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Paul S. Ho

Researcher at University of Texas at Austin

Publications -  481
Citations -  14016

Paul S. Ho is an academic researcher from University of Texas at Austin. The author has contributed to research in topics: Electromigration & Dielectric. The author has an hindex of 60, co-authored 475 publications receiving 13444 citations. Previous affiliations of Paul S. Ho include National Institute of Standards and Technology & IBM.

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Patent

Methods for making controlled delivery devices having zero order kinetics

TL;DR: In this paper, a method of making an injectable or implantable active agent delivery device capable of delivering a diagnostic, therapeutic, and/or prophylactic agent to a desired targeted site having orifice(s) on the surface is disclosed, providing unidirectional release of the agent at a controlled desirable rate.
Journal ArticleDOI

Material reactions in Al/Pd2Si/Si junctions. I. Phase stability

TL;DR: The phase reactions in Al/Pd2Si/Si junctions caused by thermal annealing have been investigated in this paper, combining x-ray diffraction, transmission electron microscopy, and Auger sputter profiling techniques, a ternary phase diagram for Al•Pd•Si at about 400°C has been qualitatively established for predicting phase changes during reaction.
Journal ArticleDOI

Observation of local melting in an aluminum bicrystal by molecular dynamics simulation

TL;DR: Simulation par dynamique moleculaire du comportement structural a haute temperature d'un bicristal modele d'aluminium as discussed by the authors, simulating par dynamiques moleculaires.
Journal ArticleDOI

Effect of low k dielectrics on electromigration reliability for Cu interconnects

TL;DR: In this paper, the effect of low k dielectrics on EM reliability of Cu interconnects was studied and an effective modulus B obtained by finite element analysis was used to account for the dielectric confinement effect on EM and found to correlate well with EM lifetime and the (jL)c product of low-k interconnect.
Patent

Nickel-x/gold/nickel-x conductors for solid state devices

TL;DR: A laminated conductor includes a lower thin film (10) of nickel deposited upon a substrate (9) containing, e.g., silicon as discussed by the authors, a thicker film (11) of gold is deposited as the conductive portion of the conductor.