G
Gaurav Siddharth
Researcher at Indian Institute of Technology Indore
Publications - 17
Citations - 140
Gaurav Siddharth is an academic researcher from Indian Institute of Technology Indore. The author has contributed to research in topics: Thin film & Solar cell. The author has an hindex of 6, co-authored 16 publications receiving 64 citations.
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Journal ArticleDOI
Analysis of Drain Current in Polycrystalline MgZnO/ZnO and MgZnO/CdZnO HFET
TL;DR: The results suggest that the saturation drain current in MCO HFET can be comparable to that in MZO HFET when enhancement is considered along with the reduction in the understanding and therefore optimizing the direct current (dc) performance of polycrystalline ZnO HFETS.
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Electron scattering analysis in 2DEG in sputtering-grown MgZnO/ZnO heterostructure
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Impact of Interfacial SiO 2 on Dual Ion Beam Sputtered Y 2 O 3 -Based Memristive System
Mangal Das,Amitesh Kumar,Sanjay Kumar,Biswajit Mandal,Gaurav Siddharth,Pawan Kumar,Myo Than Htay,Shaibal Mukherjee +7 more
TL;DR: In this article, the effect of the SiO2 layer is demonstrated on dual ion beam sputtered yttria-based memristive devices for the first time, and it is found that the effect is extremely detrimental for resistive switching parameters such as endurance and uniformity of currentvoltage characteristics.
Journal Article
Organo-di-benzoic-acidified ZnO Nanohybrids for Highly Selective Detection of CO at Low Temperature
Biswajit Mandal,Sayan Maiti,Aaryashree,Gaurav Siddharth,Mangal Das,Ajay Agarwal,Apurba K. Das,Shaibal Mukherjee +7 more
TL;DR: In this paper, a chemiresistive carbon monoxide (CO) gas sensor comprising of an organo-di-benzoic acidified zinc oxide (ODBA-ZnO) nanohybrid material is reported.
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Investigation of DIBS-Deposited CdZnO/ZnO-Based Multiple Quantum Well for Large-Area Photovoltaic Application
Gaurav Siddharth,Ruchi Singh,Vivek Garg,Brajendra S. Sengar,Mangal Das,Biswajit Mandal,Myo Than Htay,Mukul Gupta,Shaibal Mukherjee +8 more
TL;DR: In this article, a dual ion beam sputtering (DIBS) system at different deposition conditions in terms of ion beam power, substrate temperature, and time cessation between deposition of successive layers is discussed systematically.