P
Pramod Reddy
Researcher at North Carolina State University
Publications - 68
Citations - 1392
Pramod Reddy is an academic researcher from North Carolina State University. The author has contributed to research in topics: Doping & Fermi level. The author has an hindex of 17, co-authored 68 publications receiving 911 citations. Previous affiliations of Pramod Reddy include Council of Scientific and Industrial Research.
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Journal ArticleDOI
The 2020 UV emitter roadmap
Hiroshi Amano,Ramon Collazo,Carlo De Santi,Sven Einfeldt,Mitsuru Funato,Johannes Glaab,Sylvia Hagedorn,Akira Hirano,Hideki Hirayama,Ryota Ishii,Yukio Kashima,Yoichi Kawakami,Ronny Kirste,Michael Kneissl,Michael Kneissl,Robert W. Martin,Frank Mehnke,Matteo Meneghini,Abdallah Ougazzaden,Peter J. Parbrook,Siddharth Rajan,Pramod Reddy,Friedhard Römer,Jan Ruschel,Biplab Sarkar,Biplab Sarkar,Ferdinand Scholz,Leo J. Schowalter,Philip A. Shields,Zlatko Sitar,Luca Sulmoni,Tao Wang,Tim Wernicke,Markus Weyers,Bernd Witzigmann,Yuh-Renn Wu,Thomas Wunderer,Yuewei Zhang +37 more
TL;DR: In this article, the state of the art for the most important aspects of UV emitters, their challenges and their outlook for future developments are summarized. But, the development since the first realization of UV electroluminescence in the 1970s shows that an improvement in understanding and technology allows the performance ofUV emitters to be pushed far beyond the current state.
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Doping and compensation in Al-rich AlGaN grown on single crystal AlN and sapphire by MOCVD
Isaac Bryan,Zachary Bryan,Shun Washiyama,Pramod Reddy,Benjamin E. Gaddy,Biplab Sarkar,M. Hayden Breckenridge,Qiang Guo,Milena Bobea,James Tweedie,Seiji Mita,Douglas L. Irving,Ramon Collazo,Zlatko Sitar +13 more
TL;DR: In this article, thin films were grown by metal organic chemical vapor deposition (MOCVD) on different templates on sapphire and low dislocation density single crystalline AlN.
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The effect of polarity and surface states on the Fermi level at III-nitride surfaces
TL;DR: In this paper, the effect of polarity on surface electronic properties was studied using x-ray photoelectron spectroscopy (XPS) data and the shift in charge neutrality levels and barrier heights due to polarity and the density of surface states on AlN and GaN were estimated from XPS measurements.
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On compensation in Si-doped AlN
Joshua S. Harris,Jonathon N. Baker,Benjamin E. Gaddy,Isaac Bryan,Zachary Bryan,Kelsey J. Mirrielees,Pramod Reddy,Ramon Collazo,Zlatko Sitar,Douglas L. Irving +9 more
TL;DR: In this paper, the formation energies and optical signatures of these defects in AlN are calculated and utilized in a grand canonical charge balance solver to identify carrier concentrations as a function of Si content.
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KOH based selective wet chemical etching of AlN, AlxGa1−xN, and GaN crystals: A way towards substrate removal in deep ultraviolet-light emitting diode
Wei Guo,Ronny Kirste,Isaac Bryan,Zachary Bryan,Lindsay Hussey,Pramod Reddy,James Tweedie,Ramon Collazo,Zlatko Sitar +8 more
TL;DR: In this paper, a controllable and smooth potassium hydroxide-based wet etching technique was developed for the AlGaN system, and high selectivity between AlN and AlxGa1−xN (up to 12×) was found to be critical in achieving effective substrate thinning or removal, thus increasing light extraction efficiency.