Showing papers on "Ammonium hydroxide published in 1999"

Cleaning composition and method for removing residues

Abstract: Non-corrosive cleaning compositions that are aqueous based and useful for removing photoresist, plasma etch and CMP residues from a substrate. One preferred cleaning composition comprises: (i) a hydroxylamine or a hydroxylamine salt compound; (ii) at least one fluorine-containing compound; and (iii) water. Another cleaning composition comprises: (i) a compound selected from the group consisting of: an amine, a quaternary ammonium hydroxide, and ammonium hydroxide; (ii) at least one fluorine-containing compound; and (iii) water.

Effects of mobile-phase additives, solution pH, ionization constant, and analyte concentration on the sensitivities and electrospray ionization mass spectra of nucleoside antiviral agents.

Abstract: The effects of various mobile-phase additives, solution pH, pKa, and analyte concentration on electrospray ionization mass spectra of a series of purine and pyrimidine nucleoside antiviral agents were studied in both positive and negative ion models. The use of 1% acetic acid resulted in good HPLC separation and the greatest sensitivity for [M + H]+ ions. In the negative ion mode, 50 mM ammonium hydroxide gave the greatest sensitivity for [M - H]- ions. The sensitivities as [M + H]+ ions were significantly larger than the sensitivities as [M - H]- ions for purine antiviral agents. Vidarabine monophosphate and pyrimidine antiviral agents, however, showed comparable or greater sensitivities as [M - H]- ions. The sensitivity as [M + H]+ showed no systematic variation with pH; however, the sensitivity as [M - H]- did increase with increasing pH. At constant pH, the ion intensity of the protonated species increased with increasing pKa. At higher analyte concentrations, dimer (M2H+) and trimer (M3H+) ions were observed. [M + Na]+ adducts were the dominant ions with 0.5 mM sodium salts for these compounds. The spectra of the more basic purine antiviral agents showed no [M + NH4]+ adduct ions, but [M + NH4]+ ions were the major peaks in the spectra of the less basic pyrimidine antiviral agents with ammonium salts. The ammonium adduct ion was formed preferentially when the proton affinity of the analyte was close to that of NH3. Abundant [M + OAc]- ions were observed for all of the antiviral agents except vidarabine monophosphate from solutions with added HOAc, NaOAc, and NH4OAc. The utility of mobile phases containing 1% HOAc or 50 mM NH4OH was demonstrated for chromatographic separations.

Electrochemical polymerization of aniline investigated using on-line electrochemistry/electrospray mass spectrometry.

Abstract: A thin-layer electrochemical flow cell coupled on-line with electrospray mass spectrometry (EC/ES-MS) was used to investigate the soluble products from the controlled-potential anodic polymerization of aniline in H2O and H2O/CH3OH (1/1 v/v) with ammonium acetate and acetic acid or ammonium hydroxide as electrolytes (pH 4, 6.5, or 9). At a working electrode (glassy carbon) potential of 1.0 V versus Ag/AgCl, singly protonated aniline oligomers containing as many as 10 aniline units (10-mer) were observed in the ES mass spectra when the polymerization in H2O/CH3OH at pH 4 was carried out. The abundance of the higher n-mers decreased at higher solution pH and in 100% H2O at pH 4. Most of the oligomers were observed in more than one redox state ranging from fully oxidized (all imine nitrogens) to fully reduced (all amine nitrogens). The number of different redox states observed for the n-mers increased with increasing n. The structures of the reduced (m/z 185) and oxidized (m/z 183) aniline dimer ions (head-to...

