S
Stefan W. Glunz
Researcher at Fraunhofer Society
Publications - 526
Citations - 20246
Stefan W. Glunz is an academic researcher from Fraunhofer Society. The author has contributed to research in topics: Silicon & Solar cell. The author has an hindex of 64, co-authored 507 publications receiving 17212 citations. Previous affiliations of Stefan W. Glunz include University of Freiburg.
Papers
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Journal ArticleDOI
Two‐terminal III–V//Si triple‐junction solar cell with power conversion efficiency of 35.9 % at AM1.5g
Patrick Schygulla,Ralph Müller,David Lackner,Oliver Höhn,Hubert Hauser,Benedikt Bläsi,Felix Predan,Jan Benick,Martin Hermle,Stefan W. Glunz,Frank Dimroth +10 more
Journal ArticleDOI
Impact of light‐induced recombination centres on the current–voltage characteristic of czochralski silicon solar cells
TL;DR: In this article, the effect of light-induced deep-level recombination center specific to boron-doped, oxygen-contaminated Czochralski (Cz) silicon on the currentvoltage characteristic of Cz silicon solar cells was investigated by means of numerical simulation and experiment.
Proceedings ArticleDOI
Progress in advanced metallization technology at Fraunhofer ISE
Stefan W. Glunz,Monica Aleman,Jonas Bartsch,N. Bay,K. Bayer,R. Bergander,A. Filipovic,S. Greil,A. Grohe,Matthias Hörteis,Annerose Knorz,M. Menko,Ansgar Mette,D. Pysch,V. Radtke,P. Richter,D. Rudolph,T. Rublack,C. Schetter,D. Schmidt,O. Schultz,Robert Woehl +21 more
TL;DR: The Fraunhofer ISE's concept for an advanced metallization of silicon solar cells is based on a two-step process: the deposition of a seed layer to form a mechanical and electrical contact and the subsequent thickening of this seed layer by a plating step, preferably by light-induced plating (LIP) as mentioned in this paper.
Patent
Verfahren zur herstellung eines halbleiter-metallkontaktes durch eine dielektrische schicht
TL;DR: In this paper, a Verfahren zur elektrischen Kontaktierung einer, mit wenigstens einer dielektraischen Schicht (12) uberzogenen Halbleiterschicht (13), is described.
Large Area TOPCon Cells Realized by a PECVD Tube Process
Stefan W. Glunz,Martin Hermle,Jochen Rentsch,Florian Clement,Martin Bivour,Anamaria Moldovan,Armin Richter,Jan Benick,Jana-Isabelle Polzin,Elmar Lohmüller,Sebastian Mack,D. Ourinson,Henning Nagel,Bernd Steinhauser,Tobias Fellmeth,Frank Feldmann +15 more
TL;DR: In this paper, the use of a plasma-enhanced chemical vapor deposition (PECVD) tool for deposition of SiNx or AlOx is discussed and the firing stability of the TOPCon/SiNx stack is discussed.