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Xiaohua Ma

Researcher at Xidian University

Publications -  531
Citations -  5629

Xiaohua Ma is an academic researcher from Xidian University. The author has contributed to research in topics: High-electron-mobility transistor & Threshold voltage. The author has an hindex of 29, co-authored 380 publications receiving 3523 citations. Previous affiliations of Xiaohua Ma include Fudan University.

Papers
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High Efficiency Over 70% at 3.6-GHz InAlN/GaN HEMT Fabricated by Gate Recess and Oxidation Process for Low-Voltage RF Applications

TL;DR: In this paper , a high-efficiency InAlN/GaN high electron mobility transistor (HEMT) is fabricated by recess and oxidation process under the gate (RAO) for low-voltage RF applications.
Journal ArticleDOI

Highly Stable Fibronectin-mimetic-peptide-based Supramolecular Hydrogel to Accelerate Corneal Wound Healing.

TL;DR: In this article , a peptide-based supramolecular hydrogel was used to accelerate corneal re-epithelialization with a rational approach to mimic bioactive proteins.
Proceedings ArticleDOI

The Internal Matching Power Amplifier Design Based on Band-pass Filter with Parasitic Parameter

Yilin Chen, +1 more
TL;DR: In this article , a method of using band-pass filter for matching is presented, and the parasitic parameters of the device are used as part of the filter, which increases the frequency selectivity of the power amplifier.

Tri-Gate Normally-Off AlN/GaN HEMTs With 2.36 W/mm of Power Density and 67.5% Power-Added-Efficiency at Vd = 12 V

TL;DR: In this article , a tri-gate normally-off HEMTs RF power devices using MOCVD-grown thin barrier SiN/AlN/GaN heterostructures are presented.

Different Gate Current Degradation Mechanisms in AlGaN/GaN High Electron Mobility Transistors

TL;DR: In this paper , negative gate voltage bias step-stress experiments were implemented to investigate the degradation mechanisms in AlGaN/GaN HEMTs, and it was shown that surface leakage current becomes prominent when the gate and source of the device come near, thus the degradation of gate leakage caused by inverse piezoelectric effect is shield.