D
Daniel P. Sanders
Researcher at IBM
Publications - 136
Citations - 6290
Daniel P. Sanders is an academic researcher from IBM. The author has contributed to research in topics: Photoresist & Photolithography. The author has an hindex of 36, co-authored 133 publications receiving 5922 citations. Previous affiliations of Daniel P. Sanders include Case Western Reserve University & California Institute of Technology.
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Patent
Photoactive polymer brush materials and euv patterning using the same
TL;DR: In this paper, the photoactive polymer brush material incorporates a grafting moiety that can be immobilized at the substrate surface, a dry developable or ashable moiety, and a photoacid generator moiety which are bound to a polymeric backbone.
Posted Content
Molecule Generation Experience: An Open Platform of Material Design for Public Users.
Seiji Takeda,Toshiyuki Hama,Hsiang-Han Hsu,Akihiro Kishimoto,Makoto Kogoh,Takumi Hongo,Kumiko Fujieda,Hideaki Nakashika,Dmitry Yu. Zubarev,Daniel P. Sanders,Jed W. Pitera,Junta Fuchiwaki,Daiju Nakano +12 more
TL;DR: Molecule Generation Experience as mentioned in this paper is a web application of molecular generative models enabling users to work with built-in datasets to carry out molecular design, which is the first web application for molecular design that is open to the general public.
Proceedings ArticleDOI
Contrast enhanced diffusion NMR: quantifying impurities in block copolymers for DSA
TL;DR: In this paper, contrast enhanced diffusion ordered spectroscopy (CEDOSY) was used for the detection of homopolymer impurities in block copolymers, where the authors measured the diffusion coefficient of polymeric materials in the solution allowing for the virtual or spectroscopic separation of BCPs that contain homopolymers.
Patent
Cyclic carbonyl compound having pendant Pentafluorphenylcarbonatgruppen, preparation thereof and polymers thereof
TL;DR: There is a one-pot process for preparing cyclic carbonyl compounds which comprise an active pendant Pentafluorphenylcarbonatgruppe disclosed as mentioned in this paper, which can be polymerized by ring-opening process to form ROP polymers comprising repeating units which comprise a Pentaflaorphensyl carbonat side chain group.
Patent
Sulfonamide-containing topcoat and photoresist additive composition and method of avoidance
TL;DR: Sulfonamide-containing compositions, overcoating polymers, and additive polymers for use in lithographic processes are provided in this article which have improved water static retentive contact angles over those known in the art.