D
Daniel P. Sanders
Researcher at IBM
Publications - 136
Citations - 6290
Daniel P. Sanders is an academic researcher from IBM. The author has contributed to research in topics: Photoresist & Photolithography. The author has an hindex of 36, co-authored 133 publications receiving 5922 citations. Previous affiliations of Daniel P. Sanders include Case Western Reserve University & California Institute of Technology.
Papers
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Proceedings ArticleDOI
DSA patterning options for logics and memory applications
Chi-Chun Liu,Elliott Franke,Yann Mignot,Scott LeFevre,Stuart A. Sieg,Cheng Chi,Luciana Meli,Doni Parnell,Kristin Schmidt,Martha I. Sanchez,Lovejeet Singh,Tsuyoshi Furukawa,Indira Seshadri,Ekmini Anuja De Silva,Hsinyu Tsai,Kafai Lai,Hoa Truong,Richard A. Farrell,Robert L. Bruce,Mark Somervell,Daniel P. Sanders,Nelson Felix,John C. Arnold,David Hetzer,Akiteru Ko,Andrew Metz,Matthew E. Colburn,Daniel Corliss +27 more
TL;DR: The progress of three potential DSA applications, i.e. fin formation, via shrink, and pillars, were reviewed and the importance of pattern transfer in retaining both the CD and local CDU improvement from DSA was highlighted.
Proceedings ArticleDOI
Graded spin-on organic bottom antireflective coating for high NA lithography
Dario L. Goldfarb,Sean D. Burns,Libor Vyklicky,Dirk Pfeiffer,Anthony D. Lisi,Karen Petrillo,John C. Arnold,Daniel P. Sanders,Aleksandra Clancy,Robert Lang,Robert D. Allen,David R. Medeiros,Dah Chung Owe-Yang,Kazumi Noda,Seiichiro Tachibana,Shozo Shirai +15 more
TL;DR: In this article, a graded spin-on organic BARC was developed to enable appropriate reflectivity control under high numerical aperture (NA) conditions, where highly reflective polymers are used, and lead to critical dimension (CD) control problems.
Proceedings ArticleDOI
Directed self-assembly of topcoat-free, integration-friendly high-X block copolymers
Eri Hirahara,Margareta Paunescu,Orest Polishchuk,EunJeong Jeong,Edward Ng,Jianhui Shan,Jihoon Kim,SungEun Hong,Durairaj Baskaran,Guanyang Lin,Ankit Vora,Melia Tjio,Noel Arellano,Charles T. Rettner,Elizabeth Lofano,Chi-Chun Liu,Hsinyu Tsai,Anindarupa Chunder,Khanh Nguyen,Alexander Friz,A. N. Bowers,Srinivasan Balakrishnan,Joy Cheng,Daniel P. Sanders +23 more
TL;DR: In this article, high quality organic high-x block copolymers (HC series) were developed and applied to implementation of sub-10 nm L/S DSA for directed self-assembly.
Patent
Method for using compositions containing fluorocarbinols in lithographic processes
TL;DR: In this paper, a method for generating a photoresist image on a substrate is described, which involves coating a substrate with a film comprising a polymer comprising fluorocarbinol monomers; imagewise exposing the film to radiation; heating it to a temperature of, at or below about 90°C.
Patent
Additives for orientation control of block copolymers
TL;DR: In this paper, a high-chi block copolymer for self-assembly and a surface active polymer (SAP) was prepared on a substrate surface that was neutral wetting to the domains of the self-assembled blockcopolymer.