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Kelly P. Ip

Researcher at University of Florida

Publications -  67
Citations -  5037

Kelly P. Ip is an academic researcher from University of Florida. The author has contributed to research in topics: Ohmic contact & Annealing (metallurgy). The author has an hindex of 28, co-authored 67 publications receiving 4859 citations. Previous affiliations of Kelly P. Ip include Raytheon.

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Recent progress in processing and properties of ZnO

TL;DR: In this paper, the authors summarize recent progress in doping control, materials processing methods such as dry etching and Ohmic and Schottky contact formation, new understanding of the role of hydrogen and finally the prospects for control of ferromagnetism in transition-metal doped ZnO.
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Recent progress in processing and properties of ZnO

TL;DR: In this paper, the authors summarize recent progress in doping control, materials processing methods such as dry etching and ohmic and Schottky contact formation, new understanding of the role of hydrogen and finally the prospects for control of ferromagnetism in transition metal-doped ZnO.
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ZnO: growth, doping & processing

TL;DR: A review of recent results in developing improved control of growth, doping, and fabrication processes for ZnO devices with possible applications to ultraviolet (UV) light emitters, spin functional devices, gas sensors, transparent electronics, and surface acoustic wave devices is given in this article.
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Hydrogen incorporation and diffusivity in plasma-exposed bulk ZnO

TL;DR: In this article, hydrogen incorporation depths of >25μm were obtained in bulk, single-crystal ZnO during exposure to 2H plasmas for 0.5 h at 300°C, producing an estimated diffusivity of ∼8×10−10 cm2/V⋅s at this temperature.
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Electrical characteristics of Au and Ag Schottky contacts on n-ZnO

TL;DR: Au and Ag Schottky contacts on the epiready (0001)Zn surface of bulk n-ZnO crystals show Schotty barrier heights of 0.65-0.70 eV from capacitance-voltage measurements, activation energies for reverse saturation currents of 0 3 −0.4 eV and saturation current densities ranging from 10−5 A cm−2 on surfaces etched in HCl to 8×10−7 A¾2 on solvent cleaned samples.