We have produced ultrathin epitaxial graphite films which show remarkable 2D electron gas (2DEG) behavior. The films, composed of typically 3 graphene sheets, were grown by thermal decomposition on the (0001) surface of 6H-SiC, and characterized by surface-science techniques. The low-temperature conductance spans a range of localization regimes according to the structural state (square resistance 1.5 kOhm to 225 kOhm at 4 K, with positive magnetoconductance). Low resistance samples show characteristics of weak-localization in two dimensions, from which we estimate elastic and inelastic mean free paths. At low field, the Hall resistance is linear up to 4.5 T, which is well-explained by n-type carriers of density 10^{12} cm^{-2} per graphene sheet. The most highly-ordered sample exhibits Shubnikov - de Haas oscillations which correspond to nonlinearities observed in the Hall resistance, indicating a potential new quantum Hall system. We show that the high-mobility films can be patterned via conventional lithographic techniques, and we demonstrate modulation of the film conductance using a top-gate electrode. These key elements suggest electronic device applications based on nano-patterned epitaxial graphene (NPEG), with the potential for large-scale integration.

Ultrathin epitaxial graphite: 2D electron gas properties and a route toward graphene-based nanoelectronics

The spin-orbit coupling in graphene induces spectral gaps at the high-symmetry points. The relevant gap at the Γ point is similar to the splitting of the p orbitals in the carbon atom, being roughly 8.5 meV. The splitting at the K point is orders of magnitude smaller. Earlier tight-binding theories indicated the value of this intrinsic gap of 1 μeV, based on the σ−π coupling. All-electron first-principles calculations give much higher values, between 25 and 50 μeV, due to the presence of the orbitals of the d symmetry in the Bloch states at K. A realistic multiband tight-binding model is presented to explain the effects the d orbitals play in the spin-orbit coupling at K. The π−σ coupling is found irrelevant to the value of the intrinsic spin-orbit-induced gap. On the other hand, the extrinsic spin-orbit coupling (of the Bychkov-Rashba type), appearing in the presence of a transverse electric field, is dominated by the π−σ hybridization, in agreement with previous theories. Tight-binding parameters are obtained by fitting to first-principles calculations, which also provide qualitative support for the model when considering the trends in the spin-orbit-induced gap in graphene under strain. Finally, an effective single-orbital next-nearest-neighbor hopping model accounting for the spin-orbit effects is derived.

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Tight-binding theory of the spin-orbit coupling in graphene structures

The wave nature of electrons in low-dimensional structures manifests itself in conventional electrical measurements as a quantum correction to the classical conductance. This correction comes from the interference of scattered electrons which results in electron localisation and therefore a decrease of the conductance. In graphene, where the charge carriers are chiral and have an additional (Berry) phase of \pi, the quantum interference is expected to lead to anti-localisation: an increase of the conductance accompanied by negative magnetoconductance (a decrease of conductance in magnetic field). Here we observe such negative magnetoconductance which is a direct consequence of the chirality of electrons in graphene. We show that graphene is a unique two-dimensional material in that, depending on experimental conditions, it can demonstrate both localisation and anti-localisation effects. We also show that quantum interference in graphene can survive at unusually high temperatures, up to T~200 K.

Transition between electron localisation and antilocalisation in graphene

Topics in Applied Physics is a well-established series of review books, each of which presents a comprehensive survey of a selected topic within the area of applied physics. Edited and written by leading research scientists in the field concerned, each volume contains review contributions covering the various aspects of the topic. Together these provide an overview of the state of the art in the respective field. Topics in Applied Physics is addressed to all scientists at universities and in industry who wish to obtain an overview and to keep abreast of advances in applied physics. The Managing Editors are open to any suggestions for topics coming from the community of applied physicists no matter what the field and encourage prospective book editors to approach them with ideas. 2015 Impact Factor: 0.889

Topics in applied physics

In addition to possessing unique electrical properties, silicon carbide (SiC) can crystallize in different modifications (polytypes). Having the same chemical nature, SiC polytypes may significantly differ in their electrical parameters. In recent years, the world's interest in the fabrication and study of heteropolytype structures based on silicon carbide has considerably increased. This review considers studies concerned with polytypism in SiC, fabrication technologies of various types of heterostructures constituted by different SiC polytypes and their electrical parameters. It is shown that heterostructures between SiC polytypes may have a better structural perfection than those constituted by semiconductors that differ in chemical nature. A conclusion is made that SiC-based heterostructures are promising for application in modern electronic devices.

