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Xiaohua Ma

Researcher at Xidian University

Publications -  531
Citations -  5629

Xiaohua Ma is an academic researcher from Xidian University. The author has contributed to research in topics: High-electron-mobility transistor & Threshold voltage. The author has an hindex of 29, co-authored 380 publications receiving 3523 citations. Previous affiliations of Xiaohua Ma include Fudan University.

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Electrodeposition and characterization of assembly of Sn on Cu nanorods for Li-ion microbattery application

TL;DR: In this article, the assembly of Sn on Cu nanorods electrode exhibited highly reversible specific capacity and superior capacity retention resulting from the three-dimensionalally nano-architectured design, which exhibits a large surface area, shortened Li-ion diffusion distance, Cu-Sn alloying, and can accommodate the volume expansion of Sn during cycling.
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2D nanosheets optimized electrospray-assisted interfacial polymerization polyamide membrane with excellent separation performance

TL;DR: In this article , 2D molybdenum disulfide (MoS2) nanosheets were used to endow the electrospray-assisted interfacial polymerization polyamide membrane with improved selectivity at a short spray time.
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Reverse blocking enhancement of drain field plate in Schottky-drain AlGaN/GaN high-electron mobility transistors

TL;DR: In this article, a combination of drain field plate (FP) and Schottky drain was proposed to improve the reverse blocking capability of high-electron mobility transistors (HEMTs).
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Stepwise combination of NH3 with BH4− in metal borohydride ammoniate

TL;DR: Step-wise combination of NH3 with BH4(-) was found to proceed in the AlCl3·mNH3-nLiBH4 system, but the residual N-H bonds could react further with excess B-H Bonds at elevated temperature.
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Characterization of Al 2 O 3 /GaN/AlGaN/GaN metal—insulator—semiconductor high electron mobility transistors with different gate recess depths

TL;DR: In this paper, a recessed-gate Al2O3 MIS-HEMT with three etching times (15 s, 17 s, and 19 s) was used to solve the interface trap issue and enhance the transconductance induced by high-k dielectric in metal-insulator-semiconductor (MIS) high electron mobility transistors (HEMTs).