Formation of Self-Assembled Monolayers of Alkanethiols on GaAs Surface with in Situ Surface Activation by Ammonium Hydroxide

Abstract: The formation of self-assembled monolayers (SAMs) of alkanethiols on GaAs was studied using attenuated total reflection Fourier transform infrared spectroscopy. SAMs formed from an ethanol solution containing ammonium hydroxide were more ordered and stable than those obtained by the method previously reported in which surfaces were derivatized from neat molten alkanethiols at elevated temperatures. It is suggested that ammonium hydroxide etches the native surface oxide of GaAs during an initial step followed by the chemisorption of alkanethiols on the chemically reactive surface. The effect of ammonium hydroxide concentrations on the SAM coverage was investigated. Well-ordered layers with close packing were formed when the ammonium hydroxide concentration was 3 vol %. SAMs of alkanethiols with different chain lengths showed that the order increases with increasing chain length (from C12H25SH to C18H37SH).

Atomic structure and magnetic properties of MnFe2O4 nanoparticles produced by reverse micelle synthesis

Abstract: Using the aqueous cores of reverse micelles as nanoreactors, nanoparticles (d∼10 nm) of the mixed ferrite MnFe2O4 were produced. Seven processing trials were performed where the concentration of ammonium hydroxide, reaction temperature, and the oxidizing agent were varied. All trials result in Mn-ferrite particles with varying chemistry and structure. The Mn concentration in the resulting ferrite is strongly enhanced by both the presence of H2O2 as an oxidizing agent and a surplus of ammonium hydroxide. The increased Mn concentration correlates with a higher fraction of octahedrally coordinated Mn cations. When near-stoic amounts of ammonium hydroxide are used, the resulting ferrites are nearly stoichiometric with a more equitable distribution of Mn cations on the octahedral and tetrahedral sublattices. In all ferrite nanoparticles, the Mn cations have a preference for octahedral site occupancy that is larger than the 20% measured in bulk Mn-ferrite. We attribute the cation filling trends to the stabilization of excess trivalent Mn during processing.

Processes for producing amino acid having secondary or tertiary amino group and three or more carboxyl groups and its salt

Abstract: A process for producing an amino acid having a secondary or tertiary amino group and 3 or more carboxyl groups (AADA) or its salt with an alkali metal in the equivalent amount or less by electrically dialyzing an aqueous solution of an alkali metal salt of an amino acid having a secondary or tertiary amino group and 3 or more carboxyl groups to thereby reduce the alkali metal ion. By using this process, an AADA salt can be produced at a much higher yield while requiring neither such a step of regenerating a resin as required in the case with the use of an ion exchange resin nor such a separation step via crystallization as required in the case with the addition of an organic solvent. A process for producing a salt of an amino acid having a secondary or tertiary amino group and 3 or more carboxyl groups by reacting an amino acid having a secondary or tertiary amino group and 3 or more carboxyl groups with a metal oxide, a metal hydroxide, a metal carbonate, a metal hydrogencarbonate, ammonium hydroxide, ammonium carbonate, ammonium hydrogencarbonate or an organic amine compound. By using this process, a metal salt, an ammonium salt or an organic amine salt of AADA can be efficiently produced without forming any by-product.

Process for preparing titanium silicon molecular sieves

Abstract: The preparation process of titanium-silica molecular sieve is characterized by that it uses tetrabutyl titanate or tetraethyl titanate or trivalent inorganic titanium compound, tetraethyl silicate orsilicasol to recover molecular sieve crystallizing mother liquor and quaternary ammonium hydroxide or/and organic amine as raw materials, and utilizes the hydrothermal process to synthesize the titanium-silica molecular sieve. Said molecular sieve is low in cost, short in synthesizing period, high in crystallinity, and possesses high catalytic activity and selectivity, and at the same time it hasno the pollution of waste liquor (mother liquor) produced after the molecular sieve is crystallized to environment.

Methods and etchants for etching oxides of silicon with low selectivity

Abstract: A surface having exposed doped silicon dioxide such as BPSG is cleaned with a solution that etches thermal oxide at least one-third as fast as it etches the exposed doped silicon dioxide, resulting in more thorough cleaning with less removal of the exposed doped silicon dioxide. Specific applications to formation of container capacitors are disclosed. Preferred cleaning solutions include about 46 parts ammonium fluoride, about 9.5 parts hydrogen fluoride, and about 8.5 parts ammonium hydroxide in about 100 parts water by weight; and about 670 parts ammonium fluoride and about 3 parts hydrogen fluoride in about 1000 parts water by weight. The latter solution is also useful in cleaning methods in which a refractory metal silicide is exposed to the cleaning solution such as in cleaning prior to spacer formation or prior to a gate stack contact fill, in which case about 670 parts ammonium fluoride and about 1.6 parts hydrogen fluoride in about 1000 parts water is most preferred.

