S
S. K. Lahiri
Researcher at Agency for Science, Technology and Research
Publications - 5
Citations - 586
S. K. Lahiri is an academic researcher from Agency for Science, Technology and Research. The author has contributed to research in topics: Crystallization & Amorphous solid. The author has an hindex of 5, co-authored 5 publications receiving 566 citations.
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Journal ArticleDOI
Enhancement of thermal stability of NiSi films on (100)Si and (111)Si by Pt addition
TL;DR: In this article, the effect of a small amount of Pt (5 at. %) on the thermal stability of NiSi film on (100 and (111) Si substrates has been investigated both by in situ annealing inside an x-ray photoelectron spectroscopy system and by ex situ rapid thermal annaling.
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Morphology and crystallization kinetics in HfO2 thin films grown by atomic layer deposition
M.-Y. Ho,Hao Gong,Glen D. Wilk,B. W. Busch,Martin L. Green,Paul M. Voyles,David A. Muller,M. Bude,W.H. Lin,Alex See,M. E. Loomans,S. K. Lahiri,Petri Räisänen +12 more
TL;DR: In this article, the effects of annealing on the morphology and crystallization kinetics for the high-κ gate dielectric replacement candidate hafnium oxide (HfO2) were reported.
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Suppressed crystallization of Hf-based gate dielectrics by controlled addition of Al2O3 using atomic layer deposition
M.-Y. Ho,Hao Gong,G. D. Wilk,B. Busch,B. Busch,Martin L. Green,W.H. Lin,Alex See,S. K. Lahiri,M. E. Loomans,Petri Räisänen,Torgny Gustafsson +11 more
TL;DR: In this article, the authors demonstrate improved thermal stability of the amorphous phase for hafnium-based gate dielectrics through the controlled addition of Al2O3.
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Formation and Stability of NI(PT) Silicide on (100)SI and (111)SI
TL;DR: In this paper, the effect of a small amount of Pt (5 at%) on the thermal stability of NiSi film on (100)Si and (111 )Si has been investigated.
Journal ArticleDOI
Coexistence of hexagonal and orthorhombic structures in NiSi films containing Pt
TL;DR: In this paper, the structure of Ni(Pt)Si films was investigated using high-resolution electron microscopy (HREM), electron microdiffraction and image simulation techniques.