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Proceedings ArticleDOI

A fully-decoded 2048-bit electrically-programmable MOS ROM

D. Frohman-Bentchkowsky
- pp 80-81
TLDR
A novel MOS charge storage transistor developed for an electrically-programmable ROM will be described, which provides access times of 500 ns (dynamic mode) or 800 ns (static mode).
Abstract
A novel MOS charge storage transistor developed for an electrically-programmable ROM will be described. The memory element is a fully-decoded 2048-bit silicon gate MOS chip that provides access times of 500 ns (dynamic mode) or 800 ns (static mode).

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Citations
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Book

FPGA Architecture: Survey and Challenges

TL;DR: This survey reviews the historical development of programmable logic devices, the fundamental programming technologies that the programmability is built on, and then describes the basic understandings gleaned from research on architectures.
Journal ArticleDOI

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Hot-electron emission in N-channel IGFET's

TL;DR: In this article, the emission of both substrate and channel hot electrons from the silicon into the gate insulator of n-channel IGFET's is discussed, and the effect of changing important material and geometrical parameters as well as temperature and terminal voltages is documented with emission data.
Patent

Low voltage EEPROM/NVRAM transistors and making method

Seiki Ogura
TL;DR: In this paper, a new FET device configuration for electrically programmable memories (EPROM), flash/electrically erasable and programmable read-only memories (EEPROM) and non-volatile Random Access Memory (NVRAM) which adds vertical components to a previously planar floating gate cell structure was proposed.
Journal ArticleDOI

The application of amorphous materials to computer memories

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References
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Journal ArticleDOI

AVALANCHE INJECTION CURRENTS AND CHARGING PHENOMENA IN THERMAL SiO2

TL;DR: In this paper, electron injection from p type silicon and hole injection from n type silicon by hot carrier emission have been observed to achieve average electron current densities as high as 10−2 A/cm2.
Journal ArticleDOI

Silicon-gate technology

TL;DR: Recent progress with silicon-gate technology is reviewed and its application to the construction of complex digital functions as illustrated by a memory circuit is shown.
Journal ArticleDOI

An integrated metal-nitride-oxide-silicon (MNOS) memory

TL;DR: A nonvolatile integrated metal-nitride-oxide-silicon (MNOS) word organized memory was fabricated in this paper, and the salient features of this integrated storage array are 1) WRITE cycle 2.0 microseconds, READ cycle 500 nanoseconds, 2) WRITE voltage ± 25V, 3) single device per storage bit, 4) MOS driving circuitry with no isolation between MOS and MNOS devices on the same chip, and 5) nonvolatility storage of information.
Journal ArticleDOI

A new MNOS charge storage effect

TL;DR: In this article, the authors describe a new charge storage effect occurring in MNOS tetrodes, which uses direct carrier injection over the Schottky barrier between silicon and gate insulator rather than tunnelling.
Journal ArticleDOI

A read-only memory using MAS transistors

TL;DR: A nonvolatile read-only memory using MAS (metal-alumina-silicon) transistors, that is electrically writable, is expected to hold written data for 1019hrs.