Journal ArticleDOI
Temperature-dependent residual stresses in a hetero-epitaxial thin film system
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In this paper, the authors investigated the temperature dependence of residual stresses in a hetero-epitaxial thin film on a sapphire substrate and found that the magnitude of compressive residual stresses decrease with increasing temperature, and that the rate of change can be well predicted theoretically.About:
This article is published in Thin Solid Films.The article was published on 2015-06-01. It has received 4 citations till now. The article focuses on the topics: Residual stress & Thin film.read more
Citations
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Journal ArticleDOI
Tb3+-doped WO3 thin films: A potential candidate in white light emitting devices
V.S. Kavitha,R. Reshmi Krishnan,R. Sreeja Sreedharan,K. Suresh,C.K. Jayasankar,V.P. Mahadevan Pillai +5 more
TL;DR: In this paper, Tb3+-doped tungsten oxide (WO3) thin films are fabricated using Radio Frequency (RF) magnetron sputtering technique.
Journal ArticleDOI
Ferroelectric properties of SOS and SOI pseudo-MOSFETs with HfO2 interlayers
Vladimir Popov,V.A. Antonov,M.A. Ilnitsky,I.E. Tyschenko,V.I. Vdovin,A. V. Miakonkikh,Konstantin V. Rudenko +6 more
TL;DR: In this paper, the formation of a multi-crystalline HfO2 film, containing the ferroelectric phase OII (Pmn21), after a high-temperature annealing at 1100 °C, was experimentally observed by HREM for the first time in silicon-on-sapphire (SOS) structures obtained by direct bonding and a hydrogen transfer of silicon layer on Si or C-Sapphire substrates.
Journal ArticleDOI
Effects of heat treatments on the microstructure and the adhesion of Cr, Ti, Al, Zr HiPIMS films deposited on APS Al2O3 and ZrO2-8Y2O3 coatings
TL;DR: In this article, the phase formation, residual stress state, mechanical properties, and film adhesion of thin films on thermally sprayed ceramics were investigated, and it was shown that phase transformations, increased lattice mismatches as well as differences in the thermal expansion behavior of the substrate and the film had a negative influence on the film's adhesion.
References
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Book
Residual Stress: Measurement by Diffraction and Interpretation
Ismail C. Noyan,J. B. Cohen +1 more
TL;DR: In this paper, the authors proposed a method to measure residual stress from X-ray diffraction data. But, their method is not suitable for the analysis of nonlinear elasticity theory.
Book
Multiple regression in practice
William D. Berry,Stanley Feldman +1 more
TL;DR: In this article, the consequences of violating the assumptions of the regression model procedures for figuring out when violations exist and strategies for dealing with problems when they occur are discussed, with many examples from political science sociology and economics.
Journal ArticleDOI
Stress-related effects in thin films
John A. Thornton,D.W. Hoffman +1 more
TL;DR: In this paper, the fundamental nature of the internal stresses that are found in both evaporated and sputtered coatings is reviewed from the point of view of decorative coating applications, which indicate that apparatus geometry is particularly important in determining the state of stress that forms in deposits.
Journal ArticleDOI
Frontiers of silicon-on-insulator
TL;DR: In this article, the authors discuss methods of forming silicon-on-insulator (SOI) wafers, their physical properties, and the latest improvements in controlling the structure parameters.
Book
Properties of Crystalline Silicon
TL;DR: In this paper, a reference work aimed at academics, process developers and device simulation engineers working in silicon microelectronics, Professor Hull has brought together 100 authors from the USA, Japan and Europe to review its properties.