scispace - formally typeset
P

Pramod Reddy

Researcher at North Carolina State University

Publications -  68
Citations -  1392

Pramod Reddy is an academic researcher from North Carolina State University. The author has contributed to research in topics: Doping & Fermi level. The author has an hindex of 17, co-authored 68 publications receiving 911 citations. Previous affiliations of Pramod Reddy include Council of Scientific and Industrial Research.

Papers
More filters
Journal ArticleDOI

The 2020 UV emitter roadmap

TL;DR: In this article, the state of the art for the most important aspects of UV emitters, their challenges and their outlook for future developments are summarized. But, the development since the first realization of UV electroluminescence in the 1970s shows that an improvement in understanding and technology allows the performance ofUV emitters to be pushed far beyond the current state.
Journal ArticleDOI

Doping and compensation in Al-rich AlGaN grown on single crystal AlN and sapphire by MOCVD

TL;DR: In this article, thin films were grown by metal organic chemical vapor deposition (MOCVD) on different templates on sapphire and low dislocation density single crystalline AlN.
Journal ArticleDOI

The effect of polarity and surface states on the Fermi level at III-nitride surfaces

TL;DR: In this paper, the effect of polarity on surface electronic properties was studied using x-ray photoelectron spectroscopy (XPS) data and the shift in charge neutrality levels and barrier heights due to polarity and the density of surface states on AlN and GaN were estimated from XPS measurements.
Journal ArticleDOI

On compensation in Si-doped AlN

TL;DR: In this paper, the formation energies and optical signatures of these defects in AlN are calculated and utilized in a grand canonical charge balance solver to identify carrier concentrations as a function of Si content.
Journal ArticleDOI

KOH based selective wet chemical etching of AlN, AlxGa1−xN, and GaN crystals: A way towards substrate removal in deep ultraviolet-light emitting diode

TL;DR: In this paper, a controllable and smooth potassium hydroxide-based wet etching technique was developed for the AlGaN system, and high selectivity between AlN and AlxGa1−xN (up to 12×) was found to be critical in achieving effective substrate thinning or removal, thus increasing light extraction efficiency.