https://iopscience.iop.org/article/10.1088/0268-1242/21/6/R01/pdf

Heterojunctions and superlattices based on silicon carbide

Graphene nanoribbons show unique properties and have attracted a lot of attention in the recent past. Intensive theoretical and experimental studies on such nanostructures at both the fundamental and application-oriented levels have been performed. The present paper discusses the suitability of graphene nanoribbons devices for nanoelectronics and focuses on three specific device types – graphene nanoribbon MOSFETs, side-gate transistors, and three terminal junctions. It is shown that, on the one hand, experimental devices of each type of the three nanoribbon-based structures have been reported, that promising performance of these devices has been demonstrated and/or predicted, and that in part they possess functionalities not attainable with conventional semiconductor devices. On the other hand, it is emphasized that – in spite of the remarkable progress achieved during the past 10 years – graphene nanoribbon devices still face a lot of problems and that their prospects for future applications remain unclear.

https://onlinelibrary.wiley.com/doi/pdf/10.1002/andp.201700033

Graphene Nanoribbons for Electronic Devices

Deep-level defects appear in silicon upon heat treatment of wafers with surface disordered by mechanical lapping or introducing high concentration impurity in diffusion layer, i.e. in regimes typical of fabrication of high voltage devices. By means of capacitance transient spectroscopy, combined with other methods, it was shown that dominant electron traps with ionization energies of 0.28 and 0.54 eV of double level donor have low recombination activity, but affect the resistivity of high purity Si and play a key role in limiting the p-n junction breakdown voltage . A careful study of the defect parameters showed their similarity to sulphur-related centres in Si.

http://iopscience.iop.org/article/10.1088/0268-1242/13/5/008/pdf

Process induced deep-level defects in high purity silicon

We report the results of the high energy (0.9 MeV) electron irradiation impact on the electrical properties of high voltage Ni/4H-SiC Schottky diodes. Within the range of the irradiation dose from 0.2 × 1016 cm−2 to 7 × 1016 cm−2, electron irradiation led to 6 orders of magnitude increase in the base resistance, appearance of slow relaxation processes at pico-ampere current range, and increase in the ideality factor.

Impact of high energy electron irradiation on high voltage Ni/4H-SiC Schottky diodes

The current voltage characteristics and the low-frequency noise in high voltage 4H-SiC junction barrier Schottky diodes irradiated with high energy (15 MeV) protons were studied at different temperatures and irradiation doses Φ from 3 × 1012 cm−2 to 1 × 1014 cm−2. Irradiation led to the increase of the base resistance and the appearance of slow relaxation processes at small, V ≤ 0.2 V, and at rather high, V ≥ 2 V, forward voltages. The characteristic times of these relaxation processes ranged from ∼1 μs to 103 s. The exponential part of the current-voltage characteristic was only weakly affected by irradiation. The temperature dependence of the base resistance changed exponentially with temperature with activation energy Ea ∼ 0.6 eV, indicating that the Z1/2 level plays a dominant role in this process. The temperature increase also led to the increase of the ideality factor from 1.05 at 25 °C to 1.1 at 172 °C. At elevated temperatures and high forward voltages V > 2–4 V, the current voltage characteristic...

Electrical and noise properties of proton irradiated 4H-SiC Schottky diodes

3C-SiC epitaxial layers were grown by sublimation epitaxy in a vacuum on the (0001)C face of 6H-SiC substrates produced by the Lely method and 4H-SiC substrates grown by modified Lely method. An analysis of these layers demonstrated the high structural perfection of the epitaxial layers and absence of any transition regions between 3C-SiC epitaxial layer and substrate. The low-temperature conductivity and magnetoresistance of the films have been studied in relation to their doping level and structural perfection.

Alexander A. Lebedev

Papers

Graphene Nanoribbons for Electronic Devices

Process induced deep-level defects in high purity silicon

Impact of high energy electron irradiation on high voltage Ni/4H-SiC Schottky diodes

Electrical and noise properties of proton irradiated 4H-SiC Schottky diodes

Influence of the defect density (twins boundaries) on electrical parameters of 3C-SiC epitaxial films