AlNxOy thin films deposited by DC reactive magnetron sputtering
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TLDR
AlNxOy thin films were produced by DC reactive magnetron sputtering, using an atmosphere of argon and a reactive gas mixture of nitrogen and oxygen, for a wide range of partial pressures of reactive gas.About:
This article is published in Applied Surface Science.The article was published on 2010-12-15 and is currently open access. It has received 37 citations till now. The article focuses on the topics: Partial pressure & Sputtering.read more
Citations
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Journal ArticleDOI
Properties of physically deposited thin aluminium film coatings: A review
TL;DR: In this paper, the properties of thin aluminium films and their complex interactions with process parameters are discussed and the significance of optimising the deposition methods and identifies research gaps in the published studies is highlighted.
Journal ArticleDOI
Polychromic Al–AlN cermet solar absorber coating with high absorption efficiency and excellent durability
TL;DR: In this article, double-absorber Al-N cermet solar selective coatings with double absorbing layers were deposited on Al substrates via a home-made DC magnetron sputter system.
Journal ArticleDOI
(Zr,Ti)CN coatings as potential candidates for biomedical applications
Viorel Braic,Mariana Braic,Mihai Balaceanu,Alina Vladescu,C.N. Zoita,Irina Titorencu,Victor V. Jinga +6 more
TL;DR: In this article, two (Zr,Ti)CN hard coatings, deposited by DC magnetron sputtering on Ti6Al4V alloy and Si substrates, were investigated as possible candidates to be used as protective layers for medical implants.
Journal ArticleDOI
Structure of CrON coatings formed in vacuum arc plasma fluxes
Bogdan Warcholiński,Adam Gilewicz,O. Lupicka,A.S. Kuprin,G.N. Tolmachova,V.D. Ovcharenko,I.V. Kolodiy,Mirosław Sawczak,A. Kochmańska,P. Kochmański,Tatyana A. Kuznetsova,T. I. Zubar,A.L. Khudoley,Sergei A. Chizhik +13 more
TL;DR: Cr-O-N coatings were formed by cathodic arc evaporation at different O 2 ǫ/ǫ(N 2 Ã + O 2 O 3 ) relative oxygen concentrations onto HS6-5-2 (DIN standard) steel substrates as discussed by the authors.
Journal ArticleDOI
Nanocomposite Ag:TiN thin films for dry biopotential electrodes
P. Pedrosa,P. Pedrosa,P. Pedrosa,Diogo Machado,C. Lopes,Eduardo Alves,N.P. Barradas,Nicolas Martin,F. Macedo,Carlos Fonseca,Carlos Fonseca,Filipe Vaz +11 more
TL;DR: In this article, a DC reactive sputtering with silver-added titanium nitride (Ag:TiN) thin films was used to study the electrical resistivity and thermal properties of bio-electrodes.
References
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WSXM: a software for scanning probe microscopy and a tool for nanotechnology.
I. Horcas,Raul Fernandez,José M. Gómez-Rodríguez,Jaime Colchero,Julio Gómez-Herrero,A. M. Baró +5 more
TL;DR: The most relevant features of WSXM, a freeware scanning probe microscopy software based on MS-Windows, are described and some relevant procedures of the software are carried out.
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Microstructural evolution during film growth
TL;DR: In this paper, the authors review the present understanding of film growth processes and their role in microstructural evolution as a function of deposition variables including temperature, the presence of reactive species, and the use of low-energy ion irradiation during growth.
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Metastable alumina polymorphs : Crystal structures and transition sequences
Igor Levin,David Brandon +1 more
TL;DR: The available literature on the crystal structure of the metastable alumina polymorphs and their associated transitions is critically reviewed and summarized in this article, where possible mechanisms for the phase transitions between the different alumina morphological polymorphs also discussed.
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Simulated annealing analysis of Rutherford backscattering data
TL;DR: In this article, the combinatorial optimization simulated annealing algorithm is applied to the analysis of Rutherford backscattering data, which is fully automatic and does not require time-consuming human intervention.
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Recent aspects concerning DC reactive magnetron sputtering of thin films: a review
TL;DR: In this article, the authors have discussed the hysteresis effect and the instability in the reactive gas pressure, differential poisoning of magnetron cathode, as well as the methods which are used to control the process.