Planarized Cu cleaning for reduced defects

Abstract: Cu metallization is treated to reduce defects and effect passivation by removing a thin surface layer or removing corrosion stains, subsequent to CMP and barrier layer removal, employing a cleaning composition comprising deionized water, an acid and ammonium hydroxide and/or an amine. Embodiments include removing up to about 100 Å of the Cu metallization surface in a damascene opening by sequentially treating the exposed Cu surface with: an optional corrosion inhibitor; a solution having a pH of about 4 to about 11 and containing an acid, ammonium hydroxide and/or an amine, and deionized water; and a corrosion inhibitor.

Phase formation and composition of Mn–Zn ferrite powders prepared by hydrothermal method

Abstract: Mn–Zn ferrite powders were prepared by hydrothermally aging the coprecipitates of compositional metal ions using ammonium hydroxide as a precipitant. R value (alkalinity) = (moles of added OH−)/[(moles of added Zn2+) × 2 + (moles of added Mn2+) × 2 + (moles of added Fe3+) × 3] was introduced to adjust the amount of added ammonia. The results show that the R value of starting suspension and hydrothermal time have similar and dominant effects on the composition, spinel ratio, and crystallite size of synthesized powders. From the analyses of x-ray diffraction (XRD) and inductively-coupled plasma (ICP), it notes that no α–Fe2O3 peak in the XRD patterns of powders synthesized at R = 2–3, 150 °C × 2 h, may be due to lower degree of crystallinity and less amount of α–Fe2O3 existing in these powders. Both the increase of hydrothermal time and of R value can promote the crystallinity of powders and also cause a significant loss of zinc, hinting that in the hydrothermal process, the loss of zinc may play a crucial role in the crystallinity of hydrothermally synthesized powders.

Treatment method for semiconductor substrates

Abstract: A method of treating a semiconductor substrate by first oxidizing and reducing the semiconductor substrate by immersion in an aqueous solution of ammonium hydroxide and hydrogen peroxide, and then oxidizing the semiconductor substrate by immersion in an aqueous solution of ozone, nitric acid, hydrogen peroxide, or mixtures thereof, and then reducing the oxidized semiconductor substrate by immersing it in a first aqueous solution composed of a mixture of hydrofluoric acid and an organic acid or salt thereof, thereafter rinsing the reduced semiconductor substrate by immersion in a second aqueous solution composed of a mixture of hydrofluoric acid and an organic acid or salt thereof, and then reoxidizing the rinsed semiconductor substrate by immersing it in an aqueous solution of ozone, nitric acid, hydrogen peroxide or mixtures thereof.

Electrochemical Behavior of Copper in Tetramethyl Ammonium Hydroxide Based Solutions

Abstract: An investigation was undertaken to characterize the electrochemical behavior of copper in tetramethyl ammonium hydroxide (TMAH) based solutions. The effect of hydrogen peroxide and abrasion with a polyvinyl alcohol (PVA) brush on the corrosion of copper in alkaline solutions were characterized. Galvanic interactions between copper and tantalum in TMAH as well as in ammonium hydroxide (NH4OH) solutions were investigated. The experimental results have shown that the corrosion of copper in TMAH is lower than that in NH4OH, especially at pH values higher than 10. Even in the presence of hydrogen peroxide, TMAH corrodes copper at a lower rate than NH4OH.

