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Journal ArticleDOI

Structural Features of Oxide Coatings on Aluminum

F. Keller, +2 more
- 01 Sep 1953 - 
- Vol. 100, Iss: 9, pp 411-419
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TLDR
In this paper, the structural features of the porous type of anodic oxide coating applied to aluminum have been investigated with the electron microscope, and formulas were given for calculating the cell size and pore volume of these coatings.
Abstract
The structural features of the porous type of anodic oxide coating applied to aluminum have been investigated with the electron microscope. These coatings consist of close‐packed cells of oxide, predominately hexagonal in shape, each of which contains a single pore. Pore size is a function of the electrolyte used and is independent of forming voltage. Wall thickness and barrier thickness are primarily a function of forming voltage and are affected to a minor degree by the electrolyte type. Pertinent dimensions of anodic coatings formed in sulfuric acid, oxalic acid, chromic acid, and phosphoric acid electrolytes are presented, and formulas are given for calculating the cell size and pore volume of these coatings.

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Journal ArticleDOI

Nanoscale pore formation dynamics during aluminum anodization.

TL;DR: A theoretical analysis of nanoscale pore formation during anodization reveals its fundamental instability mechanism to be a field focusing phenomenon when perturbations on the minima of the two oxide interfaces are in phase.
Journal ArticleDOI

Mechanical instability and pore generation in anodic alumina

TL;DR: In this article, the authors examined the mechanism of pore formation in anodic films on aluminium using transmission and scanning electron microscopies, and determined the compositions of films and the efficiencies of anodizing.
Journal ArticleDOI

Oxygen bubble mould effect: serrated nanopore formation and porous alumina growth

TL;DR: In this paper, a growth model for the formation mechanism of porous anodic alumina (PAA) films is proposed, which emphasizes the close relationship between pore generation and oxygen evolution.
Journal ArticleDOI

Wafer-Scale Near-Perfect Ordered Porous Alumina on Substrates by Step and Flash Imprint Lithography

TL;DR: A step and flash imprint lithography (SFIL)-based method to fabricate a near-perfect ordered AAO with square and hexagonal lattice configuration on silicon substrate over 4 in.
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