Journal ArticleDOI
Sub-10 nm imprint lithography and applications
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TLDR
A new lithography paradigm that is based on deformation of a resist by compression molding rather than altering its chemical structure by radiation, and is designed to fabricate nanostructures inexpensively with high throughput is presented.Abstract:
New developments, further details, and applications of imprint lithography are presented. Arrays of 10 nm diameter and 40 nm period holes were imprinted not only in polymethylmethacrylate (PMMA) on silicon, but also in PMMA on gold substrates. The smallest hole diameter imprinted in PMMA is 6 nm. All the PMMA patterns were transferred to a metal using a liftoff. In addition, PMMA mesa’s of a size from 45 nm to 50 μm were obtained in a single imprint. Moreover, imprint lithography was used to fabricate the silicon quantum dot, wire, and ring transistors, which showed the same behavior as those fabricated using electron (e)-beam lithography. Finally, imprint lithography was used to fabricate nanocompact disks with 10 nm features and 400 Gbits/in.2 data density—near three orders of magnitude higher than current critical dimensions (CDs). A silicon scanning probe was used to read back the data successfully. The study of wear indicates that due to the ultrasmall force in tapping mode, both the nano-CD and the ...read more
Citations
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Anti-adhesive effects of diverse self-assembled monolayers in nanoimprint lithography
TL;DR: In this paper, self-assembled monolayers such as CH 3 (CH 2 ) 17 SiCl 3 (OTS) and CF 3 (CF 2 ) 7 ( CH 2 ) 2 SiCl3 (FDTS) are adopted as an anti-adhesive layer to increase the lifetime of the mold.
Journal ArticleDOI
A soft-imprint technique for submicron structure fabrication via in situ polymerization
Won Mook Choi,O Ok Park +1 more
TL;DR: In this paper, a soft-imprint technique for the fabrication of submicron scale polymer structures that can be simply performed at room temperature by polymerization with an elastomeric polydimethylsiloxane (PDMS) mould is investigated.
Journal ArticleDOI
Topographical patterning: characteristics of current processing techniques, controllable effects on material properties and co-cultured cell fate, updated applications in tissue engineering, and improvement strategies
TL;DR: Five aspects of topographical patterning are discussed, including the process of typical micro-/nanotechniques and their advantages and limitations, the effects of patterning on the mechanical properties and surface properties of substrates, and the application of patterns to solve the issues of targeted organs.
Journal ArticleDOI
Influence of mold and substrate material combinations on nanoimprint lithography process: MD simulation approach
TL;DR: In this paper, the effect of mold-substrate material composition on the pattern transferring and defects of the resist polymer in a thermal nano-imprint lithography (NIL) process was examined.
Journal ArticleDOI
Patterning and applications of nanoporous structures in organic electronics
TL;DR: The integration of nanoporous structures into organic electronics has received intensive interest from both academia and industry due to their potential for low-cost, large-area, and solution-processed alternative to conventional inorganic devices.
References
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Single Charge Tunneling: Coulomb Blockade Phenomena in Nanostructures
TL;DR: Averin et al. as discussed by the authors proposed a single charge tunneling method to transfer electrons one-by-one in low-Capacitance tunnel junctions, and applied it to semiconductor nanostructures.