Journal ArticleDOI
Submicrosecond X-ray lithography
TLDR
In this article, laser-heated plasmas were used to replicate features as fine as 750 nm in the positive resist polybutene-1-sulfone (p.b.s.).Abstract:
X-rays from laser-heated plasmas were used to replicate features as fine as 750 nm in the positive resist polybutene-1-sulfone (p.b.s.). The measured sensitivities of p.b.s. to pulsed and d.c. X-rays (≈ 109 ratio in exposure rate) are similar (no reciprocity loss). Laser-plasma X-rays produced only small (0.25 V) flat-band shifts in m.o.s. capacitors at irradiation levels sufficient to expose p.b.s.read more
Citations
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Journal ArticleDOI
Repetitively pulsed-plasma soft x-ray source.
D. J. Nagel,Charles M. Brown,Martin C. Peckerar,Marshall L. Ginter,J. A. Robinson,Thomas J. McIlrath,P K Carroll +6 more
TL;DR: Spectral, temporal, and spatial characteristics of these plasma emissions are presented together with an application of the source to soft x-ray lithography.
Journal ArticleDOI
Submicron x‐ray lithography using laser‐produced plasma as a source
TL;DR: In this paper, a single target shot of a frequency-tripled Nd:glass laser (λ=0.35 μm, 35 J in 1 ns) was found to be sufficient for submicron x-ray lithography in poly(butene‐1‐sulfone) (PBS) or poly(glycidyl‐methacrylate‐ethyl acrylate) (COP) resists.
Journal ArticleDOI
X-ray yields of plasmas heated by 8-nsec neodymium laser pulses
TL;DR: In this paper, beryllium through uranium were irradiated with 8nsec FWHM Nd-glass laser pulses focused to ∼4×1013 W/cm2.
Journal ArticleDOI
Optimization of x‐ray sources for proximity lithography produced by a high average power Nd:glass laser
Peter M. Celliers,L. B. Da Silva,C.B. Dane,Stanley Mrowka,Mary A. Norton,J. Harder,Lloyd A. Hackel,Dennis L Matthews,Henryk Fiedorowicz,Andrzej Bartnik,Juan R. Maldonado,J. A. Abate +11 more
TL;DR: In this article, the conversion efficiency of laser pulse energy into keV x rays from a variety of solid planar targets and a Xe gas puff target irradiated using a high average power Nd:glass slab laser capable of delivering 13 ns full width at half-maximum pulses at up to 20 J at 1.053 μm and 12 J at 0.53 μm.
Journal ArticleDOI
X-ray lithography
TL;DR: A brief history of some of the world's major efforts in X-ray lithography is provided and a discussion of the potential future of the approach in microlithography is discussed.
References
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Book ChapterDOI
X-ray lithography
E. Spille,R. Feder +1 more
TL;DR: The use of more than one X-ray source could fulfill the requirements imposed by mask making and device fabrication as discussed by the authors, which is a natural complement to electron beam pattern generation and photolithography seems to fill a need in the fabrication of submicron devices.