Journal ArticleDOI
Sub-10 nm imprint lithography and applications
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TLDR
A new lithography paradigm that is based on deformation of a resist by compression molding rather than altering its chemical structure by radiation, and is designed to fabricate nanostructures inexpensively with high throughput is presented.Abstract:
New developments, further details, and applications of imprint lithography are presented. Arrays of 10 nm diameter and 40 nm period holes were imprinted not only in polymethylmethacrylate (PMMA) on silicon, but also in PMMA on gold substrates. The smallest hole diameter imprinted in PMMA is 6 nm. All the PMMA patterns were transferred to a metal using a liftoff. In addition, PMMA mesa’s of a size from 45 nm to 50 μm were obtained in a single imprint. Moreover, imprint lithography was used to fabricate the silicon quantum dot, wire, and ring transistors, which showed the same behavior as those fabricated using electron (e)-beam lithography. Finally, imprint lithography was used to fabricate nanocompact disks with 10 nm features and 400 Gbits/in.2 data density—near three orders of magnitude higher than current critical dimensions (CDs). A silicon scanning probe was used to read back the data successfully. The study of wear indicates that due to the ultrasmall force in tapping mode, both the nano-CD and the ...read more
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Progress in non-volatile memory devices based on nanostructured materials and nanofabrication
TL;DR: In this article, the authors discuss new technologies that make this continuous device scaling possible and discuss the fabrication and characterization of nonvolatile memory devices made of nanostructured materials and by nanofabrication.
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Through-hole membranes of nanoporous alumina formed by anodizing in oxalic acid and their applications in fabrication of nanowire arrays
TL;DR: In this paper, the structural features of anodic porous alumina such as pore diameter, interpore distance, porosity, pore density and pore circularity were investigated at various durations of pore opening/widening process carried out in 5% H 3 PO 4.
Journal ArticleDOI
Nanoimprinted semiconducting polymer films with 50 nm features and their application to organic heterojunction solar cells
TL;DR: The application to organic solar cells is shown by creating an interpenetrated donor-acceptor interface, based on P3HT and N,N'-ditridecyl-3,4,9,10-perylenetetracarboxylic diimide (PTCDI-C(13), deposited from the vapor phase to reduce shadow effects.
Journal ArticleDOI
Laser nanofabrication in photoresists and azopolymers
Zouheir Sekkat,Satoshi Kawata +1 more
TL;DR: In this paper, the basic processes as well as technological advances and applications of nanofabrication by light are discussed, and recent advances and achievements in polymer photomechanics and light-activated molecular movement in azopolymers are also reviewed.
Journal ArticleDOI
Review of Adaptive Programmable Materials and Their Bioapplications.
TL;DR: In this review, the most-recent advances in the design strategies of adaptive programmable materials are presented with respect to different types of architectural polymers, including stimuli-responsive polymers and shape-memory polymers.
References
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Single Charge Tunneling: Coulomb Blockade Phenomena in Nanostructures
TL;DR: Averin et al. as discussed by the authors proposed a single charge tunneling method to transfer electrons one-by-one in low-Capacitance tunnel junctions, and applied it to semiconductor nanostructures.