Patent
Automatic photomask inspection system and apparatus
Kenneth Levy,Paul Sandland +1 more
TLDR
Optical inspection apparatus for detecting differences between two dies in a photomask and including a carriage for supporting the objects to be inspected and for simultaneously moving such objects along an inspection path, an illuminator for illuminating corresponding portions of the objects as they are moved along the inspection path as discussed by the authors.Abstract:
Optical inspection apparatus for detecting differences between two dies in a photomask and including a carriage for supporting the objects to be inspected and for simultaneously moving such objects along an inspection path, an illuminator for illuminating corresponding portions of the objects as they are moved along the inspection path, electro-optical detectors for individually inspecting the illuminated portions and for developing first and second electrical signals respectively corresponding thereto, electronic memories for storing the first and second electrical signals, a computer for scanning the memories and for electronically aligning a readout of the first signal relative to a readout of the second signal, and a comparator for comparing the electronically aligned signals and for indicating any differences therebetween.read more
Citations
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Patent
Methods and systems for utilizing design data in combination with inspection data
TL;DR: In this paper, a computer-implemented method for binning defects detected on a wafer includes comparing portions of design data proximate positions of the defects in design data space.
Patent
Electron beam inspection system and method
Dan Meisburger,Alan D. Brodie,Curt H. Chadwick,Desai Anil,Hans Dohse,Emge Dennis,John D Greene,Ralph H. Johnson,Ling Ming-Yie,Mcmurtry John,Barry Becker,Paul Ray,Michael B. Robinson,Richard R. Simmons,Smith David E A,John C. Taylor,Lee H. Veneklasen,Dean Walters,Wieczorek Paul,Sam Wong,April Dutta,Lele Surendra,Rough Kirkwood,Henry Pearce-Percy,Jau Jack Y,Chun C. Lin,Hoi T. Nguyen,Oyang Yen-Jen,Hutcheson Timothy L,David J. Clark,Chung-Shih Pan,Chetana Bhaskar,Kirk Chris,Eric Munro +33 more
TL;DR: In this article, a substrate is mounted on an x-y stage to provide at least one degree of freedom while the substrate is being scanned by the charged particle beam, and an optical alignment system for initially aligning the substrate beneath the particle beam.
Patent
Methods and systems for determining a critical dimension and overlay of a specimen
Ady Levy,Kyle A. Brown,Rodney Smedt,Gary Bultman,Mehrdad Nikoonahad,Dan Wack,John Fielden,Ibrahim Abdulhalim +7 more
Patent
Laser imaging system for inspection and analysis of sub-micron particles
TL;DR: In this article, a laser imaging system is used to analyze defects on semiconductor wafers that have been detected by patterned wafer defect detecting systems (wafer scanners).
Patent
Method and system for context-specific mask inspection
Robert C. Pack,Louis K. Scheffer +1 more
TL;DR: In this article, a method for inspecting lithography masks includes generating integrated circuit design data and using context information from the integrated circuit's design data to inspect a mask, based on which a mask can be inspected.
References
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Patent
Object positioning process and apparatus
TL;DR: In this article, the system compares a known stored distance between alignment targets with the distance determined from the successive alignments, when the distances agree within a preselected tolerance, then the objects are moved into alignment.
Patent
Multiple image registration system
J Hardy,D Redpath,G Hobrough +2 more
TL;DR: In this article, a multiple image registration system utilizing scanning patterns with orthogonally related scanning paths parallel to the directions of transformation is introduced for correcting x and y-parallax.
Patent
Optical comparator system to separate unacceptable defects from acceptable edge aberrations
TL;DR: In this paper, a single beam from a scanning light source is split to produce a pair of synchronously scanning focused light beams, which are mounted in optically equivalent positions on a traverse table which has a direction of travel orthogonal to parallel planes containing the scanning light beams.
Patent
Method of and apparatus for testing a two dimensional pattern
TL;DR: In this paper, a method of and apparatus for testing a two dimensional pattern using a pair of pick-up devices for scanning a reference pattern and the pattern to be tested is described.