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The wafer yield is a useful measure of the process quality, but other features are necessary to account for.
Based on a first-pass design of a 16K chip, a significant improvement in the number of usable bits per wafer appears possible.
Compared to the recently research of 3D chip-to-wafer or wafer-to-wafer stacking, it demonstrated of wafer stacking using this reliable design.
This technology allows us to yield large wafer size scalability of III-V-OI layers up to the Si wafer size of 300 mm with a high film quality and low cost.
This paper reports the first dc device characteristics of a wafer-fused transistor, and demonstrates the potential of wafer fusion for forming electronically active, lattice-mismatched heterojunctions.
In addition, the proposed approach can be written as a computer software to accurately predict the wafer yield in IC manufacturing.
Therefore, the WTPM has been verified in this study and further used for forecasting the limitation of wafer thinning with different wafer thickness.
We also show that, for some special cases, the two wafer types can achieve their maximum throughput rates as if each wafer type exclusively uses the tool regardless of other wafer types in progress.

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What are temperatures used for preparation of silicides by Arc melting?
4 answers
Silicides are prepared using arc melting at various temperatures depending on the specific silicide being synthesized. For instance, transition metal silicides like Mn4Si7 are produced using the arc-melting technique at high temperatures. Similarly, silicon borides are prepared through arc melting in an argon atmosphere at temperatures ranging from 1400 to 1700K. Additionally, in the context of titanium silicides, a selective formation process involves temperatures between about 400 to 500 degrees Celsius for the interfacial layer on a substrate. These diverse temperature ranges highlight the versatility of arc melting in synthesizing different types of silicides for various applications.
Issue in stain removing
5 answers
Stain removal poses various challenges across different applications. Methods like using a stain film removing solution containing ammonia or hot water after etching a semiconductor substrate can effectively remove stains without contaminating the device. For deep wall stains, a process involving water absorption, weak acid detergent application, neutralizer use, ultrasonic waves, high-pressure water, and vacuum drainage can ensure thorough removal. In the context of sensor stain removal, a gas-liquid mixed stream with water and air can effectively clean a concentration sensor immersed in water for precise measurements. Stain spot-removing agents with alcoholic and hydrocarbon solvents, along with surfactants, offer safe and efficient stain removal without circular contamination stains. Additionally, stain-removing gum compositions with gelatin-polyphenol complexes and abrasives are effective against oral cavity stains like tea-incrustations, ensuring convenient cleaning anywhere.
What are throughput in communication systems?
5 answers
Throughput in communication systems refers to the effective data transfer rate between transmitters and receivers. It is a crucial metric that determines the amount of data transferred per unit time, typically measured in bits/symbols. Various methods aim to enhance throughput efficiency, such as utilizing deep packet inspection data to prioritize streams and maintain link throughput. Additionally, systems can employ short-blocklength error checking codes in parallel with incremental redundancy to achieve high throughput with low frame error rates. Optimization techniques involve characterizing communication channels, determining optimal data rates and power allocations, and configuring transmitters accordingly to maximize channel throughput. Monitoring tools like hardware-initiated throughput measurement inside systems can interrupt operations based on throughput values, ensuring efficient data transmission.
What are the common methods for producing pineapple syrup?
5 answers
Common methods for producing pineapple syrup include various techniques such as making canned pineapple in syrup, utilizing pineapple in the preparation of beverages like pleurotus citrinopileatus mycelium pellet pineapple syrup beverage, and creating pineapple sauce formulations. These methods involve steps like raw material selection, treatment, processing, and flavor enhancement. For instance, the canned pineapple in syrup method involves pre-cooking, canning, sterilizing, and cooling to achieve a sweet, sour, and delicious product with a unique pineapple flavor. On the other hand, the pleurotus citrinopileatus mycelium pellet pineapple syrup beverage method includes liquid fermentation of pleurotus citrinopileatus mycelium pellets and combining them with pineapple meat, milk, honey, and lemon juice to create a nutritious and flavorful beverage. Additionally, the pineapple sauce formulation method incorporates ingredients like edible honey, salt, and fermented grains to produce a tangy and sweet sauce.
What is the recommended method for collecting an environmental sample for resistivity testing?
5 answers
The recommended method for collecting an environmental sample for resistivity testing involves utilizing an environmental sampling system with a removable collector placed in an aircraft component's passage, designed to mimic corrosion effects on engine parts. Additionally, a non-contact undisturbed contaminated soil resistivity testing device can be employed, which utilizes electromagnetic mutual inductance to sample and measure the resistivity of contaminated soil accurately and non-destructively. Furthermore, calibrating resistivity tools in environments with radio-frequency noise by elevating the tool to reduce ground effects and excluding RF noise from measurements is crucial for accurate calibration. These methods ensure precise and reliable collection of environmental samples for resistivity testing, essential for various applications such as predicting maintenance activity and improving soil conductivity.
What are microleds?
5 answers
MicroLEDs are high-brightness light-emitting diodes that offer exceptional luminance, energy efficiency, and longevity, making them ideal for various applications. While traditionally used in next-generation display technologies, microLEDs are now being explored for non-display applications like projector systems, computational imaging, communication systems, and neural stimulation. These applications often require modifications in electrical and optical characteristics, necessitating advanced fabrication techniques to optimize performance. Additionally, microLEDs are being utilized in optical sectioning structured illumination microscopy (OS-SIM) for deep tissue widefield imaging, showcasing their potential in scientific research. Furthermore, the integration of sensors directly onto microLED displays presents exciting possibilities for multifunctional devices. Overall, microLEDs are rapidly advancing as a promising technology with diverse applications beyond traditional displays.
