scispace - formally typeset
D

Daniel P. Sanders

Researcher at IBM

Publications -  136
Citations -  6290

Daniel P. Sanders is an academic researcher from IBM. The author has contributed to research in topics: Photoresist & Photolithography. The author has an hindex of 36, co-authored 133 publications receiving 5922 citations. Previous affiliations of Daniel P. Sanders include Case Western Reserve University & California Institute of Technology.

Papers
More filters
Journal ArticleDOI

Fluoropolymer Resist Materials for 157nm Microlithography

TL;DR: Fluorocarbon polymers and siloxane-based polymers have been identified as promising resist candidates for 157nm material design because of their relatively high transparency at this wavelength as discussed by the authors.
Journal ArticleDOI

Prevention of Undesirable Isomerization During Olefin Metathesis.

TL;DR: In this article, 1,4-Benzoquinones have been used to prevent olefin isomerization of allylic ethers and long-chain aliphatic alkenes during ruthenium-catalyzed OE metathesis reactions.
Patent

Self-Segregating Multilayer Imaging Stack With Built-In Antireflective Properties

TL;DR: In this paper, a patterned material layer on a substrate using a self-segregating polymeric composition comprising a polymeric photoresistive material and an antireflective coating material is presented.
Journal ArticleDOI

Surface Assembly Configurations and Packing Preferences of Fibrinogen Mediated by the Periodicity and Alignment Control of Block Copolymer Nanodomains.

TL;DR: The results demonstrate that the geometry and orientation of the protein can be effectively guided during Fg self-assembly by controlling the physical dimensions and orientations of the underlying BCP templates.