Showing papers by "Marko J. Tadjer published in 2021"

Engineering the Spectral and Spatial Dispersion of Thermal Emission via Polariton–Phonon Strong Coupling

Abstract: Strong coupling between optical modes can be implemented into nanophotonic design to modify the energy-momentum dispersion relation. This approach offers potential avenues for tuning the thermal emission frequency, line width, polarization, and spatial coherence. Here, we employ three-mode strong coupling between propagating and localized surface phonon polaritons, with zone-folded longitudinal optic phonons within periodic arrays of 4H-SiC nanopillars. Energy exchange, mode evolution, and coupling strength between the three polariton branches are explored experimentally and theoretically. The influence of strong coupling upon the angle-dependent thermal emission was directly measured, providing excellent agreement with theory. We demonstrate a 5-fold improvement in the spatial coherence and 3-fold enhancement of the quality factor of the polaritonic modes, with these hybrid modes also exhibiting a mixed character that could enable opportunities to realize electrically driven emission. Our results show that polariton-phonon strong coupling enables thermal emitters, which meet the requirements for a host of IR applications in a simple, lightweight, narrow-band, and yet bright emitter.

Effect of probe geometry during measurement of >100 A Ga2O3 vertical rectifiers

Abstract: The high breakdown voltage and low on-state resistance of Schottky rectifiers fabricated on β-Ga2O3 leads to low switching losses, making them attractive for power inverters. One of the main goals is to achieve high forward currents, requiring the fabrication of large area (>1 cm2) devices in order to keep the current density below the threshold for thermally driven failure. A problem encountered during the measurement of these larger area devices is the dependence of current spreading on the probe size, resistance, number, and geometry, which leads to lower currents than expected. We demonstrate how a multiprobe array (6 × 8 mm2) provides a means of mitigating this effect and measure a single sweep forward current up to 135 A on a 1.15 cm2 rectifier fabricated on a vertical Ga2O3 structure. Technology computer-aided design simulations using the floods code, a self-consistent partial differential equation solver, provide a systematic insight into the role of probe placement, size (40–4120 μm), number (1–5), and the sheet resistance of the metal contact on the resultant current-voltage characteristics of the rectifiers.

A perspective on the electro-thermal co-design of ultra-wide bandgap lateral devices

Abstract: Fundamental research and development of ultra-wide bandgap (UWBG) semiconductor devices are under way to realize next-generation power conversion and wireless communication systems. Devices based on aluminum gallium nitride (AlxGa1−xN, x is the Al composition), β-phase gallium oxide (β-Ga2O3), and diamond give promise to the development of power switching devices and radio frequency power amplifiers with higher performance and efficiency than commercial wide bandgap semiconductor devices based on gallium nitride (GaN) and silicon carbide (SiC). However, one of the most critical challenges for the successful deployment of UWBG device technologies is to overcome adverse thermal effects that impact the device performance and reliability. Overheating of UWBG devices originates from the projected high power density operation and poor intrinsic thermal properties of AlxGa1−xN and β-Ga2O3. This Perspective delineates the need and process for the “electro-thermal co-design” of laterally configured UWBG electronic devices and provides a comprehensive review of current state-of-the-art thermal characterization methods, device thermal modeling practices, and both device- and package-level thermal management solutions.

Characterization of β-Ga2O3 homoepitaxial films and MOSFETs grown by MOCVD at high growth rates

Abstract: The ultra-wide bandgap semiconductor gallium oxide (Ga2O3) offers substantial promise to significantly advance power electronic devices as a result of its high breakdown electric field and maturing substrate technology. A key remaining challenge is the ability to grow electronic-grade epitaxial layers at rates consistent with 20–40 μm thick drift regions needed for 20 kV and above technologies. This work reports on extensive characterization of epitaxial layers grown in a novel metalorganic chemical vapor deposition tool that permits growth rates of 1.0–4.0 μm h−1. Specifically, optical, structural and electrical properties of epilayers grown at ~1 μm h−1 are reported, including employment in an operating MOSFET. The films demonstrate relatively smooth surfaces with a high degree of structural order, limited point defectivity (Nd − Na ≈ 5 × 1015 cm−3) and an optical bandgap of 4.50 eV. Further, when employed in a MOSFET test structure with an n+ doped channel, a record high mobility for a transistor structure with a doped channel of 170 cm2 V−1 s−1 was measured via the Hall technique at room temperature. This work reports for the first time a β-Ga2O3 MOSFET grown using Agnitron Technology's high growth rate MOCVD homoepitaxial process. These results clearly establish a significant improvement in epilayer quality at growth rates that can support future high voltage power device technologies.

