P
Paul S. Ho
Researcher at University of Texas at Austin
Publications - 481
Citations - 14016
Paul S. Ho is an academic researcher from University of Texas at Austin. The author has contributed to research in topics: Electromigration & Dielectric. The author has an hindex of 60, co-authored 475 publications receiving 13444 citations. Previous affiliations of Paul S. Ho include National Institute of Standards and Technology & IBM.
Papers
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Fabrication and Characterization of Patterned Single-Crystal Silicon Nanolines
TL;DR: This letter demonstrates a method for fabricating single-crystal Si nanolines, with rectangular cross sections and nearly atomically flat sidewalls, which leads to superb mechanical properties and the critical load for buckling depends on the friction at the contact surface.
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General aspects of barrier layers for very-large-scale integration applications I: Concepts
TL;DR: In this paper, the general requirements of barrier layers are first described in view of the future device miniaturization, and the function of the barrier layer in reducing the mass transport is discussed by considering separately the nature of the diffusivity and the driving force.
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Oxygen-induced bi-modal failure phenomenon in SiOx-based resistive switching memory
Yao-Feng Chang,Li Ji,Zhuo Jie Wu,Fei Zhou,Yanzhen Wang,Fei Xue,Burt Fowler,Edward T. Yu,Paul S. Ho,Jack C. Lee +9 more
TL;DR: In this paper, the ambient gas effect in SiOx-based resistive switching memory has been studied and the failure phenomena can be described by Monte Carlo simulation using bi-modal statistics to enable feature distribution modeling of failure modes.
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Solute effects on electromigration
TL;DR: In this article, the authors applied the Howard and Manning type analysis to the diffusion data of a number of solutes in Al, Cu, Ag, and Au for determining the required jumping-frequency ratios.
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Effect of Dicing Technique on the Fracture Strength of Si Dies With Emphasis on Multimodal Failure Distribution
TL;DR: In this article, the effect of the dicing process on the fracture strength of Si dies was analyzed using fractographic analysis, and it was shown that the die failure caused by edge defects can be deconvoluted from the 3-point bending data by using fractography observation.