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Daniel P. Sanders

Researcher at IBM

Publications -  136
Citations -  6290

Daniel P. Sanders is an academic researcher from IBM. The author has contributed to research in topics: Photoresist & Photolithography. The author has an hindex of 36, co-authored 133 publications receiving 5922 citations. Previous affiliations of Daniel P. Sanders include Case Western Reserve University & California Institute of Technology.

Papers
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Patent

Self-topcoating resist for photolithography

TL;DR: In this article, resist compositions for immersion lithography without the use of an additional topcoat are described, including photoresist polymer, at least one photoacid generator, a solvent, and a self-topcoating resist additive.
Journal ArticleDOI

A General Model for Selectivity in Olefin Cross Metathesis.

TL;DR: In this article, a general ranking of olefinear reactivity in cross metathesis is presented, based on their relative ability to undergo homodimerization via cross-metathesis and the susceptibility of their homodimers toward secondary metathetic reactions.
Patent

Aligning polymer films

TL;DR: In this paper, the authors proposed a method for forming a substructure on a substrate, including a feature having a sidewall of a first material and a bottom surface of a second material.
Patent

Methods of reducing defects in directed self-assembled structures

TL;DR: In this article, the authors proposed a method to reduce the number of defects in a directed self-assembled structure formed on a guiding pre-pattern (e.g., a chemical pre-Pattern) on a substrate.
Patent

Latent, high-activity olefin metathesis catalysts containing an n-heterocyclic carbene ligand

TL;DR: In this paper, an N-heterocyclic carbene ligand with a Group 8 transition metal center was proposed for catalyzing ring closing metathesis of acyclic olefins.