High purity silica sol and its production

Abstract: PROBLEM TO BE SOLVED: To provide a process for producing a high purity silica sol containing no impurities from an alkali silicate. SOLUTION: This production process comprises: a first stage for dissolving a silica gel in which the content of each of impurity elements, i.e., Al, Ca, B, Ba, Co, Cr, Cu, Fe, Mg, Mn, Na, Ni, Pb, Sr, Ti, Zn, Zr, U and Th, is <=5 ppm, into a quaternary ammonium hydroxide aqueous solution; a second stage for removing the quaternary ammonium hydroxide from the solution by an ion exchange method to form an active silicic acid solution; and a third stage for heating the active silicic acid solution in the presence of an alkali catalyst to grow silica particles into those having 3-300 nm particle size.

Cleaning fluid composition for cleaning non-iron metal

Abstract: PROBLEM TO BE SOLVED: To provide a non-iron metal cleaning fluid composition suitable for cleaning such a material to be cleaned which is required for the cleanness with a high degree, as for example a magnetic disc substrate, a super precise metallic mirror, a liquid crystalline display substrate, a semiconductor substrate and so on, and besides on which surface a non-iron metal such as aluminum, copper and an alloy of these metals exists. SOLUTION: A cleaning fluid composition for cleaning a non-iron metal comprises an aqueous solution of quaternary ammonium hydroxide which is added with a quaternary ammonium salt of silicic acid or an alkyl silicate, an anticorrosive auxiliary, an alkanol amine, and a surfactant, and contains substantially none of impurities such as metallic ions and anionic ones.

Thermal Decomposition and Crystallization of Aqueous Sol-Gel Derived Zirconium Acetate Gels: Effects of the Precursor Solution pH

Abstract: Crystalline zirconia has previously been formed by desiccation and pyrolysis of a pH 3.4 zirconium acetate precursor solution. In this study, amorphous gels were formed by desiccation of zirconium acetate precursor solutions at pH 0.9 to 3.4 obtained by adding hydrochloric acid and at pH 8.0 by adding ammonium hydroxide to the available pH 3.4 precursor solution. The concentrations of the uncomplexed zirconium ion and the 1 : 1 and 1 : 2 zirconium acetate complexes varied with pH. Decomposition of the amorphous gel and its structure evolution to form crystalline zirconia by pyrolysis were studied. Several decomposition and structure transition temperatures occurring in the pyrolysis and the polymorph distribution in the pyrolysis products were dependent on the pH of the precursor solution. These variations of structure evolution with pH were also related to the relative concentrations of specific zirconium complexes in the precursor solutions. Removal of carbon by pyrolysis was improved by adding hydrochloric acid or ammonium hydroxide to the pH 3.4 precursor solution.

Precision detergent composition

Abstract: PROBLEM TO BE SOLVED: To provide a precision detergent composition for using in a washing process of a wash to be washed of glass, wafer or the like, which requires a high surface cleanness, without causing any damage of yellowing, latent flaw or the like on the surface of the wash to be washed, and besides the composition substantially containing no metal ion, no harmful anionic ion such as a halogen ion or the like which causes a bad influence on the surface of the wash to be washed after the washing. SOLUTION: A precision detergent composition comprises quaternary ammonium carbonate and quaternary ammonium hydroxide as a principal component, a washing aqueous solution containing an organic acid as a pH adjustor, and according to demand, at least one surfactant selected from a nonionic surfactant and an anionic surfactant or a complex agent which forms a complex compound from a metal ion, but substantially containing no metal ion.

Investigation of problems associated with the determination of iodine in glacial acetic acid samples using flow injection analysis-inductively coupled plasma-mass spectrometry†

