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Christoph Hollenstein
Researcher at École Polytechnique Fédérale de Lausanne
Publications - 36
Citations - 826
Christoph Hollenstein is an academic researcher from École Polytechnique Fédérale de Lausanne. The author has contributed to research in topics: Plasma & Plasma torch. The author has an hindex of 15, co-authored 36 publications receiving 797 citations. Previous affiliations of Christoph Hollenstein include École Polytechnique.
Papers
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Journal ArticleDOI
Influences of a high excitation frequency (70 MHz) in the glow discharge technique on the process plasma and the properties of hydrogenated amorphous silicon
Friedhelm Finger,Ulrich Kroll,V. Viret,Arvind Shah,Wolfhard Beyer,X.-M. Tang,J. Weber,Alan Howling,Christoph Hollenstein +8 more
TL;DR: In this paper, a very high-frequency band at 70 MHz with the glow discharge technique at substrate temperatures between 280 and 50 degrees-C was used to evaluate the electronic and structural properties of hydrogenated amorphous silicon.
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Particle agglomeration study in rf silane plasmas: In situ study by polarization-sensitive laser light scattering
C. Courteille,Christoph Hollenstein,J.-L. Dorier,W. Schwarzenbach,Alan Howling,Enric Bertran,G. Viera,Rodrigo Martins,A. Maçarico +8 more
TL;DR: In this article, the authors used a Brownian free molecule coagulation model to determine the time evolution of particle size and their number density in situ multi-angle polarization-sensitive laser light scattering.
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The physics of plasma-enhanced chemical vapour deposition for large-area coating: industrial application to flat panel displays and solar cells
TL;DR: In this paper, the authors review progress in this field, with particular emphasis on modelling developments, and present an analytical and numerical modeling approach to analyze thin-film deposition uniformity.
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Optical emission spectroscopy of electrical discharge machining plasma
TL;DR: In this paper, the authors used optical emission spectroscopy to investigate the electrical discharge machining (EDM) plasma and showed that the EDM plasma is non-ideal (Gamma similar or equal to 0.45).
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Time-resolved imaging of anodic arc root behavior during fluctuations of a DC plasma spraying torch
TL;DR: In this article, an end-on imaging arrangement using a mirror and a mask in the optical path from the are to the camera allows visualization of the anodic arc attachment by strongly attenuating the bright emission from the column.