Reflection mode imaging with nanoscale resolution using a compact extreme ultraviolet laser.
F. Brizuela,Georgiy O. Vaschenko,C. Brewer,M. Grisham,Carmen S. Menoni,Mario C. Marconi,Jorge J. Rocca,W. Chao,James Alexander Liddle,Erik H. Anderson,David Attwood,Aleksandr V Vinogradov,I. A. Artioukov,Y. P. Pershyn,V. V. Kondratenko +14 more
TLDR
The demonstrated demonstration of reflection mode imaging of 100 nm-scale features using 46.9 nm light from a compact capillary-discharge laser advances the development of practical and readily available surface and nanostructure imaging tools based on the use of compact sources of extreme ultraviolet light.Abstract:
We report the demonstration of reflection mode imaging of 100 nm-scale features using 46.9 nm light from a compact capillary-discharge laser. Our imaging system employs a Sc/Si multilayer coated Schwarzschild condenser and a freestanding zone plate objective. The reported results advance the development of practical and readily available surface and nanostructure imaging tools based on the use of compact sources of extreme ultraviolet light.read more
Citations
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Journal ArticleDOI
X-Ray laser: past, present, and future
Szymon Suckewer,P. Jaeglé +1 more
TL;DR: In this paper, the authors present the development of soft X-ray laser (SXL) and their applications using primarily collisional and recombination schemes and discuss conditions for using both schemes to reach the ''water window'' region.
Journal ArticleDOI
Single-shot extreme ultraviolet laser imaging of nanostructures with wavelength resolution
C. Brewer,Fernando Brizuela,Przemyslaw Wachulak,Dale Martz,Weilun Chao,Erik H. Anderson,David Attwood,Alexander V. Vinogradov,I. A. Artyukov,Alexander G. Ponomareko,V. V. Kondratenko,Mario C. Marconi,Jorge J. Rocca,Carmen S. Menoni +13 more
TL;DR: Near-wavelength resolution microscopy in the extreme ultraviolet with a single ~1 ns duration pulse from a desktop-size 46.9 nm laser is demonstrated, demonstrating that 54 nm half-period structures can be resolved.
Journal Article
Microscopy of extreme ultraviolet lithography masks with 13.2 nm tabletop laser illumination
Sergio Carbajo,Fernando Brizuela,Yong Wang,C. Brewer,Francesco Pedaci,Weilun Chao,E. H. Anderson,Yongmin Liu,Kenneth A. Goldberg,Patrick P. Naulleau,Przemyslaw Wachulak,Mario C. Marconi,David Attwood,Jorge J. Rocca,Carmen S. Menoni +14 more
TL;DR: In this article, a reflection microscope that operates at 13.2 nm wavelength with a spatial resolution of 55+/-3 nm was demonstrated using illumination from a tabletop extreme ultraviolet laser to acquire aerial images of photolithography masks.
Journal ArticleDOI
Microscopy of extreme ultraviolet lithography masks with 13.2 nm tabletop laser illumination
Fernando Brizuela,Yong Wang,C. Brewer,Francesco Pedaci,W. Chao,Erik H. Anderson,Youjian Liu,Kenneth A. Goldberg,Patrick P. Naulleau,Przemyslaw Wachulak,Mario C. Marconi,David Attwood,Jorge J. Rocca,Carmen S. Menoni +13 more
TL;DR: The demonstration of a reflection microscope that operates at 13.2 nm wavelength with a spatial resolution of 55+/-3 nm that uses illumination from a tabletop extreme ultraviolet laser to acquire aerial images of photolithography masks with a 20 s exposure time is reported.
EUV microexposures at the ALS using the 0.3-NA MET projectionoptics
Patrick P. Naulleau,Kenneth A. Goldberg,Erik H. Anderson,Jason P. Cain,Paul Denham,Brian Hoef,Keith H. Jackson,Anne-Sophie Morlens,Seno Rekawa,Kim Dean +9 more
TL;DR: In this paper, a programmable coherence illuminator was used to provide real-time pupil-fill control for the Berkeley Micro Exposure Tool (MET) with a dipole illumination out to {sigma}=1.
References
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Journal ArticleDOI
Demonstration of a High Average Power Tabletop Soft X-Ray Laser
TL;DR: In this paper, a tabletop soft x-ray laser was demonstrated at 46.9 nm in Ne-like Ar using a very compact tabletop discharge, achieving an average laser output power of approximately 1/mW.
Journal ArticleDOI
From micro to nano: recent advances in high-resolution microscopy.
TL;DR: By using interference and structured light methods microscope resolution has been improved to approximately 100 nm, and with non-linear methods a ten times improvement has been demonstrated to a current resolution limit of approximately 30 nm.
Journal ArticleDOI
Achievement of essentially full spatial coherence in a high-average-power soft-x-ray laser
Yi-Kai Liu,Yi-Kai Liu,M. Seminario,Fernando Gustavo Tomasel,Chang Chang,Chang Chang,Jorge J. Rocca,David Attwood,David Attwood +8 more
TL;DR: In this paper, the authors report an observation of essentially full spatial coherence in a high average power soft-x-ray laser, which allows the generation of fully coherent, milliwatt-level average power Soft X-ray radiation by a tabletop device.
Journal ArticleDOI
High-reflectivity multilayer mirrors for a vacuum-ultraviolet interval of 35–50??nm
Yu. A. Uspenskii,V. E. Levashov,Aleksandr V Vinogradov,Anatoli I. Fedorenko,V. V. Kondratenko,Yu. P. Pershin,Evgeniy N. Zubarev,V. Yu. Fedotov +7 more
TL;DR: Theoretical estimations as well as electron microscopy studies of Sc-Si interfaces indicate a large potential for a further increase in their reflectivity.
Journal ArticleDOI
20-nm resolution x-ray microscopy demonstrated by use of multilayer test structures [corrected].
Weilun Chao,Erik H. Anderson,G. Denbeaux,Bruce Harteneck,J. Alexander Liddle,Deirdre L. Olynick,A. Pearson,Farhad Salmassi,Cheng Yu Song,David Attwood +9 more
TL;DR: In this article, a soft x-ray microscope based on Fresnel zone plate lenses and partially coherent illumination was used to achieve a spatial resolution of 20 nm at 207nm wavelength.