S
Shey-Shi Lu
Researcher at National Taiwan University
Publications - 300
Citations - 3680
Shey-Shi Lu is an academic researcher from National Taiwan University. The author has contributed to research in topics: CMOS & Noise figure. The author has an hindex of 30, co-authored 300 publications receiving 3431 citations. Previous affiliations of Shey-Shi Lu include National Chi Nan University & National Taiwan University of Science and Technology.
Papers
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A 0.6 V, 4.32 mW, 68 GHz Low Phase-Noise VCO With Intrinsic-Tuned Technique in 0.13 $\mu$ m CMOS
TL;DR: An intrinsic-tuned, 68 GHz voltage controlled oscillator (VCO) without an extra on-chip accumulation-mode metal oxide semiconductor (MOS)-varactor is demonstrated in a standard, 0.13 mum CMOS technology as discussed by the authors.
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A Millimeter-Wave CMOS Triple-Band Phase-Locked Loop With A Multimode LC-Based ILFD
TL;DR: In this article, a multiband phase-locked loop (PLL) is presented for the first time, which covers 40-, 60-, and 80 GHz bands. But the PLL is clocked by a reference frequency of 78 MHz and its output power is higher than -9.5 dBm.
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A fully integrated wireless CMOS microcantilever lab chip for detection of DNA from Hepatitis B virus (HBV)
Che-Wei Huang,Hsiao-Ting Hsueh,Yu-Jie Huang,Hsin-Hao Liao,Hann-Huei Tsai,Ying-Zong Juang,Tsung-Hsien Lin,Shey-Shi Lu,Chih-Ting Lin +8 more
TL;DR: In this article, a DNA detection system-on-a-chip (SoC) was implemented by 0.35μm commercialized standard CMOS process for label-free and real-time detection of Hepatitis B virus (HBV) DNA.
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An ultralow-loss and broadband micromachined RF inductor for RFIC input-matching applications
TL;DR: In this article, the authors demonstrate that the backside inductively coupled-plasma (ICP) deep-trench technology can be used to selectively remove the silicon underneath the inductors and achieve an ultralow-noise 3.1-10.6 GHz ultrawide-band RFIC.
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A micromachined CMOS distributed amplifier by CMOS compatible ICP deep-trench technology
TL;DR: In this paper, a backside ICP dry etching technique was proposed to selectively remove the silicon underneath the inductors of a 1-12.6 GHz CMOS distributed amplifier (DA).