Patent
Edge detection system
TLDR
In this paper, an edge detection system is presented that generates a scanning electron microscope (SEM) linescan image of a pattern structure including a feature with edges that require detection.Abstract:
An edge detection system is provided that generates a scanning electron microscope (SEM) linescan image of a pattern structure including a feature with edges that require detection. The edge detection system includes an inverse linescan model tool that receives measured linescan information for the feature from the SEM. In response, the inverse linescan model tool provides feature geometry information that includes the position of the detected edges of the feature.read more
Citations
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Patent
Edge detection system and its use for optical proximity correction
TL;DR: In this article, a method for determining roughness of a feature in a pattern structure includes generating, using an imaging device, a set of one or more images, each including measured linescan information that includes noise, and then detecting edges of the features within the pattern structure of each image without filtering the images, generating a biased power spectral density (PSD) dataset representing feature geometry information corresponding to the edge detection measurements.
Patent
System and method for removing noise from roughness measurements
TL;DR: In this paper, a method for determining roughness of a feature in a pattern structure includes generating, using an imaging device, a set of one or more images, each including measured linescan information that includes noise, and then detecting edges of the features within the pattern structure of each image without filtering the images, generating a biased power spectral density (PSD) dataset representing feature geometry information corresponding to the edge detection measurements.
Patent
System and method for generating and analyzing roughness measurements
TL;DR: In this article, a method for determining roughness of a feature in a pattern structure includes generating, using an imaging device, a set of one or more images, each including measured linescan information that includes noise, and then detecting edges of the features within the pattern structure of each image without filtering the images, generating a biased power spectral density (PSD) dataset representing feature geometry information corresponding to the edge detection measurements.
Patent
System and method for generating and analyzing roughness measurements and their use for process monitoring and control
TL;DR: In this paper, a method for determining roughness of a feature in a pattern structure includes generating, using an imaging device, a set of one or more images, each including measured linescan information that includes noise, and then detecting edges of the features within the pattern structure of each image without filtering the images, generating a biased power spectral density (PSD) dataset representing feature geometry information corresponding to the edge detection measurements.
Patent
Edge detection system and its use for machine learning
TL;DR: In this paper, the authors proposed a method to remove noise from roughness measurements to determine roughness of a feature in a pattern structure using an inverse linescan model, and evaluated a high-frequency portion of the biased power spectral density (PSD) dataset to determine a noise model for predicting noise over all frequencies, and subtracting the noise predicted by the determined noise model from a biased roughness measure.
References
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Journal ArticleDOI
Unbiased roughness measurements: Subtracting out SEM effects
TL;DR: In this paper, an inverse linescan model is used for edge detection and the noise in SEM edge and width measurements can be measured and removed statistically from roughness measurements, using different pixel sizes, magnifications, and frames of averaging on several different post-lithography and post-etch patterns.
Patent
Pattern inspection method
TL;DR: In this paper, a pattern inspection method of extracting a pattern edge shape from an image obtained by a scanning microscope and inspecting the pattern is presented. But the method is not suitable for inspection in the case of high dimensional images.
Proceedings ArticleDOI
Reducing roughness in extreme ultraviolet lithography
TL;DR: In this paper, a new global optimization approach is proposed, taking advantage of the different strengths and weaknesses of lithography and etch, for the insertion of extreme ultraviolet (EUV) lithography as proposed in the coming years.
Proceedings ArticleDOI
Using the analytical linescan model for SEM metrology
Chris A. Mack,Benjamin D. Bunday +1 more
TL;DR: The analytical linescan model (ALM) accomplishes this goal by using a physical model for linescan generation to constrain the possible shape of a linescan to allow edge positions to be estimated with very low sensitivity to noise.
Patent
Apparatus for data analysis
Atsuko Yamaguchi,Hiroki Kawada +1 more
TL;DR: In this article, edge points are extracted by specifying a height (values indicating a distance from a substrate) on a pattern when edges of the pattern are extracted from a CD-SEM image.