Proceedings ArticleDOI
Low energy electron bombardment induced surface contamination of Ru mirrors
A. Al-Ajlony,Aloke Kanjilal,M. Catalfano,Sivanandan S. Harilal,Ahmed Hassanein,Bryan J. Rice +5 more
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TLDR
In this paper, the impact of secondary electrons induced contamination of the Ru surface was investigated using X-ray and photoelectron spectroscopy (XPS) studies, and the corresponding effect on in-situ EUV reflectivity was examined by exposing Ru surface to photons at a wavelength of 13.5 nm in an ultrahigh vacuum chamber.Abstract:
The impact of secondary electrons induced contamination of the Ru surface was investigated. Mirror-like Ru sample
was bombarded with low energy (100 eV) electrons and the change in surface chemistry was investigated using X-ray
photoelectron spectroscopy (XPS).Along with XPS studies the corresponding effect on in-situ EUV reflectivity
was examined by exposing the Ru surface to photons at a wavelength of 13.5 nm in an ultrahigh vacuum chamber.
Detailed XPS analyses showed a sudden increase in carbon concentrations on the Ru surface in the first 60 min,
followed by a slow but linear growth in carbon concentration. In parallel, a noticeable decrease in water content was
observed during the time of electrons irradiation along with slight oxidation of pure Ru surface. All chemical
changes were discussed in terms of the electrons bombardment mediated dissociation of water and hydrocarbon
molecules. A time dependent EUV reflectivity measurements show insignificant change in reflectivity up to 510 min
of electrons bombardment. The impact of water molecules on the Ru surface and the accumulation of carbon
through dissociation of residual hydrocarbons is discussed in details.read more
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Patent
Photoemission monitoring of euv mirror and mask surface contamination in actinic euv systems
TL;DR: In this article, photoelectron emission mapping systems for use with EUV (extreme ultraviolet) mask inspection and lithography systems are described, where the EUV light generates photoelectrons on the surfaces of the mask and/or mirrors.
Journal ArticleDOI
Tracking electron-induced carbon contamination and cleaning of Ru surfaces by Auger electron spectroscopy
TL;DR: In this paper, the growth of carbon and oxygen desorption was investigated on a Ru surface by Auger electron spectroscopy (AES) in the presence and absence of additional photoelectrons (PEs) from a focusing Ru mirror.
Journal ArticleDOI
Plasma-assisted oxide removal from ruthenium-coated EUV optics
Alexander D. Dolgov,Christopher James Lee,Frederik Bijkerk,A. Abrikosov,V.M. Krivtsun,Dmitry Lopaev,O. F. Yakushev,M. van Kampen +7 more
TL;DR: In this article, an experimental study of oxide reduction at the surface of ruthenium layers on top of multilayer mirrors and thin Ru/Si films is presented, and it is shown that hydrogen ions are the main reducing agent and the addition of hydrogen radicals increases the reduction rate beyond that expected from simple flux calculations.
Radiation Induced Surface Modification and Contamination for EUV Lithography and Fusion Applications
TL;DR: Al-Montaser Bellah Al-Ajlony et al. as mentioned in this paper have discussed the effect of ionizing radiation on materials surfaces and the importance of this topic rises from the severity of the implications that a surface at a certain application might suffer due its interaction with some sort of ionising radiation.
References
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Journal ArticleDOI
Surface phenomena related to mirror degradation in extreme ultraviolet (EUV) lithography
TL;DR: In this article, the authors summarize the thermal and radiation-induced surface chemistry of bare Ru exposed to gases; the emphasis is on H2O vapor, a dominant background gas in vacuum processing chambers.
Proceedings ArticleDOI
Carbon accumulation and mitigation processes, and secondary electron yields of ruthenium surfaces
TL;DR: In this paper, the authors used ultrahigh vacuum surface science methods to address several aspects of Ru surface chemistry that may impact on Ru capping layer stability and mitigation process, and found evidence for some mitigation of carbon accumulation during electron bombardment in methyl methacrylate (MMA) + water vapor.
Journal ArticleDOI
Long-term stability of Ru-based protection layers in extreme ultraviolet lithography: A surface science approach
Herbert Over,Yunbin He,A. Farkas,Georg Ch. Mellau,Carsten Korte,Marcus Knapp,M. Chandhok,M. Fang +7 more
TL;DR: In this paper, the material properties of two promising capping layer materials, Ru and RuO2, for protecting the EUVL mirrors against oxidation, carbon uptake, and the permeation of hydrogen and oxygen.
Journal ArticleDOI
Electron impact-assisted carbon film growth on Ru(0001): Implications for next-generation EUV lithography
Georgios Kyriakou,David J. Davis,Robert B. Grant,David J. Watson,Anthony Keen,Mintcho S. Tikhov,Richard M. Lambert +6 more
TL;DR: In this article, graphitic film growth on Ru(0001) under low-energy electron irradiation in the presence of 1-butene, C5−C8 linear alkanes, and toluene is simulated.
Proceedings ArticleDOI
Compact electron-based EUV source for at-wavelength metrology
TL;DR: In this paper, a compact electron-based extreme ultraviolet (EUV) source for at-wavelength metrology is developed based on the transfer of advanced microfocus x-ray tube technology into the EUV spectral range.
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