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Stefan W. Glunz

Researcher at Fraunhofer Society

Publications -  526
Citations -  20246

Stefan W. Glunz is an academic researcher from Fraunhofer Society. The author has contributed to research in topics: Silicon & Solar cell. The author has an hindex of 64, co-authored 507 publications receiving 17212 citations. Previous affiliations of Stefan W. Glunz include University of Freiburg.

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Stack system of PECVD amorphous silicon and PECVD silicon oxide for silicon solar cell rear side passivation

TL;DR: A stack of hydrogenated amorphous silicon (a-Si) and PECVD-silicon oxide (SiOx) has been used as surface passivation layer for silicon wafer surfaces as discussed by the authors.
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BICON: high concentration PV using one‐axis tracking and silicon concentrator cells

TL;DR: In this article, a two-stage concentrator system developed at Fraunhofer ISE which is one-axis tracked is presented, which enables a high geometrical concentration of 300×× in combination with a high optical efficiency (upto 78%).
Proceedings ArticleDOI

Surface passivation of boron diffused emitters for high efficiency solar cells

TL;DR: In this article, the negative-charge dielectric Al 2 O 3 was applied as surface passivation layer on high efficiency n-type c-Si solar cells, and an independently certified solar cell efficiency of 23.2 % was obtained.
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Electrochemical methods to analyse the light-induced plating process

TL;DR: In this article, the authors proposed a simplified equivalent circuit for the light-induced plating (LIP) process, which is used for the metallisation of solar cells, exhibits compared to classical electroplating processes.
Proceedings ArticleDOI

Silicon oxide/silicon nitride stack system for 20% efficient silicon solar cells

TL;DR: In this paper, the authors investigated different rear stack systems of a thin thermally grown silicon oxide and PECVD silicon nitride layers for rear surface passivation in a comparatively easy high-efficiency process with laser fired rear contacts (LFC) efficiencies above 20% for FZ-Si and 18.2% for multicrystalline silicon.