Shivaji University

About: Shivaji University is a education organization based out in Kolhāpur, Maharashtra, India. It is known for research contribution in the topics: Thin film & Scanning electron microscope. The organization has 3078 authors who have published 5295 publications receiving 115397 citations.

A Nonparametric Synthetic Control Chart Using Sign Statistic

Abstract: This article presents a synthetic control chart for detection of shifts in the process median. The synthetic chart is a combination of sign chart and conforming run-length chart. The performance evaluation of the proposed chart indicates that the synthetic chart has a higher power of detecting shifts in process median than the Shewhart charts based on sign statistic as well as the classical Shewhart X-bar chart for various symmetric distributions. The improvement is significant for shifts of moderate to large shifts in the median. The robustness studies of the proposed synthetic control chart against outliers indicate that the proposed synthetic control chart is robust against contamination by outliers.

TEOS based water repellent silica films obtained by a co-precursor sol–gel method

Abstract: The nature of interfaces between water and hydrophobic materials has been a subject of great interest. Experimental results from tetraethoxysilane (TEOS) based hydrophobic silica films synthesized by the two step sol?gel process using hexadecyltrimethoxysilane (HDTMS) as a co-precursor are described. The molar ratio of TEOS, methanol (MeOH), acidic water (0.001?M, oxalic acid), and basic water (8?M, NH4OH) was kept constant at 1:66.66:6.76:6.66, and the molar ratio of HDTMS/TEOS (M) was varied from 0 to 22.9 ? 10?2. The maximum contact angle of 125? was obtained for M = 22.9 ? 10?2. It is observed that the water contact angle value on the HDTMS modified films remained stable at 125?, after heat treatment up to 235??C. However, the water contact angle value decreased to 52? in the case of unmodified films, indicating the improvement in the thermal stability using HDTMS as a co-precursor. The hydrophobic silica films retained their hydrophobicity up to a temperature of 235??C and above this temperature the films became hydrophilic. The hydrophobic silica films were characterized by surface roughness studies, scanning electron microscopy (SEM), Fourier transform infrared (FTIR) spectroscopy, contact angle measurements, and % optical transmission.