D
Daniel P. Sanders
Researcher at IBM
Publications - 136
Citations - 6290
Daniel P. Sanders is an academic researcher from IBM. The author has contributed to research in topics: Photoresist & Photolithography. The author has an hindex of 36, co-authored 133 publications receiving 5922 citations. Previous affiliations of Daniel P. Sanders include Case Western Reserve University & California Institute of Technology.
Papers
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Proceedings ArticleDOI
Contact angles and structure/surface property relationships of immersion materials
TL;DR: In this article, the role of molecular structure on contact angles and hysteresis of a broad family of "hydrophobic" materials was investigated and an insight into the relationship between structure and contact angles for future immersion materials was presented.
Patent
Methods of forming block polymers for directed self-assembly
TL;DR: Block polymers as mentioned in this paper are formed by ring opening polymerization of a cyclic carbonate monomer using a polymeric initiator for the ROP that comprises repeating functionalized ethylene units.
Journal ArticleDOI
Synthesis and Characterization of Polycarbonate-containing All-organic High-χ Block Copolymers for Directed Self-assembly
Ankit Vora,Anindarupa Chunder,Melia Tjio,Teddie Magbitang,Elizabeth Lofano,Noel Arellano,Kristin Schmidt,Khanh Nguyen,Joy Cheng,Daniel P. Sanders +9 more
TL;DR: Polystyrene-b-polytrimethylene carbonate (PSb-PTMC) block copolymer was synthesized using ring opening polymerization (ROP) of trimethylenes carbonate from hydroxyfunctional polystyrene (PS-OH) with diazabicyclo[5.4.0]undec-7-ene (DBU) as the base catalyst as mentioned in this paper.
Journal ArticleDOI
Spatial Control of the Self-assembled Block Copolymer Domain Orientation and Alignment on Photopatterned Surfaces.
Ji Yeon Kim,Philip Liu,Michael J. Maher,Devon H. Callan,Christopher M. Bates,Matthew C. Carlson,Matthew C. Carlson,Yusuke Asano,Gregory Blachut,Charles T. Rettner,Joy Cheng,Daniel F. Sunday,R. Joseph Kline,Daniel P. Sanders,Nathaniel A. Lynd,Christopher J. Ellison,C. Grant Willson,Carlos R. Baiz +17 more
TL;DR: The study of the effect of film thickness on photoacid diffusion by Fourier transform infrared spectroscopy and near edge x-ray absorption fine structure (NEXAFS) spectroscopic suggested slower diffusion in thinner films, potentially enabling production of guidelines with sharper interfaces between unexposed and exposed lines, and thus, the DSA of PS-b-PTMSS on thinner pXST guidelines resulted in better alignment control.
Patent
Non-ionic photo-acid generating polymers for resist applications
Takehisa Ishimaru,Satoru Narizuka,Daniel P. Sanders,Ratnam Sooriyakumaran,Hoa D. Truong,Rudy J. Wojtecki,Manabu Yasumoto +6 more
TL;DR: In this paper, photo-acid generating polymers (PAG polymers) of the PAG monomers were prepared comprising sulfonate ester groups of N-hydroxide imides.