Two-step growth of β-Ga2O3 films on (100) diamond via low pressure chemical vapor deposition

Abstract: One of the major challenges in β-Ga2O3-based high power and high frequency devices is anticipated to be related to the low thermal conductivity of the material which is on the order of 10–30 W/m K. The use of diamond (thermal conductivity ∼2000 W/m K) as a substrate can be one effective approach for achieving better thermal management in β-Ga2O3-based devices. In this work, low pressure chemical vapor deposition was used to grow β-Ga2O3 films on (100) oriented, single-crystalline diamond substrates. A two-step growth technique was employed to avoid the oxidation of the diamond surface at high temperatures. From x-ray diffraction measurements, the β-Ga2O3 films grew along the ⟨ − 201 ⟩ crystalline axis with the β-Ga2O3 (002) planes rotated by ±24.3–27° with respect to the diamond (111) planes. High-magnification scanning transmission electron microscopy imaging revealed an abrupt β-Ga2O3/diamond interface without any voids which is essential for the high rate of heat transfer across the interface. N-type electrical conductivity was measured in a Si-doped β-Ga2O3 film with 1.4 × 1019 cm−3 electron concentration and ∼3 cm2/V s electron mobility. This work demonstrates the feasibility of heteroepitaxy of β-Ga2O3 films on diamond substrates for potential device design and device fabrication with efficient thermal management.

Temperature dependent performance of ITO Schottky contacts on β-Ga2O3

Abstract: Sputtered indium tin oxide (ITO) was used as a rectifying contact on lightly n-type (n ∼ 1016 cm−3) β-Ga2O3 and found to exhibit excellent Schottky characteristics up to 500 K, with no thermally driven degradation to this temperature. The barrier height extracted from current–voltage characteristics was 1.15 ± 0.04 eV at 300 K and 0.78 ± 0.03 eV at 500 K, with thermionic behavior of charge carriers over the image force lowered Schottky barriers dominating the carrier transport at low temperatures. The breakdown voltages were 246, 185, and 144 V at 300, 400 and 500 K, respectively. At 600 K, the diodes suffered irreversible thermal damage. The diode on/off ratio was >105 for reverse biases up to 100 V. At higher reverse voltage, the current shows an I ∝ Vn relationship with voltage, indicating a trap-assisted space-charge-limited conduction (SCLC) mechanism. We observed this SCLC relation when the reverse voltage was larger than 100 V for 300 and 400 K and at <100 V at 500 K. The ITO can also be used to make Ohmic contacts on heavily doped Ga2O3 suggesting the possibility of completely optically transparent power devices.

Design of Ga2O3 modulation doped field effect transistors

Abstract: The design of β-Ga2O3-based modulation-doped field effect transistors is discussed with a focus on the role of self-heating and resultant modification of the electron mobility profile. Temperature- and doping-dependent model of the electron mobility as well as temperature- and orientation-dependent approximations of the thermal conductivity of β-Ga2O3 are presented. A decrease in drain current was attributed to a position-dependent mobility reduction caused by a coupled self-heating mechanism and a high electric-field mobility reduction mechanism. A simple thermal management solution is presented where heat is extracted through the source contact metal. Additionally, it is shown that an undesired secondary channel can form at the modulation-doped layer that is distinguished by an inflection in the transconductance curve.

Steady-state methods for measuring in-plane thermal conductivity of thin films for heat spreading applications

Abstract: The development of high thermal conductivity thin film materials for the thermal management of electronics requires accurate and precise methods for characterizing heat spreading capability, namely, in-plane thermal conductivity. However, due to the complex nature of thin film thermal property measurements, resolving the in-plane thermal conductivity of high thermal conductivity anisotropic thin films with high accuracy is particularly challenging. Capable transient techniques exist; however, they usually measure thermal diffusivity and require heat capacity and density to deduce thermal conductivity. Here, we present an explicit uncertainty analysis framework for accurately resolving in-plane thermal conductivity via two independent steady-state thermometry techniques: particle-assisted Raman thermometry and electrical resistance thermometry. Additionally, we establish error-based criteria to determine the limiting experimental conditions that permit the simplifying assumption of one-dimensional thermal conduction to further reduce thermal analysis. We demonstrate the accuracy and precision (<5% uncertainty) of both steady-state techniques through in-plane thermal conductivity measurements of anisotropic nanocrystalline diamond thin films.