Abstract: Determination of iodine in glacial acetic acid is a major concern of acetic acid manufacturers and consumers. The use of ICP-MS for iodine determinations in acetic acid is hindered by memory effects that produce an elevated background signal necessitating long rinse times between samples. In this work, different analysis methods are employed in an attempt to minimize memory and matrix effects allowing for the accurate determination of iodine in glacial acetic acid using ICP-MS. Ammonium hydroxide solutions (3.7 and 7.4 M) were better at reducing the elevated iodine signal present after the introduction of an acetic acid sample than water or 0.3 M nitric acid. Memory effects were decreased when the sample was introduced by flow injection rather than constant sample aspiration. Peak areas generated by flow injection decreased significantly with increasing ammonium hydroxide concentration in the carrier solution. Iodine determinations made with 1.7 M ammonium hydroxide as the carrier solution were higher than determinations made with 3.7 M ammonium hydroxide as the carrier solution for the same samples, however, the percentage difference between the two determinations varied widely from sample to sample. All samples were analyzed by the method of standard additions in an attempt to compensate for matrix effects. This work illustrates the importance of the carrier solution in the determination of iodine in glacial acetic acid samples.Introduction

Peeling agent for photoresist

Abstract: PROBLEM TO BE SOLVED: To provide a peeling agent for a photoresist having excellent peeling property for a resist by preparing the agent from a specified water-soluble amine, each specified two kinds of ammonium hydroxides and benzotriazoles. SOLUTION: The agent consists of a water-soluble amine (a) expressed by formula I, ammonium hydroxide (b) expressed by formula II, ammonium hydroxide (c) expressed by formula III and benzotriazoles (d). In formula I, each of R1 to R4 is a hydrogen atom or 1-3C alkyl group, each of n and m is an integer 0 to 2 (with the sum of n and m at least 2), and x is an integer 1 to 3. In formulae II and III, each of R5 to R7 is a 1-3C alkyl group, n is an integer 0 to 2, and each of R8 to R11 is a hydrogen atom or 1-4C alkyl group. The agent preferably contains, to 100 pts.wt. of the water-soluble amine (a), 5 to 15 parts by weight of ammonium hydroxide (b), 15 to 25 parts by weight of ammonium hydroxide (c) and 0.5 to 5 parts by weight of benzotriazoles (d).

Synthesis of 13C‐enriched pyrrole from 2‐13C d‐galactose

Abstract: The synthesis of 13C-enriched pyrrole, labeled adjacent to the nitrogen atom, is described. A convenient and effective bench-top synthesis is given which uses a readily available enriched pyranose sugar, 2-13C d-galactose, as the starting material. In the first step of the synthesis, d-galactose is oxidized to produce mucic acid in 70–75% yield. Mucic acid is then treated with ammonium hydroxide to give ammonium mucate in 99% yield. In the final step, ammonium mucate is pyrolyzed to form pyrrole with a 35% yield. The pyrrole obtained in this manner is greater than 98% enriched at the α position. Copyright © 1999 John Wiley & Sons, Ltd.

Alkaline water-based solution for cleaning metallized microelectronic workpieces and methods of using same

Abstract: A method for use in the manufacture of a microelectronic device is set forth. The method includes (10) a first step in which a workpiece including exposed aluminum metallized surfaces and residues is provided. The workpiece, including the exposed aluminum metallized surfaces, is then treated with an alkaline, water-based solution containing one or more components that form an aluminosilicate on the exposed aluminum metallized surfaces. The solution (20) reacts with the residues and assists in removing them from the workpiece. Preferably, the solution is comprised of DI water, and ammonium hydroxide based component, such as TMAH, silicic acid, and aluminum hydroxide.

Determination of a hindered phenol-type antioxidant by pyrolysis-GC/MS in the presence of tetramethyl ammonium hydroxide.

