie,J. A. Delettrez,James M. Forsyth,R.D. Frankel,L.M. Goldman,R. L. McCrory,W. Seka,J. M. Soures,A.J Burek,R.E Deslattes +11 more
TL;DR: In this paper, a glass laser was used to irradiate targets of various materials at ∼5 x 1014W/cm2 and the authors reported conversion efficiencies of between 1% and 0.1% for individual X-ray lines between 1.8 and 7.8 keV.