Multi-frequency coherent emission from superstructure thermal emitters

Abstract: Long-range spatial coherence can be induced in incoherent thermal emitters by embedding a periodic grating within a material supporting propagating polaritons or dielectric modes However, only a single spatially coherent mode is supported by purely periodic thermal emitters While various designs have been proposed for the purpose of allowing arbitrary emission profiles, the limitations associated with the partial spatial coherence of thermal emitters are not known Here, we explore superstructure gratings (SSGs) to control the spatial and spectral properties of thermal emitters SSGs have long-range periodicity but employ a unit cell that provides multiple Bragg vectors to interact with light These Bragg vectors allow simultaneous launching of polaritons with different frequencies/wavevectors in a single grating, manifesting as additional spatial and spectral modes in the thermal emission profile However, SSGs still have a well-defined period, which allows us to assess the role that finite spatial coherence plays in thermal emitters We find that the spatial coherence length defines the maximum possible SSG period that can be used This provides a fundamental limit on the degree of spatial coherence that can be induced in a thermal emitter and has broader implications for the use of techniques such as inverse design for structure optimization

Simultaneous Evaluation of Heat Capacity and In-plane Thermal Conductivity of Nanocrystalline Diamond Thin Films

Abstract: As wide bandgap electronic devices have continued to advance in both size reduction and power handling capabilities, heat dissipation has become a significant concern. To mitigate this, chemical vapor deposited (CVD) diamond has been demonstrated as an effective solution for thermal management of these devices by directly growing onto the transistor substrate. A key aspect of power and radio frequency (RF) electronic devices involves transient switching behavior, which highlights the importance of understanding the temperature dependence of the heat capacity and thermal conductivity when modeling and predicting device electrothermal response. Due to the complicated microstructure near the interface between CVD diamond and electronics, it is difficult to measure both properties simultaneously. In this work, we use time domain thermoreflectance (TDTR) to simultaneously measure the in plane thermal conductivity and heat capacity of a 1 um thick CVD diamond film, and also use the pump as an effective heater to perform temperature dependent measurements. The results show that the in plane thermal conductivity varied slightly with an average of 103 W per meter per K over a temperature range of 302 to 327 K, while the specific heat capacity has a strong temperature dependence over the same range and matches with heat capacity data of natural diamond in literature.

Assessment of the (010) $\beta$-Ga$_2$O$_3$ Surface and Substrate Specification

Abstract: Recent breakthroughs in bulk crystal growth of the thermodynamically stable beta phase of gallium oxide ($\beta$-Ga$_2$O$_3$) have led to the commercialization of large-area beta-Ga$_2$O$_3$ substrates with subsequent epitaxy on (010) substrates producing high-quality films. Still, metal-organic chemical vapor deposition (MOCVD), molecular beam epitaxy (MBE), and processing of the (010) $\beta$-Ga$_2$O$_3$ surface are known to form sub-nanometer scale facets along the [001] direction as well as larger ridges with features perpendicular to the [001] direction. A density function theory calculation of the (010) surface shows an ordering of the surface as a sub-nanometer-scale feature along the [001] direction. Additionally, the general crystal structure of $\beta$-Ga$_2$O$_3$ is presented and recommendations are presented for standardizing (010) substrates to account for and control the larger-scale ridge formation.

Assessment of the (010) β-Ga2O3 surface and substrate specification

Abstract: Recent breakthroughs in bulk crystal growth of the thermodynamically stable beta phase of gallium oxide (β-Ga2O3) have led to the commercialization of large-area β-Ga2O3 substrates with subsequent epitaxy on (010) substrates producing high-quality films. Still, metalorganic chemical vapor deposition, molecular beam epitaxy, and processing of the (010) β-Ga2O3 surface are known to form subnanometer-scale facets along the [001] direction as well as larger ridges with features perpendicular to the [001] direction. A density function theory calculation of the (010) surface shows an ordering of the surface as a subnanometer-scale feature along the [001] direction. Additionally, the general crystal structure of β-Ga2O3 is presented, and recommendations are presented for standardizing (010) substrates to account for and control the larger-scale ridge formation.