Journal ArticleDOI
The effect of target power on the nitrogen partial pressure level and hardness of reactively sputtered titanium nitride coatings
TLDR
In this paper, the authors measured the partial pressures of the argon and nitrogen gases measured through the target show an apparent drop as power is applied to the titanium target, which is actually a density reduction of the gases in front of the target due to gas rarefaction and heating.About:
This article is published in Thin Solid Films.The article was published on 1989-04-01. It has received 65 citations till now. The article focuses on the topics: Sputter deposition & Titanium nitride.read more
Citations
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Journal ArticleDOI
Control of reactive sputtering processes
TL;DR: In this paper, both pulsed dc and mid-frequency ac power was used to prevent arcing during reactive sputtering of insulating films. But the results showed that the results were not optimal.
Journal ArticleDOI
Optical Properties and Plasmonic Performance of Titanium Nitride
TL;DR: In this article, the plasmonic performance of TiN was evaluated by calculating the surface-plasmon polariton dispersion relations and the Localized Surface Plasmon Resonance (LSPR) band of nanoparticles.
Journal ArticleDOI
Nano‐indentation studies of ultrahigh strength carbon nitride thin films
TL;DR: Carbon nitride (CNx) thin films were prepared by dc magnetron sputtering of a graphite target in a nitrogen ambient onto Si(100) substrates held at ambient temperatures as discussed by the authors.
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Reactive unbalanced magnetron sputter deposition of polycrystalline TiN/NbN superlattice coatings
TL;DR: In this article, an opposed dual-cathode unbalanced magnetron sputtering system was used to deposit polycrystalline TiN/NbN superlattice coatings, with periods between 2.5 nm and 150 nm, on M2 tool steel substrates.
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Tribology of carbon coatings: DLC, diamond and beyond
TL;DR: In this paper, the authors reviewed the tribological properties of carbon-like carbon (DLC), diamond and more novel carbonaceous coatings and discussed their tribological performance in light of their adhesion, residual stress and hardness.
References
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Journal ArticleDOI
Modeling of reactive sputtering of compound materials
TL;DR: In this article, an experimentally verified useful new model for reactive sputtering is presented, which involves that gettering of the reactive gas takes place at the target and at the walls opposite to the target.
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Gas density reduction effects in magnetrons
TL;DR: In this paper, the gas density in front of a magnetron cathode has been found to be significantly reduced as a function of magnetron current, due to gas heating and rarefaction resulting from collisions with the sputtered atoms ejected from the cathode surface.
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Predicting thin‐film stoichiometry in reactive sputtering
TL;DR: In this article, the authors presented a model that enables us to predict both sputtering rate and film composition during reactive sputtering, and showed that there exists a linear relationship between processing parameters for maintaining constant thin-film composition.
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Very high rate reactive sputtering of TiN, ZrN and HfN
TL;DR: The reactive sputtering rate for the group IVb nitrides was found to be 100% of the metal rate as mentioned in this paper, whereas for ZrN and HfN the rate was 95% of metal rate.
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A sputtering wind
TL;DR: In this article, a directional pressure probe extending from a capacitance manometer and rotatable over 360 degrees of orientation was inserted at midlength near a high-rate magnetron sputtering source.