We present a comprehensive, up-to-date compilation of band parameters for the technologically important III–V zinc blende and wurtzite compound semiconductors: GaAs, GaSb, GaP, GaN, AlAs, AlSb, AlP, AlN, InAs, InSb, InP, and InN, along with their ternary and quaternary alloys. Based on a review of the existing literature, complete and consistent parameter sets are given for all materials. Emphasizing the quantities required for band structure calculations, we tabulate the direct and indirect energy gaps, spin-orbit, and crystal-field splittings, alloy bowing parameters, effective masses for electrons, heavy, light, and split-off holes, Luttinger parameters, interband momentum matrix elements, and deformation potentials, including temperature and alloy-composition dependences where available. Heterostructure band offsets are also given, on an absolute scale that allows any material to be aligned relative to any other.

Band parameters for III–V compound semiconductors and their alloys

Carrier concentration profiles of two-dimensional electron gases are investigated in wurtzite, Ga-face AlxGa1−xN/GaN/AlxGa1−xN and N-face GaN/AlxGa1−xN/GaN heterostructures used for the fabrication of field effect transistors. Analysis of the measured electron distributions in heterostructures with AlGaN barrier layers of different Al concentrations (0.15<x<0.5) and thickness between 20 and 65 nm demonstrate the important role of spontaneous and piezoelectric polarization on the carrier confinement at GaN/AlGaN and AlGaN/GaN interfaces. Characterization of the electrical properties of nominally undoped transistor structures reveals the presence of high sheet carrier concentrations, increasing from 6×1012 to 2×1013 cm−2 in the GaN channel with increasing Al-concentration from x=0.15 to 0.31. The observed high sheet carrier concentrations and strong confinement at specific interfaces of the N- and Ga-face pseudomorphic grown heterostructures can be explained as a consequence of interface charges induced by ...

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Two-dimensional electron gases induced by spontaneous and piezoelectric polarization charges in N- and Ga-face AlGaN/GaN heterostructures

Wide bandgap semiconductors are extremely attractive for the gamut of power electronics applications from power conditioning to microwave transmitters for communications and radar. Of the various materials and device technologies, the AlGaN/GaN high-electron mobility transistor seems the most promising. This paper attempts to present the status of the technology and the market with a view of highlighting both the progress and the remaining problems.

AlGaN/GaN HEMTs-an overview of device operation and applications

Materials research plays a vital role in transforming breakthrough scientific ideas into next-generation technology. Similar to the way silicon revolutionized the microelectronics industry, the proper materials can greatly impact the field of plasmonics and metamaterials. Currently, research in plasmonics and metamaterials lacks good material building blocks in order to realize useful devices. Such devices suffer from many drawbacks arising from the undesirable properties of their material building blocks, especially metals. There are many materials, other than conventional metallic components such as gold and silver, that exhibit metallic properties and provide advantages in device performance, design flexibility, fabrication, integration, and tunability. This review explores different material classes for plasmonic and metamaterial applications, such as conventional semiconductors, transparent conducting oxides, perovskite oxides, metal nitrides, silicides, germanides, and 2D materials such as graphene. This review provides a summary of the recent developments in the search for better plasmonic materials and an outlook of further research directions.

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Alternative Plasmonic Materials: Beyond Gold and Silver

The role of extended and point defects, and key impurities such as C, O, and H, on the electrical and optical properties of GaN is reviewed. Recent progress in the development of high reliability contacts, thermal processing, dry and wet etching techniques, implantation doping and isolation, and gate insulator technology is detailed. Finally, the performance of GaN-based electronic and photonic devices such as field effect transistors, UV detectors, laser diodes, and light-emitting diodes is covered, along with the influence of process-induced or grown-in defects and impurities on the device physics.

Gan : processing, defects, and devices

We demonstrated a high-power balanced photo-detector with over 1 W of RF output power at 2 GHz and OIP3 of 48 dBm at room temperature. Responsivity is 0.65 A/W and CMRR > 40 dB.

A 1 W linear high-power InP balanced uni-traveling carrier photodetector

Signal generation and detection at mm-wave frequencies via a single chip size component is demonstrated. The monolithic integration consists of high current density Triple Barrier Resonant Tunneling Diode into a slot antenna. The asymmetrical current voltage characteristic of the Triple Barrier Resonant Tunneling Diode enables signal detection at zero bias and signal generation at forward bias within the regime of negative resistance. Signal generation and detection at above 250 GHz are experimentally demonstrated.

Millimeter-wave Signal Generation and Detection via the same Triple Barrier RTD and on-chip Antenna

We developed a chip mounting technology suitable for low-cost assemblies in the 300–500-GHz frequency range, compatible with standard chip and submount fabrication techniques. The waveguide and transition designs are compatible with indium phosphide heterobipolar transistor millimeter-wave monolithic integrated circuit chip architecture. Increased conductor shielding in different multilayer thin-film waveguide topologies is applied to suppress radiative losses, enabling low-loss interconnects up to 500-GHz bandwidth. Standard flip-chip align-and-place equipment is used to assemble the chips onto submounts. Losses are evaluated by banded ${S}$ -parameter measurements between 10 MHz and 500 GHz. For an optimized stripline-to-stripline transition, an insertion loss of less than 1 dB was measured at 500 GHz.

Manufacturable Low-Cost Flip-Chip Mounting Technology for 300–500-GHz Assemblies

A single-ended InP transimpedance amplifier (TIA) for next generation high-bandwidth optical fiber communication systems is presented. The TIA exhibits 48 dB-Omega transimpedance and has a 3-dB bandwidth of 92 GHz. The input-referred current noise is 20 pA/radicHz and the transimpedance group delay is below 10 ps over the entire measured frequency range.

InP Single-Ended Transimpedance Amplifier with 92-GHz Transimpedance Bandwidth

In this paper, the small- and large-signal modeling of InP heterojunction bipolar transistors (HBTs) in transferred substrate (TS) technology is investigated. The small-signal equivalent circuit parameters for TS-HBTs in two-terminal and three-terminal configurations are determined by employing a direct parameter extraction methodology dedicated to III–V based HBTs. It is shown that the modeling of measured S-parameters can be improved in the millimeter-wave frequency range by augmenting the small-signal model with a description of AC current crowding. The extracted elements of the small-signal model structure are employed as a starting point for the extraction of a large-signal model. The developed large-signal model for the TS-HBTs accurately predicts the DC over temperature and small-signal performance over bias as well as the large-signal performance at millimeter-wave frequencies.

Nils Weimann

Papers

A 1 W linear high-power InP balanced uni-traveling carrier photodetector

Millimeter-wave Signal Generation and Detection via the same Triple Barrier RTD and on-chip Antenna

Manufacturable Low-Cost Flip-Chip Mounting Technology for 300–500-GHz Assemblies

InP Single-Ended Transimpedance Amplifier with 92-GHz Transimpedance Bandwidth

Small- and large-signal modeling of InP HBTs in transferred-substrate technology