Journal ArticleDOI
PLASMA DIAGNOSTICS OF AN rf-SPUTTERING GLOW DISCHARGE.
J. W. Coburn,Eric Kay +1 more
Reads0
Chats0
TLDR
In this paper, the positive ions incident on the substrate plane in a planar diode discharge system were observed with an electrostatic deflection energy analyzer and a quadrupole mass spectrometer.Abstract:
The positive ions incident on the substrate plane in a planar diode discharge system are observed with an electrostatic deflection energy analyzer and a quadrupole mass spectrometer. Several targets have been rf sputtered in rare‐gas discharges and the mass spectra that are obtained indicate that the sputtered species, which leave the target predominantly as neutrals, are subsequently ionized in the discharge by Penning ionization rather than by electron‐impact ionization or other ion‐molecule reactions.read more
Citations
More filters
Journal ArticleDOI
High power impulse magnetron sputtering discharge
TL;DR: The high power impulse magnetron sputtering (HiPIMS) discharge is a recent addition to plasma-based sputtering technology as mentioned in this paper, where high power is applied to the magnetron target in unipolar pulse.
Journal ArticleDOI
Positive‐ion bombardment of substrates in rf diode glow discharge sputtering
J. W. Coburn,Eric Kay +1 more
TL;DR: In this article, the authors measured the potential of an electrically isolated surface in an rf diode sputtering glow discharge and investigated the influence on these potentials of both the geometry enclosing the discharge volume and of a positively biased auxiliary electrode in contact with the discharge.
Journal ArticleDOI
Black silicon method X: a review on high speed and selective plasma etching of silicon with profile control: an in-depth comparison between Bosch and cryostat DRIE processes as a roadmap to next generation equipment
TL;DR: In this article, an intensive study has been performed to understand and tune deep reactive ion etch (DRIE) processes for optimum results with respect to the silicon etch rate, etch profile and mask etch selectivity.
Journal ArticleDOI
Sputtering—a review of some recent experimental and theoretical aspects
TL;DR: In this article, a brief outline of the present sputtering theory for a random solid, recent results of the sputtering yieldS for polycrystalline targets are discussed, in particular in view of the influence of the projectile mass and the bombarding angle.
References
More filters
Journal ArticleDOI
The Focusing of Charged Particles by a Spherical Condenser
TL;DR: In this article, it was shown that a group of charged particles, leaving a point on a normal to one of these boundaries and entering the condenser along this normal as a diverging bundle, will be brought to a focus at a point $Q$ lying on the line of the common center of curvature, $O$, of the equipotential surfaces.
Journal ArticleDOI
Mass spectrometric studies of molecular ions in the noble gases
John A. Hornbeck,J. P. Molnar +1 more
TL;DR: In this article, the ion intensity increased linearly with electron current and with the square of the gas pressure, and the form of the ionization versus electron energy curves resembles closely curves of excitation probability by electron collision.
Journal ArticleDOI
Plasma Sheath Formation by Radio‐Frequency Fields
H. S. Butler,G. S. Kino +1 more
TL;DR: In this article, it has been observed experimentally that the application of a radio-frequency voltage (10 kc/sec−50 Mc/sec) to any one of several electrode configurations around the outside of a plasma discharge tube results in a constriction of the luminous portion of the plasma away from the inner walls of the glass tube.
Related Papers (5)
Glow‐discharge mass spectrometry—Technique for determining elemental composition profiles in solids
A System for Determining the Mass and Energy of Particles Incident on a Substrate in a Planar Diode Sputtering System
A New Technique for the Elemental Analysis of Thin Surface Layers of Solids
J. W. Coburn,Eric Kay +1 more