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A. Maçarico
Researcher at Instituto Superior de Engenharia de Lisboa
Publications - 46
Citations - 454
A. Maçarico is an academic researcher from Instituto Superior de Engenharia de Lisboa. The author has contributed to research in topics: Microcrystalline & Amorphous solid. The author has an hindex of 10, co-authored 46 publications receiving 447 citations. Previous affiliations of A. Maçarico include University of Lisbon & Universidade Nova de Lisboa.
Papers
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Particle agglomeration study in rf silane plasmas: In situ study by polarization-sensitive laser light scattering
C. Courteille,Christoph Hollenstein,J.-L. Dorier,W. Schwarzenbach,Alan Howling,Enric Bertran,G. Viera,Rodrigo Martins,A. Maçarico +8 more
TL;DR: In this article, the authors used a Brownian free molecule coagulation model to determine the time evolution of particle size and their number density in situ multi-angle polarization-sensitive laser light scattering.
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Study of Annealed Indium Tin Oxide-Films prepared by RF Reactive Magnetron Sputtering
TL;DR: In this article, the effect of post-deposition annealing temperature on the electrical, optical and structural properties of ITO films was studied and it was found that the increase of the annaling temperature will improve the film electrical properties.
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Laser-scanned p-i-n photodiode (LSP) for image detection
Manuela Vieira,Márcia Astrês Fernandes,J. Martins,Paula Louro,A. Maçarico,R. Schwarz,Markus B. Schubert +6 more
TL;DR: In this article, the effect of the image intensity on the sensor output characteristics (sensitivity, linearity, blooming, resolution, and signal-to-noise ratio) are analyzed for different material composition.
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Highly conductive and highly transparent n-type microcrystalline silicon thin films
TL;DR: In this paper, the dependence of the electro-optical characteristics and structure of n-type microcrystalline silicon films on the r.f. power used during the deposition of films produced by the plasmaenhanced chemical vapour deposition technique was presented.
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Improved Resolution in A P-I-N Image Sensor by Changing the Structure of the Doped Layers
Manuela Vieira,Márcia Astrês Fernandes,J. Martins,Paula Louro,A. Maçarico,R. Schwarz,Markus B. Schubert +6 more
TL;DR: An amorphous ZnO/p-i-n/Al imager that uses a small-signal scanning beam to read out the short circuit current signal is presented in this article.