Abstract: 高分子材料に配合されている,代表的なヒンダードフェノール型の高分子量酸化防止剤の一つであるIrganox1010を取り上げ,水酸化テトラメチルアンモニウム(TMAH)存在下での熱分解GC/MS法による分析を検討した.Irganox1010は熱分解炉の温度250℃で,フェノール性のOH基がメチル化されると同時に分解反応により低分子量の化合物に変化することが分かったので,この化合物のピーク強度を基にして高分子材料中のIrganox1010の定量を行った.試料には,酸化防止剤の配合量を0.05～0.5wt%まで変化して調製した5種類のポリエチレン(PE)及びポリブチレンテレフタレート(PBT)を用いた.その結果,PE試料については,TMAH以外に有機酸のラウリン酸及びアセトンを熱分解の際に共存させることにより相対標準偏差(RSD)で7%以内,またPBT試料についてはTMAHを加えるだけでRSD,3%以内の極めて高い測定精度で定量を行うことができた.また,PBTの劣化過程をIrganox1010の残量に基づいて評価することを試みた結果,その配合量に対して残量が約64%になった時点で延性がほとんどなくなることが分かった.このように,本方法により,従来のような長時間にわたる前処理を行う必要もなく,少量の試料量で,樹脂中に微量に添加されたヒンダード型酸化防止剤を迅速かつ精度良く定量できることが分かったので,他のヒンダードフェノール型酸化防止剤の定量並びに高分子材料の劣化過程への適用も期待できる.

Wet cleans for cobalt disilicide processing

Abstract: A method for removing a formation of oxide of titanium that is generated as a by product of a process that forms cobalt disilicide within an insulated-gate field effect transistor (FET). The method applies a chemical reagent to the FET at a predetermined temperature, and for a predetermined period of time, necessary for removing the formation, wherein the reagent does not chemically react with the cobalt disilicide. A reagent that accomplishes this task comprises water (H 2 O), ammonium hydroxide (NH 4 OH), and hydrogen peroxide (H 2 O 2 ), wherein the NH 4 OH and the H 2 O 2 each comprise approximately 4% of the total reagent volume. An effective temperature is 65 ° C. combined with a 3 minute period of application.

Method for cleaning of semiconductor substrate

Abstract: PROBLEM TO BE SOLVED: To satisfactorily remove micro-damages caused by the working on a semiconductor substrate, and organic substances, metallic contaminants and micro-particles, that are sticking on the surface of a semiconductor substrate, with a small number of processes. SOLUTION: This method comprises a process 11 of dipping a semiconductor substrate into a mixed solution or the like in which hydrogen peroxide and ammonium hydroxide are mixed, a process 12 of dipping the semiconductor substrate having dipped into the mixed solution into an oxidizing solution of at least one kind from among aqueous solution of dissolved ozone, nitric acid, and aqueous solution of hydrogen peroxide, a process 13 of dipping the semiconductor substrate having dipped into the oxidizing solution into a mixed solution of an organic acid or its salt and hydrofluoric acid, a process 14 of dipping the semiconductor substrate having dipped into the mixed solution into a solution containing an organic acid or its salt, or a mixed solution of an organic acid or its salt and hydrofluoric acid, and a process 15 of dipping the semiconductor substrate having dipped into the solution containing the organic acid or its salt, or the mixed solution of the organic acid or its salt and hydrofluoric acid into an oxidizing solution of at least one kind from among aqueous solution of dissolved ozone, nitric acid, and aqueous solution of hydrogen peroxide.

Structurally modified nickel hydroxide material and method for making same

Abstract: A method for producing a structurally modified nickel hydroxide active material for the positive electrode of an alkaline electrochemical cell. The method comprises the steps of combining a nickel ion solution, an ammonium hydroxide solution, and an alkali metal hydroxide solution to form a reaction mixture; and cycling the supersaturation of the reaction mixture.

Crosslinkable elastic copolymer composition

Abstract: An elastic copolymer composition which contains a copolymer having a content of polymer units based on vinylidene fluoride as low as from 0.5 to 15 mol %, which is satisfactory in polyol vulcanizability and which gives a vulcanizate excellent in heat resistance and oil resistance. This composition comprises a tetrafluoroethylene (35 to 65 mol %)/propylene (20 to 50 mol %)/vinylidene fluoride (0.5 to 15 mol %) copolymer, an organic quaternary ammonium hydroxide or a salt of an organic quaternary phosphonium compound with a nitrogen-containing heterocyclic compound, an organic polyhydroxy compound, and a metal oxide or a metal hydroxide, and optionally contains an amine compound.