What is difference between soft lithography and photolithography?
4 answers
Soft lithography and photolithography are distinct microfabrication techniques, each with its unique advantages and limitations, catering to different application needs in the field of microelectronics, microfluidics, and beyond. Photolithography is a well-established technique primarily used in the microelectronics industry for the bulk production of integrated circuits (ICs). It involves transferring a pattern onto a substrate using a light-sensitive chemical photoresist, which is then developed to create a stencil of the desired pattern. This process can involve either liquid or dry photolithography methods, where patterns are transferred onto a silicon wafer using UV light through photomasks or direct laser exposure. Despite its widespread use and ability to pattern a variety of materials over large areas, photolithography faces limitations when it comes to patterning on light-sensitive surfaces or achieving high-resolution patterning on non-planar surfaces. Soft lithography, on the other hand, is a complementary technique that extends beyond the capabilities of classical photolithography. It is particularly noted for its simplicity, cost-effectiveness, and environmental friendliness compared to the multistep and chemically intensive photolithography process. Soft lithography involves replica molding of elastomers against master molds, which can be produced through various methods including photolithography, to create microstructures with high fidelity. This technique overcomes some of the limitations of photolithography by enabling high-quality micropatterning on non-planar surfaces and a wide range of materials, making it suitable for applications in analytical chemistry, biomedical research, and microelectromechanical systems. Furthermore, soft lithography has been instrumental in the development of microfluidics, benefiting from its ability to fabricate molds with complex 3D structures. Innovations in both techniques have led to the development of hybrid approaches and the exploration of new materials and methods to expand their application scope. For instance, combining conventional photolithography with two-photon polymerization has enabled the fabrication of master molds for soft lithography that feature complex 3D structures with high resolution. Additionally, advancements in soft lithography have introduced methods for improving patterning resolution down to the sub-micrometer scale using soft polydimethylsiloxane (PDMS) photomasks, and for performing photolithography on unconventional substrates through photoresist blanket transfer (PR BT). In summary, while photolithography offers a traditional, well-established route for microfabrication, particularly in the production of ICs, soft lithography provides a versatile, cost-effective alternative that excels in creating microstructures on a wide variety of substrates, including non-planar surfaces. The choice between these two techniques depends on the specific requirements of the application, including the nature of the substrate, the desired resolution, and environmental considerations.
What is the leakage power of 12nm transistor?
5 answers
The leakage power of a 12nm transistor is a critical factor in determining power dissipation in CMOS circuits as technology scales down. In the context of 65nm and 90nm processes, different strategies have been explored to address leakage issues. For instance, in a 65nm technology, a low-power, high-speed SRAM macro was designed with reduced leakage to 12 μA/Mb at 0.5V retention voltage. Similarly, in a 90nm Bipolar-CMOS-DMOS process, wafer edge yield loss was attributed to Metal-1 to gate leakage in LDMOS transistors, prompting process optimizations to enhance production yield by 5-10%. Understanding and mitigating leakage mechanisms through device and circuit techniques are crucial for reducing power dissipation in deep sub-micron regimes.
What is semiconductor industry?
5 answers
The semiconductor industry is a crucial component of the global economy, driving technological advancements in various sectors. It involves intricate processes, requiring advanced knowledge and skills in engineering, electronics, and automation. This industry is characterized by high technological complexity and costs, leading to its concentration in a few major companies and countries. Semiconductor technology plays a significant role in shaping the future development trends of nations, impacting areas like smart cities, the internet of things, and space exploration. The industry's growth has been substantial over the years, with semiconductor components becoming integral to modern devices like mobile phones, computers, and monitors. Understanding the semiconductor business model and investment strategies is essential for maximizing returns and career development in this dynamic and valuable sector.
What is the definition of a package according to Leonard (1980)?
4 answers
A package, as defined by various researchers, encompasses different structures and functionalities. Takayuki et al. describe a package as having insulating layers forming a body with hollow portions containing electrode pads. Cheng Enjun and Kohlweyer elaborate on a flexible gusset package containing multiple items, emphasizing seamless surfaces and gussets defining an interior compartment. Bressan, Gandolla, and Bressan introduce a package with a compartment, a movable closure system, and a configurable wrapping that can be partially housed inside the container. Hsieh et al. discuss a package with an integrated circuit die, encapsulant, and conductive lines connecting vias, highlighting the structural elements within the package. Chang et al. present a package structure with a circuit substrate, semiconductor die, redistribution layer, and conductive balls for electrical connections, emphasizing the intricate design of the package.
How are ceramic piezolectrics made?
5 answers
Ceramic piezoelectrics are typically made through various methods outlined in different research papers. The fabrication process involves preparing ceramic powders and sintering shaped structures, often utilizing wet chemical methods for powder production to ensure device characteristics. Different compositions and doping materials are used, such as lead tetroxide, alumina, zirconium dioxide, titanium dioxide, and other elements in specific proportions. Techniques like ball-milling, pre-sintering, secondary ball-milling, and sintering at specific temperatures are employed in the preparation process. Advanced methods like using femtosecond lasers and 3D printing have also been introduced to streamline the production of piezoelectric ceramics, reducing preparation time and simplifying the process. These diverse approaches collectively contribute to the efficient and cost-effective manufacturing of high-performance piezoelectric ceramic materials.