D
Daniel P. Sanders
Researcher at IBM
Publications - 136
Citations - 6290
Daniel P. Sanders is an academic researcher from IBM. The author has contributed to research in topics: Photoresist & Photolithography. The author has an hindex of 36, co-authored 133 publications receiving 5922 citations. Previous affiliations of Daniel P. Sanders include Case Western Reserve University & California Institute of Technology.
Papers
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Patent
Self-topcoating resist for photolithography
Robert D. Allen,Phillip J. Brock,Carl E. Larson,Daniel P. Sanders,Ratnam Sooriyakumaran,Linda K. Sundberg,Hoa Truong,Gregory M. Wallraff +7 more
TL;DR: In this article, resist compositions for immersion lithography without the use of an additional topcoat are described, including photoresist polymer, at least one photoacid generator, a solvent, and a self-topcoating resist additive.
Journal ArticleDOI
A General Model for Selectivity in Olefin Cross Metathesis.
TL;DR: In this article, a general ranking of olefinear reactivity in cross metathesis is presented, based on their relative ability to undergo homodimerization via cross-metathesis and the susceptibility of their homodimers toward secondary metathetic reactions.
Patent
Aligning polymer films
TL;DR: In this paper, the authors proposed a method for forming a substructure on a substrate, including a feature having a sidewall of a first material and a bottom surface of a second material.
Patent
Methods of reducing defects in directed self-assembled structures
TL;DR: In this article, the authors proposed a method to reduce the number of defects in a directed self-assembled structure formed on a guiding pre-pattern (e.g., a chemical pre-Pattern) on a substrate.
Patent
Latent, high-activity olefin metathesis catalysts containing an n-heterocyclic carbene ligand
TL;DR: In this paper, an N-heterocyclic carbene ligand with a Group 8 transition metal center was proposed for catalyzing ring closing metathesis of acyclic olefins.